Apparatus of plural charged-particle beams
A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
1. A multi-beam apparatus for inspecting a sample, the apparatus comprising:
an electron source configured to emit electrons forming a primary electron beam, the electron source being aligned with a primary optical axis of the multi-beam apparatus; and
an adjustable collimating lens having a principal plane and configured to change paths of the electrons of the primary electron beam based on a position of the principal plane, wherein the principal plane is moveable along the primary optical axis to change a current density of the primary electron beam.
2. The multi-beam apparatus of claim 1 , wherein the adjustable collimating lens is aligned with the primary optical axis of the multi-beam apparatus.
3. The multi-beam apparatus of claim 1 , wherein the adjustable collimating lens is configured to move the principal plane closer to the electron source to enable the current density of the primary electron beam to increase.
4. The multi-beam apparatus of claim 1 , wherein the adjustable collimating lens is configured to move the principal plane away from the electron source to enable the current density of the primary electron beam to decrease.
5. The multi-beam apparatus of claim 1 , further comprising a beamlet-forming array having a plurality of beam-limit apertures and configured to receive the primary electron beam that was collimated by the adjustable collimating lens, wherein portions of the primary electron beam are allowed to pass through the plurality of beam-limit apertures to form a plurality of primary electron beamlets.
6. The multi-beam apparatus of claim 5 , wherein the adjustable collimating lens is configured to change currents of the plurality of primary electron beamlets by changing the current density of the primary electron beam before the portions of primary electron beam pass through the plurality of beam-limit apertures.
7. The multi-beam apparatus of claim 1 , wherein the adjustable collimating lens comprises a plurality of magnetic lenses that are positioned along the primary optical axis.
8. The apparatus of claim 7 , wherein the principal plane of the adjustable collimating lens is moveable along the primary optical axis by adjusting excitations one or more of the plurality of magnetic lenses.
9. The multi-beam apparatus of claim 1 , wherein the adjustable collimating lens comprises a plurality of annular electrodes that are positioned along the primary optical axis.
10. The apparatus of claim 9 , wherein the principal plane of the adjustable collimating lens is moveable along the primary optical axis by adjusting excitations of one or more of the plurality of annular electrodes.
11. The multi-beam apparatus of claim 1 , wherein the adjustable collimating lens comprises a magnetic lens and an annular electrode, wherein the magnetic lens and the annular electrode are positioned along the primary optical axis.
12. The apparatus of claim 11 , wherein the principal plane of the adjustable collimating lens is moveable along the primary optical axis by adjusting excitations of the magnetic lens and the annular electrode.