Thermal processing system with temperature non-uniformity control

1. A thermal processing system, comprising:

a processing chamber;

a workpiece disposed within the processing chamber;

a heat source configured to emit light towards the workpiece, the heat source including an array of linear lamps, each of the linear lamps having a long dimension that extends along a first direction; and

a tunable reflective array disposed between the workpiece and the heat source, the tunable reflective array comprising a plurality of pixels, each of the plurality of pixels having a linear shape and a long dimension that extends along a second direction that is perpendicular to the first direction, each pixel of the plurality of pixels comprising an electrochromatic material configurable in a translucent state or an opaque state,

wherein when the electrochromatic material is configured in the opaque state, the pixel reduces transmission of the light through the pixel, and

wherein when the electrochromatic material is configured in the translucent state, light at least partially passes through the pixel.

2. The thermal processing system of claim 1 , further comprising:

one or more sensors configured to obtain data indicative of a temperature profile associated with the workpiece.

3. The thermal processing system of claim 2 , wherein the temperature profile is indicative of a spatial distribution of temperature across the workpiece.

4. The thermal processing system of claim 2 , wherein the one or more sensors comprise a thermal camera, and wherein the data comprises thermal image data.

5. The thermal processing system of claim 2 , wherein the one or more sensors comprise a pyrometer configured to obtain data indicative of the temperature profile associated with the workpiece.

6. The thermal processing system of claim 5 , wherein the data obtained from the pyrometer comprises a plurality of temperature measurements, each temperature measurement associated with a different location on a surface of the workpiece.

7. The thermal processing system of claim 2 , further comprising:

a controller configured to:

obtain the data indicative of the temperature profile associated with the workpiece; and

control operation of the tunable reflective array based, at least in part, on the data to reduce non-uniformity in the temperature profile.

8. The thermal processing system of claim 7 , wherein when the data indicates a first portion of the workpiece is warmer than a second portion of the workpiece, the controller is configured to control operation of the tunable reflective array to configure the electrochromatic material of one or more pixels of the tunable reflective array in the opaque state such that an amount of light emitted onto the first portion of the workpiece via the heat source is reduced.

9. The thermal processing system of claim 7 wherein when the data indicates a first portion of the workpiece is colder relative to a second portion of the workpiece, the controller is configured to control operation of the tunable reflective array to configure the electrochromatic material of one or more pixels of the tunable reflective array in the translucent state such that an amount of light emitted onto the first portion of the workpiece via the heat source is increased.

10. The thermal processing system of claim 1 , further comprising:

a quartz window disposed between the tunable reflective array and the workpiece.

11. The thermal processing system of claim 10 , wherein the processing chamber is defined, at least in part, by the quartz window.

12. The thermal processing system of claim 1 , wherein the heat source comprises a plurality of heat lamps.

13. The thermal processing system of claim 1 , wherein the heat source comprises a laser.

14. The thermal processing system of claim 1 , further comprising:

a reflector configured to reflect the light towards the workpiece.

15. The thermal processing system of claim 1 , wherein the workpiece comprises a semiconductor wafer.