IP Library Granted Patent US 10,790,119
Granted Patent B2
US 10,790,119 · App. 15/851,922 · Granted Sep 29, 2020

Plasma processing apparatus with post plasma gas injection

Inventors: Shawming Ma (Sunnyvale, CA); Vladimir Nagorny (Tracy, CA); Dixit V. Desai (Pleasanton, CA); Ryan Pakulski (Discovery Bay, CA)
Assignees: MATTSON TECHNOLOGY, INC; BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD.
H01J37/32422B08B7/0035H01J37/3244H01L21/02057H01L21/31138H01L21/67028H01J2237/002
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Quick Facts
Patent No.
US 10,790,119
App. No.
15/851,922
Granted
Sep 29, 2020
Kind
B2
Abstract

Plasma processing with post plasma gas injection is provided. In one example implementation, a plasma processing apparatus includes a plasma chamber. The apparatus includes a processing chamber separated from the plasma chamber. The processing chamber includes a substrate holder operable to support a workpiece. The apparatus includes a plasma source configured to generate a plasma in the plasma chamber. The apparatus includes a separation grid separating the plasma chamber from the processing chamber. The separation grid can be configured to filter one or more ions generated in the plasma and allow the passage of neutral particles from the plasma chamber to the processing chamber. The apparatus can include at least one gas port configured to inject a gas into neutral particles passing through the separation grid.

Claims (8)

1. A method for processing a workpiece in a plasma strip tool, the method comprising:

dissociating one or more molecules into one or more ions and one or more neutral particles in a mixture using a plasma generated in a plasma chamber of a plasma processing apparatus;

filtering the one or more ions generated by the plasma in the mixture using a separation grid comprising a first grid plate and a second grid plate wherein the first grid plate and the second grid plate are disposed between the plasma chamber and a processing chamber of the plasma processing apparatus, the processing chamber being separated from the plasma chamber by the separation grid;

passing the one or more neutral particles generated in the plasma through first holes extending through the first grid plate and through second holes extending through the second grid plate of the separation grid, the first and second holes being separate from each other;

controlling energy of the neutral particles passing through the separation grid by injecting a cooling gas into the neutral particles passing through the separation grid into the processing chamber from a gas injection port located between the first grid plate and the second grid plate of the separation grid; and

exposing the workpiece to the neutral particles in the processing chamber.

2. The method of claim 1 , wherein the cooling gas is an inert gas.

3. The method of claim 1 , wherein injecting the cooling gas into the neutral particles comprises injecting a cooling gas into neutral particles at a first portion of the separation grid and injecting a cooling gas into neutral particles at a second portion of the separation grid.

Assignments (6)
RELEASE OF SECURITY INTEREST Recorded Apr 15, 2021
From: EAST WEST BANK
To: MATTSON TECHNOLOGY, INC.
Reel/Frame 055950/0452 →
SECURITY INTEREST Recorded Oct 19, 2020
From: MATTSON TECHNOLOGY, INC.
To: EAST WEST BANK
Reel/Frame 054100/0167 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 30, 2019
From: MATTSON TECHNOLOGY, INC.
To: MATTSON TECHNOLOGY, INC.; BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
Reel/Frame 050582/0796 →
SECURITY INTEREST Recorded Sep 6, 2019
From: MATTSON TECHNOLOGY, INC.
To: EAST WEST BANK
Reel/Frame 050299/0372 →
SECURITY INTEREST Recorded Aug 27, 2018
From: MATTSON TECHNOLOGY, INC.
To: EAST WEST BANK
Reel/Frame 046956/0348 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 21, 2018
From: MA, SHAWMING; NAGORNY, VLADIMIR; DESAI, DIXIT V.; PAKULSKI, RYAN M.
To: MATTSON TECHNOLOGY, INC.
Reel/Frame 044991/0785 →
Continuity (2)
Provisional Application 62517365 · Jun 9, 2017
Related Publication 20180358208A1 · Dec 13, 2018
Cited By (4)
US 12,334,312 US 12,562,342 US 12,665,168 US 12,683,124