NOZZLE HEAD

1 . A nozzle head for subjecting a surface of a substrate to successive surface reactions of at least two precursor gases according to the principles of atomic layer deposition, the nozzle head comprising:

a body;

an output face via which at least one precursor gas is supplied towards the surface of the substrate; and

two or more nozzles provided in connection with the output face for supplying the at least one precursor gas,

wherein the nozzle head further comprises a nozzle head chamber inside the body of the nozzle head, said nozzle head chamber is arranged in fluid communication with the two or more nozzles, the nozzle head chamber is provided with a gas inlet for supplying gas into the nozzle head chamber from a gas source outside the nozzle head.

2 . The nozzle head according to claim 1 , wherein the body comprises a first side structure, a second side structure, a first end structure and a second end structure, and

the two or more nozzles are arranged to extend between the first and second end structures and arranged adjacent to each other in a direction between the first and second side structures.

3 . The nozzle head according to claim 2 , wherein the nozzle head chamber is arranged inside the body of the nozzle head, and

the two or more nozzles are arranged to form at least part of a bottom wall of the nozzle head chamber, and

the first side structure, the second side structure, the first end structure and the second end structure of the body are arranged to form side walls of the nozzle head chamber, and

wherein the body further comprises a top structure forming a top wall of the nozzle head chamber.

4 . The nozzle head according to claim 1 , wherein the nozzle head chamber comprises a first precursor conduit for distributing first precursor gas to at least one of the two or more nozzles.

5 . The nozzle head according to claim 4 , wherein the nozzle head comprises a first precursor gas connection for connecting a first precursor channel arranged outside the nozzle head and extending from a first precursor source with the first precursor conduit arranged inside the nozzle head chamber and extending to the at least one of the two or more nozzles.

6 . The nozzle head according to claim 1 , wherein the nozzle head chamber comprises a second precursor conduit for distributing second precursor gas to at least one of the two or more nozzles.

7 . The nozzle head according to claim 6 , wherein the nozzle head comprises a second precursor gas connection for connecting a second precursor channel arranged outside the nozzle head and extending from a second precursor source with the second precursor conduit arranged inside the nozzle head chamber and extending to the at least one of the two or more nozzles.

8 . The nozzle head according to claim 1 , wherein the gas inlet is arranged to form a gas connection with a gas channel arranged outside the nozzle head and extending between the gas inlet and the gas source, said gas inlet is arranged to provide a fluid connection between the gas source and the nozzle head chamber.

9 . The nozzle head according to claim 1 , wherein the gas source is a purge gas source.

10 . The nozzle head according to claim 1 , wherein the nozzle head chamber comprises a discharge conduit for discharging gases from the surface of the substrate through the output face of the nozzle head and through the at least one of the two or more nozzles,

wherein said discharge conduit is connected to a discharge system arranged outside the nozzle head.

11 . The nozzle head according to claim 10 , wherein the nozzle head comprises a discharge gas connection for connecting a discharge channel arranged outside the nozzle head and extending from the discharge system with the discharge conduit arranged inside the nozzle head chamber.

12 . The nozzle head according to claim 1 , wherein the nozzle head comprises two or more first precursor nozzles for supplying first precursor gas and two or more second precursor nozzles for supplying second precursor gas.