Cleaning method and plasma processing apparatus
A cleaning method is provided. In the cleaning method, a cleaning gas is supplied into a processing chamber, a radio frequency (RF) power for plasma generation is applied to one of a first electrode on which a substrate is to be mounted and a second electrode disposed to be opposite to the first electrode in the processing chamber, and a negative voltage is applied to an edge ring disposed to surround the substrate. Further, plasma is generated from the cleaning gas and a cleaning process using the plasma is performed.
1. A cleaning method comprising:
(a) supplying a cleaning gas into a processing chamber;
(b) applying a radio frequency (RF) power for plasma generation to one of a first electrode on which a substrate is to be mounted and a second electrode disposed to be opposite to the first electrode in the processing chamber;
(c) applying a negative voltage to an edge ring disposed to surround the substrate; and
(d) generating plasma from the cleaning gas and performing a cleaning process using the plasma.
2. The cleaning method of claim 1 , wherein in (d), no substrate is mounted on the first electrode.
3. The cleaning method of claim 2 , wherein in (c), the applied negative voltage is equal to or greater than −500 V and less than 0 V.
4. The cleaning method of claim 1 , wherein in (d), the edge ring, an outer periphery of the substrate disposed at a vicinity of the edge ring, and a cover ring disposed to surround the edge ring are cleaned.
5. The cleaning method of claim 1 , wherein the cleaning gas is an oxygen containing gas.
6. The cleaning method of claim 1 , further comprising:
(e) determining whether or not a predetermined period of time has elapsed after (d) is started; and
(f) stopping, when it is determined in (e) that the predetermined period of time has elapsed, the supply of the cleaning gas, the application of the RF power and the application of the negative voltage.
7. The cleaning method of claim 1 , wherein (b), (c) and (d) are performed simultaneously.
8. The cleaning method of claim 1 , wherein (c) is performed after (b).
9. The cleaning method of claim 6 , wherein in (f), the supply of the cleaning gas, the application of the RF power and the application of the negative voltage are stopped simultaneously.
10. The cleaning method of claim 6 , wherein in (f), the application of the RF power is stopped after the application of the negative voltage is stopped.
11. The cleaning method of claim 1 , wherein (d) is performed in a state where a dummy wafer is mounted on the first electrode.
12. The cleaning method of claim 11 , wherein in (c), a voltage of −500V or less is applied.
13. The cleaning method of claim 1 , wherein in (c), a negative DC voltage is applied.
14. The cleaning method of claim 13 , wherein (c), an additional RF power that has a frequency lower than that of the RF power or an RF power having a frequency that is substantially equal to a frequency of the additional RF power is applied to the edge ring together with the negative DC voltage.
15. The cleaning method of claim 1 , wherein the RF power for plasma generation is generated from an RF power supply and the negative voltage is generated from an additional power supply connected to the edge ring.
16. A plasma processing apparatus comprising:
a processing chamber;
a first electrode on which a substrate is to be mounted in the processing chamber;
a second electrode disposed to be opposite to the first electrode;
an edge ring disposed to surround the substrate; and
a controller configured to cause
(a) supplying a cleaning gas into the processing chamber;
(b) applying a radio frequency (RF) power for plasma generation to one of the first electrode and the second electrode;
(c) applying a negative voltage to the edge ring, and
(d) generating plasma from the cleaning gas and performing a cleaning process using the plasma.
17. The plasma processing apparatus of claim 16 , wherein the RF power for plasma generation is generated from an RF power supply and the negative voltage is generated from an additional power supply connected to the edge ring.