IP Library › Granted Patent US 11,424,142
Granted Patent B2
US 11,424,142 · App. 16/813,952 · Granted Aug 23, 2022

Bonding system with cleaning apparatus for cleaning non-bonding surface of substrate

Inventors: Yuji Mimura (Koshi, JP); Hiroshi Maeda (Koshi, JP); Satoshi Nishimura (Koshi, JP)
Assignee: TOKYO ELECTRON LIMITED
H01L21/67092B24B7/00B24D3/00B32B37/00G06T7/0008H01J9/48H01J37/32H01J37/32009H01J37/32798H01J37/36H01L21/187H01L21/304H01L21/67288H01L22/12G06T2207/30148
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,424,142
App. No.
16/813,952
Granted
Aug 23, 2022
Kind
B2
Abstract

A bonding system includes a surface modifying apparatus configured to modify a bonding surface of a first substrate and a bonding surface of a second substrate; a surface hydrophilizing apparatus configured to hydrophilize the modified bonding surface of the first substrate and the modified bonding surface of the second substrate; a bonding apparatus configured to perform bonding of the hydrophilized bonding surface of the first substrate and the hydrophilized bonding surface of the second substrate in a state that the bonding surfaces face each other; and a cleaning apparatus configured to clean, before the bonding is performed, a non-bonding surface of, between the first substrate and the second substrate, at least one which is maintained flat when the bonding is performed, the not-bonding surface being opposite to the bonding surface.

Claims (27)

1. A bonding system, comprising:

a surface modifying apparatus configured to modify a bonding surface of a first substrate and a bonding surface of a second substrate;

a surface hydrophilizing apparatus configured to hydrophilize the modified bonding surface of the first substrate and the modified bonding surface of the second substrate;

a bonding apparatus configured to perform bonding of the hydrophilized bonding surface of the first substrate and the hydrophilized bonding surface of the second substrate in a state that the bonding surfaces face each other; and

a cleaning apparatus configured to clean, before the bonding is performed, a non-bonding surface of, between the first substrate and the second substrate, at least one which is maintained flat when the bonding is performed, the not-bonding surface being opposite to the bonding surface.

2. The bonding system of claim 1 ,

wherein the cleaning apparatus is equipped with a polishing member configured to polish the non-bonding surface.

3. The bonding system of claim 2 ,

wherein the polishing member comprises an abrasive sheet containing diamond abrasive particles.

4. The bonding system of claim 1 ,

wherein the cleaning apparatus comprises a roughening member configured to roughen the non-bonding surface.

5. The bonding system of claim 4 ,

wherein the roughening member roughens the non-bonding surface of, between the first substrate and the second substrate, one which is deformed when the bonding is performed, except a peripheral portion thereof.

6. The bonding system of claim 1 ,

wherein the cleaning apparatus cleans at least a peripheral portion of the non-bonding surface.

7. The bonding system of claim 1 ,

wherein the cleaning apparatus comprises an embedded cleaning device disposed within the surface hydrophilizing apparatus.

8. The bonding system of claim 1 , further comprising:

an inspection apparatus configured to inspect, before the bonding is performed, presence or absence of a deposit adhering to the non-bonding surface.

9. The bonding system of claim 8 , further comprising:

a transfer device configured to transfer the first substrate and the second substrate; and

a control device configured to transfer, between the first substrate and the second substrate, at least one which is maintained flat when the bonding is performed, into the cleaning apparatus and the inspection apparatus in this sequence.

10. The bonding system of claim 8 , further comprising:

a transfer device configured to transfer the first substrate and the second substrate; and

a control device configured to transfer, between the first substrate and the second substrate, at least one which is maintained flat when the bonding is performed, into the inspection apparatus and the cleaning apparatus in this sequence.

11. The bonding system of claim 9 ,

wherein the control device transfers, between the first substrate and the second substrate, one which is found to have the deposit as a result of the inspection in the inspection apparatus, into the cleaning apparatus by using the corresponding transfer device.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 10, 2020
From: MIMURA, YUJI; MAEDA, HIROSHI; NISHIMURA, SATOSHI
To: TOKYO ELECTRON LIMITED
Reel/Frame 052065/0326 →
Priority Claims (2)
JP JP2019-046314 · Mar 13, 2019 · national
JP JP2019-166325 · Sep 12, 2019 · national
Continuity (1)
Related Publication 20200294824A1 · Sep 17, 2020
Cited By (1)
US 12,506,112