Magnetoresistance effect element
A magnetoresistance effect element includes a first ferromagnetic layer, a second ferromagnetic layer, and a nonmagnetic spacer layer between the first ferromagnetic layer and the second ferromagnetic layer, in which at least one of the first ferromagnetic layer and the second ferromagnetic layer contains a metal compound having a half-Heusler type crystal structure, the metal compound contains a functional material, and X atoms, Y atoms, and Z atoms which form a unit lattice of the half-Heusler type crystal structure, and the functional material has an atomic number lower than an atomic number of any of the X atoms, the Y atoms, and the Z atoms.
1. A magnetoresistance effect element comprising:
a first ferromagnetic layer;
a second ferromagnetic layer; and
a nonmagnetic spacer layer between the first ferromagnetic layer and the second ferromagnetic layer; wherein
at least one of the first ferromagnetic layer and the second ferromagnetic layer contains a metal compound having a half-Heusler type crystal structure,
the metal compound contains a functional material, and X atoms, Y atoms, and Z atoms which form a unit lattice of the half-Heusler type crystal structure, and
the functional material has an atomic number lower than an atomic number of any of the X atoms, the Y atoms, and the Z atoms,
wherein the functional material is one or more of atoms selected from the group consisting of B and C,
the metal compound has a crystal structure of an A2 structure, a C1 b structure or a B2 structure.
2. The magnetoresistance effect element according to claim 1 , wherein
the functional material is boron, and
a composition proportion of the functional material in the metal compound is 0.1 at % or more and 9.8 at % or less.
3. The magnetoresistance effect element according to claim 1 , wherein
the functional material is carbon, and
a composition proportion of the functional material in the metal compound is 0.11 at % or more and 8.8 at % or less.
4. The magnetoresistance effect element according to claim 1 , wherein
the X atoms are one or more of atoms selected from the group consisting of Fe, Co, Ni, Cu, Zn, Ru, Rh, Pd, Ag, Cd, Ir, Pt, and Au,
the Y atoms are one or more of atoms selected from the group consisting of Ti, V, Cr, Mn, Y, Zr, Nb, Hf, Ta, Gd, Tb, Dy, Hd, Er, Fe, Tm, Yb, and Lu, and
the Z atoms are one or more of atoms selected from the group consisting of Al, Si, Ga, Ge, As, In, Sn, Sb, Tl, Pd, Bi, Se, and Te.
5. The magnetoresistance effect element according to claim 4 , wherein
the X atoms are one or more of atoms selected from the group consisting of Ni, Pd, Pt, Co, and Rh,
the Y atoms are one or more of atoms selected from the group consisting of Mn, Cr, Fe, and V, and
the Z atoms are one or more of atoms selected from the group consisting of Se, Te, and Sb.
6. The magnetoresistance effect element according to claim 1 , wherein the metal compound has a crystal structure of a C1 b structure or a B2 structure.
7. The magnetoresistance effect element according to claim 1 , wherein
one of the first ferromagnetic layer and the second ferromagnetic layer contains a metal compound having a half-Heusler type crystal structure, and the other thereof contains a metal compound having a full-Heusler type crystal structure, and
the metal compound having a full-Heusler type crystal structure contains the X atoms, the Y atoms, and the Z atoms.
8. The magnetoresistance effect element according to claim 7 , wherein
the metal compound having a full-Heusler type crystal structure is expressed by a compositional formula Co 2 L α M β ,
L atoms include at least one of Mn and Fe atoms,
M atoms include at least one of Al, Si, Ge, and Ga atoms,
α satisfies 0.7<α<1.6, and
β satisfies 0.65<β<1.35.
9. The magnetoresistance effect element according to claim 1 , comprising:
an insertion layer between at least one of the first ferromagnetic layer and the second ferromagnetic layer, and the nonmagnetic spacer layer, wherein
the insertion layer contains Co, Fe, or a CoFe alloy.
10. The magnetoresistance effect element according to claim 9 , wherein a film thickness of the insertion layer is 0.2 nm or more and 1.2 nm or less.
11. The magnetoresistance effect element according to claim 1 , wherein the nonmagnetic spacer layer is a metal.
12. The magnetoresistance effect element according to claim 11 , wherein the nonmagnetic spacer layer is Ag or an Ag alloy.
13. A magnetoresistance effect element comprising:
a first ferromagnetic layer;
a second ferromagnetic layer; and
a nonmagnetic spacer layer between the first ferromagnetic layer and the second ferromagnetic layer; wherein
at least one of the first ferromagnetic layer and the second ferromagnetic layer contains a metal compound having a half-Heusler type crystal structure,
the metal compound contains a functional material, and X atoms, Y atoms, and Z atoms which form a unit lattice of the half-Heusler type crystal structure; and
the functional material has an atomic number lower than an atomic number of any of the X atoms, the Y atoms, and the Z atoms, wherein
the functional material is nitrogen, and
a composition proportion of the functional material in the metal compound is 0.09 at % or more and 7.2 at % or less,
the metal compound has a crystal structure of an A2 structure, a C1 b structure or a B2 structure,
the functional material penetrates between lattices of the half-Heusler type crystal structure.
14. A magnetoresistance effect element comprising:
a first ferromagnetic layer;
a second ferromagnetic layer; and
a nonmagnetic spacer layer between the first ferromagnetic layer and the second ferromagnetic layer; wherein
at least one of the first ferromagnetic layer and the second ferromagnetic layer contains a metal compound having a half-Heusler type crystal structure,
the metal compound contains a functional material, and X atoms, Y atoms, and Z atoms which form a unit lattice of the half-Heusler type crystal structure; and
the functional material has an atomic number lower than an atomic number of any of the X atoms, the Y atoms, and the Z atoms, wherein
the functional material is fluorine, and
a composition proportion of the functional material in the metal compound is 0.13 at % or more and 7.2 at % or less.
15. A magnetoresistance effect element comprising:
a first ferromagnetic layer;
a second ferromagnetic layer; and
a nonmagnetic spacer layer between the first ferromagnetic layer and the second ferromagnetic layer; wherein
at least one of the first ferromagnetic layer and the second ferromagnetic layer contains a metal compound having a half-Heusler type crystal structure,
the metal compound contains a functional material, and X atoms, Y atoms, and Z atoms which form a unit lattice of the half-Heusler type crystal structure; and
the functional material has an atomic number lower than an atomic number of any of the X atoms, the Y atoms, and the Z atoms, wherein
the functional material is one or more of atoms selected from the group consisting of Li, Be, O, Na and Mg.