OLED display device and manufacturing method of TFT array substrate

1. An OLED display device, comprising an OLED pixel driving circuit, wherein the OLED pixel driving circuit comprises a first thin film transistor (T 1 ), a second thin film transistor (T 2 ), a third thin film transistor (T 3 ), a storage capacitor (Cst), and an organic light-emitting diode; a drain of the first thin film transistor (T 1 ) is connected to a power supply to receive a power supply voltage (Vdd), and a source of the first thin film transistor (T 1 ) is electrically connected to an anode of the organic light-emitting diode; a cathode of the organic light-emitting diode is connected to a common ground to receive a common ground voltage; a gate of the second thin film transistor (T 2 ) is connected to a first scan signal line to receive a first scan signal (Scan 1 ), a drain of the second thin film transistor (T 2 ) is connected to a data signal line (Data) to receive a data signal, and a source of the second thin film transistor (T 2 ) is electrically connected to a gate of the first thin film transistor (T 1 ) and an end of the storage capacitor (Cst); an other end of the storage capacitor (Cst) is electrically connected to the source of the first thin film transistor (T 1 ); a gate of the third thin film transistor (T 3 ) is connected to a second scan signal line to receive a second scan signal (Scan 2 ), a source of the third thin film transistor (T 3 ) is electrically connected to the source of the first thin film transistor (T 1 ), and a drain of the third thin film transistor (T 3 ) is electrically connected to a circuit switch (K);

wherein the first thin film transistor (T 1 ), the second thin film transistor (T 2 ), and third thin film transistor (T 3 ) are all disposed on a substrate in a same layer; the first thin film transistor (T 1 ) is a double gate oxide thin film transistor, and the second thin film transistor (T 2 ) and the third thin film transistor (T 3 ) are both top gate self-aligned oxide thin film transistors.

2. The OLED display device according to claim 1 , wherein the double gate oxide thin film transistor comprises: a first bottom gate electrode formed on the substrate; a buffer layer formed on the first bottom gate electrode; a first semiconductor layer formed on the buffer layer; a first gate insulating layer formed on the first semiconductor layer; a first top gate electrode formed on the first gate insulating layer; an interlayer insulating layer formed on the buffer layer and completely covering the first semiconductor layer, the first gate insulating layer, and the first top gate electrode; a first source metal layer and a first drain metal layer formed on the interlayer insulating layer; a passivation layer formed on the interlayer insulating layer and completely covering the first source metal layer and the first drain metal layer; and the double gate thin film transistor further comprises a first pixel electrode and a second pixel electrode, wherein the first pixel electrode and the second pixel electrode are formed on the passivation layer.

3. The OLED display device according to claim 2 , wherein the first pixel electrode is electrically connected to the first bottom gate electrode by a first via, and the first pixel electrode is further electrically connected to the first top gate electrode by a second via; the second pixel electrode is electrically connected to the first drain metal layer by a third via; and the first source metal layer and the first drain metal layer are electrically connected to the first semiconductor layer by a fourth via.

4. The OLED display device according to claim 2 , wherein the top gate self-aligned oxide thin film transistor comprises: a light-shielding layer formed on the substrate, and the buffer layer; a second semiconductor layer formed on the buffer layer, a second gate insulating layer formed on the second semiconductor layer, a second top gate electrode formed on the second gate insulating layer, the interlayer insulating layer, a second source metal layer and a second drain metal layer formed on the interlayer insulating layer, the passivation layer, and the second pixel electrode.

5. The OLED display device according to claim 4 , wherein the second source metal layer and the second drain metal layer are electrically connected to the second semiconductor layer by a fifth via, and the second drain metal layer is further electrically connected to the light-shielding layer by a sixth via.

6. The OLED display device according to claim 4 , wherein materials of all the buffer layer, the first gate insulating layer, the second gate insulating layer, the interlayer insulating layer, and the passivation layer are at least one of silicon dioxide, silicon nitride, and aluminum oxide.

7. The OLED display device according to claim 4 , wherein materials of all the first bottom gate electrode, the light-shielding layer, the first top gate electrode, the first source metal layer, the first drain metal layer, the second top gate electrode, the second source metal layer, and the second drain metal layer are at least one of Mo, Al, Ti, and Cu.

8. A manufacturing method of a TFT array substrate, wherein the TFT array substrate is used for preparing the OLED display device according to claim 1 , and the method comprises:

a step S 10 of preparing a first metal layer on a substrate, and patterning the first metal layer into a first bottom gate electrode and a light-shielding layer by a first photomask;

a step S 20 of sequentially preparing a buffer layer, a semiconductor layer, a gate insulating layer, and the first metal layer on the substrate, and forming a first semiconductor layer, a second semiconductor layer, a first gate insulating layer, a second gate insulating layer, a first top gate electrode, and a second top gate electrode on the buffer layer using a half-tone mask plate as a second photomask;

a step S 30 of preparing an interlayer insulating layer on the buffer layer, and forming a first through hole, a second through hole, a third through hole, a fourth through hole, and a fifth through hole on the interlayer insulating layer using a half-tone mask plate as a third photomask;

a step S 40 of depositing a second metal layer on the interlayer insulating layer, and patterning the second metal layer into a first source metal layer, a first drain metal layer, a second source metal layer, and a second drain metal layer by a fourth photomask;

a step S 50 of preparing a passivation layer on the interlayer insulating layer, exposing the first bottom gate electrode, the first top gate electrode, and the first drain metal layer on the passivation layer by a fifth photomask, and forming a sixth through hole on the first drain metal layer; and

a step S 60 of forming an oxide metal layer on the passivation layer, and patterning the oxide metal layer into a first pixel electrode and a second pixel electrode by a sixth photomask, wherein the first pixel electrode is electrically connected to the first bottom gate electrode by the first through hole, the first pixel electrode is further electrically connected to the first top gate electrode by the third through hole, and the second pixel electrode is further electrically connected to the first drain metal layer by the sixth through hole.

9. The manufacturing method of the TFT array substrate according to claim 8 , wherein in the step S 20 , two ends of an edge of the first semiconductor layer and two ends of an edge of the second semiconductor layer are all subjected to a conductive treatment by a plasma treatment process; and a plasma treatment gas in the plasma treatment process is at least one of Ar, He, and N2.

10. The manufacturing method of the TFT array substrate according to claim 8 , wherein in the step S 20 , materials of all the buffer layer, the first gate insulating layer, and the second gate insulating layer are at least one of silicon dioxide, silicon nitride, and aluminum oxide; materials of the first semiconductor layer and the second semiconductor layer are at least one of IZO and IZTO; and materials of the first top gate electrode and the second top gate electrode are the same as a material of the first metal layer.

11. The manufacturing method of the TFT array substrate according to claim 8 , wherein the step S 30 further comprises:

a step S 301 of preparing an interlayer insulating layer on the buffer layer by a chemical vapor deposition method or a sputtering method, wherein the interlayer insulating layer completely covers the first semiconductor layer, the second semiconductor layer, the first gate insulating layer, the second gate insulating layer, the first top gate electrode, and the second top gate electrode;

a step S 302 of etching on an opening area of the buffer layer using a half-tone mask plate as a third photomask, and ashing the opening area corresponding to the interlayer insulating layer, wherein the opening area corresponding to the interlayer insulating layer is above a source drain area and above the first top gate electrode; and

a step S 303 of finally forming a first through hole, a second through hole, a third through hole, a fourth through hole, and a fifth through hole on the interlayer insulating layer.

12. The manufacturing method of the TFT array substrate according to claim 11 , wherein in the step S 303 , the first through hole exposes the first bottom gate electrode, the second through hole exposes the first semiconductor layer, the third through hole exposes the first top gate electrode, the fourth through hole exposes the second semiconductor layer, and the fifth through hole exposes the light-shielding layer.

13. The manufacturing method of the TFT array substrate according to claim 8 , wherein in the step S 40 , the first source metal layer and the first drain metal layer are electrically connected to two ends of an edge of the first conductive layer by the second through hole, the second source metal layer and the second drain metal layer are electrically connected to two ends of an edge of the second conductive layer by the fourth through hole, and the second drain metal layer is electrically connected to the light-shielding layer by the fifth through hole.

14. An OLED display device, comprising an OLED pixel driving circuit, wherein the OLED pixel driving circuit comprises a first thin film transistor (T 1 ), a second thin film transistor (T 2 ), a third thin film transistor (T 3 ), a storage capacitor (Cst), and an organic light-emitting diode; a drain of the first thin film transistor (T 1 ) is connected to a power supply to receive a power supply voltage (Vdd), and a source of the first thin film transistor (T 1 ) is electrically connected to an anode of the organic light-emitting diode; a cathode of the organic light-emitting diode is connected to a common ground to receive a common ground voltage; a gate of the second thin film transistor (T 2 ) is connected to a first scan signal line to receive a first scan signal (Scan 1 ), a drain of the second thin film transistor (T 2 ) is connected to a data signal line (Data) to receive a data signal, and a source of the second thin film transistor (T 2 ) is electrically connected to a gate of the first thin film transistor (T 1 ) and an end of the storage capacitor (Cst); an other end of the storage capacitor (Cst) is electrically connected to the source of the first thin film transistor (T 1 ); a gate of the third thin film transistor (T 3 ) is connected to a second scan signal line to receive a second scan signal (Scan 2 ), a source of the third thin film transistor (T 3 ) is electrically connected to the source of the first thin film transistor (T 1 ), and a drain of the third thin film transistor (T 3 ) is electrically connected to a circuit switch (K);

wherein the first thin film transistor (T 1 ) is a double gate oxide thin film transistor, and the second thin film transistor (T 2 ) and the third thin film transistor (T 3 ) are both top gate self-aligned oxide thin film transistors.

15. The OLED display device according to claim 14 , wherein the double gate oxide thin film transistor comprises: a first bottom gate electrode formed on the substrate; a buffer layer formed on the first bottom gate electrode; a first semiconductor layer formed on the buffer layer; a first gate insulating layer formed on the first semiconductor layer; a first top gate electrode formed on the first gate insulating layer; an interlayer insulating layer formed on the buffer layer and completely covering the first semiconductor layer, the first gate insulating layer, and the first top gate electrode; a first source metal layer and a first drain metal layer formed on the interlayer insulating layer; a passivation layer formed on the interlayer insulating layer and completely covering the first source metal layer and the first drain metal layer; and the double gate thin film transistor further comprises a first pixel electrode and a second pixel electrode, wherein the first pixel electrode and the second pixel electrode are formed on the passivation layer.

16. The OLED display device according to claim 14 , wherein the first pixel electrode is electrically connected to the first bottom gate electrode by a first via, and the first pixel electrode is further electrically connected to the first top gate electrode by a second via; the second pixel electrode is electrically connected to the first drain metal layer by a third via; and the first source metal layer and the first drain metal layer are electrically connected to the first semiconductor layer by a fourth via.

17. The OLED display device according to claim 14 , wherein the top gate self-aligned oxide thin film transistor comprises: a light-shielding layer formed on the substrate, and the buffer layer; a second semiconductor layer formed on the buffer layer, a second gate insulating layer formed on the second semiconductor layer, a second top gate electrode formed on the second gate insulating layer, the interlayer insulating layer, a second source metal layer and a second drain metal layer formed on the interlayer insulating layer, the passivation layer, and the second pixel electrode.

18. The OLED display device according to claim 17 , wherein the second source metal layer and the second drain metal layer are electrically connected to the second semiconductor layer by a fifth via, and the second drain metal layer is further electrically connected to the light-shielding layer by a sixth via.

19. The OLED display device according to claim 17 , wherein materials of all the buffer layer, the first gate insulating layer, the second gate insulating layer, the interlayer insulating layer, and the passivation layer are at least one of silicon dioxide, silicon nitride, and aluminum oxide.

20. The OLED display device according to claim 17 , wherein materials of all the first bottom gate electrode, the light-shielding layer, the first top gate electrode, the first source metal layer, the first drain metal layer, the second top gate electrode, the second source metal layer, and the second drain metal layer are at least one of Mo, Al, Ti, and Cu.