Apparatus and method for plasma processing
An apparatus for plasma processing is configured to generate plasma in a chamber and periodically apply a pulsed negative DC voltage to an upper electrode from a DC power supply in the plasma processing on a substrate and in plasma cleaning. A duty ratio of the pulsed negative DC voltage used for the plasma processing is smaller than a duty ratio of the pulsed negative DC voltage used for the plasma cleaning. An absolute value of an average value of an output voltage of the DC power supply used for the plasma processing is smaller than an absolute value of an average value of the output voltage of the DC power supply used for the plasma cleaning.
1. An apparatus for plasma processing, comprising:
a chamber;
a substrate support including a lower electrode disposed in the chamber;
an upper electrode disposed above the substrate support;
an RF power supply configured to generate plasma in the chamber;
a DC power supply electrically connected to the upper electrode; and
a controller configured to control the RF power supply and the DC power supply,
wherein the chamber is grounded,
the DC power supply is configured to periodically generate a pulsed negative DC voltage,
an output voltage of the DC power supply is a negative DC voltage in a first period of a cycle and is 0V in a remaining second period of the cycle to periodically output the pulsed negative DC voltage, and
the controller is configured to
perform a first control in which the RF power supply supplies an RF power and the DC power supply periodically applies the pulsed negative DC voltage to the upper electrode to perform the plasma processing on a substrate mounted on the substrate support,
perform a second control in which the RF power supply supplies an RF power and the DC power supply periodically applies the pulsed negative DC voltage to the upper electrode to perform plasma cleaning on an inner wall surface of the chamber,
set a first duty ratio used for the first control to be smaller than a second duty ratio used for the second control, wherein each of the first duty ratio and the second duty ratio is a ratio of the first period to the cycle, and
set an absolute value of an average value of the output voltage of the DC power supply in the cycle in the first control to be smaller than an absolute value of an average value of the output voltage of the DC power supply in the cycle in the second control.
2. The apparatus of claim 1 , wherein a frequency that is a reciprocal of the cycle is 400 kHz or more.
3. The apparatus of claim 2 , wherein the frequency is 1 MHz or less.
4. The apparatus of claim 3 , wherein each of the first duty ratio and the second duty ratio is 20% or more and 50% or less.
5. The apparatus of claim 2 , wherein each of the first duty ratio and the second duty ratio is 20% or more and 50% or less.
6. The apparatus of claim 1 , wherein each of the first duty ratio and the second duty ratio is 20% or more and 50% or less.
7. A method of plasma processing performed by a plasma processing apparatus including a chamber, a substrate support including a lower electrode disposed in the chamber, an upper electrode disposed above the substrate support, an RF power supply configured to generate plasma in the chamber, and a DC power supply electrically connected to the upper electrode wherein the chamber is grounded, the DC power supply is configured to periodically generate a pulsed negative DC voltage, and an output voltage of the DC power supply is a negative DC voltage in a first period of a cycle and is 0V in a remaining second period of the cycle to periodically output the pulsed negative DC voltage,
the method comprising:
performing the plasma processing on a substrate mounted on the substrate support; and
performing plasma cleaning on an inner wall surface of the chamber,
wherein in said performing the plasma processing, the RF power supply supplies an RF power and the DC power supply periodically applies the pulsed negative DC voltage to the upper electrode, and
in said performing the plasma cleaning, the RF power supply supplies an RF power and the DC power supply periodically applies the pulsed negative DC voltage to the upper electrode,
wherein a first duty ratio used in said performing the plasma processing is smaller than a second duty ratio used in said performing the plasma cleaning, each of the first duty ratio and the second duty ratio being a ratio of the first period to the cycle, and
an absolute value of an average value of the output voltage of the DC power supply in the cycle in said performing the plasma processing is smaller than an absolute value of an average value of the output voltage of the DC power supply in the cycle in said performing the plasma cleaning.
8. The method of claim 7 , wherein a frequency that is a reciprocal of the cycle is 400 kHz or more.
9. The method of claim 8 , wherein the frequency is 1 MHz or less.
10. The method of claim 9 , wherein each of the first duty ratio and the second duty ratio is 20% or more and 50% or less.
11. The method of claim 8 , wherein each of the first duty ratio and the second duty ratio is 20% or more and 50% or less.
12. The method of claim 7 , wherein each of the first duty ratio and the second duty ratio is 20% or more and 50% or less.