Semiconductor devices
A semiconductor device includes a first transistor, a division pattern, and a second transistor sequentially stacked on a substrate. The first transistor includes a first gate structure, a first source/drain layer at each of opposite sides of the first gate structure, and first semiconductor patterns spaced apart from each other in a vertical direction. Each of the first semiconductor patterns extends through the first gate structure and contacts the first source/drain layer. The division pattern includes an insulating material. The second transistor includes a second gate structure, a second source/drain layer at each of opposite sides of the second gate structure, and second semiconductor patterns spaced apart from each other in the vertical direction. Each of the second semiconductor patterns extends through the second gate structure and contacts the second source/drain layer. The first source/drain layer does not directly contact the second source/drain layer.
1. A semiconductor device, comprising:
a substrate;
a first transistor on the substrate,
the first transistor including a first gate structure, a first source/drain layer at each of opposite sides of the first gate structure, and first semiconductor patterns spaced apart from each other in a vertical direction that is substantially perpendicular to an upper surface of the substrate,
a distance in the vertical direction between an upper surface of the substrate and a lowermost surface of the first gate structure being less than a distance in the vertical direction between the upper surface of the substrate and a lowermost surface of the first source/drain layer, and
each of the first semiconductor patterns extending through the first gate structure and contacting the first source/drain layer;
a division pattern on the first transistor, the division pattern including an insulating material; and
a second transistor on the division pattern,
the second transistor including a second gate structure, a second source/drain layer at each of opposite sides of the second gate structure, and second semiconductor patterns spaced apart from each other in the vertical direction,
each of the second semiconductor patterns extending through the second gate structure and contacting the second source/drain layer, and
the second source/drain layer does not directly contact the first source/drain layer.
2. The semiconductor device of claim 1 , wherein
the first source/drain layer includes silicon-germanium doped with p-type impurities; and
the second source/drain layer includes silicon doped with n-type impurities or silicon carbide doped with n-type impurities.
3. The semiconductor device of claim 1 , wherein
each of the first source/drain layer and the second source/drain layer include silicon-germanium doped with p-type impurities, silicon doped with n-type impurities, or silicon carbide doped with n-type impurities.
4. The semiconductor device of claim 1 , wherein
the first gate structure includes a first gate insulation pattern, a first workfunction control pattern, and a first gate electrode;
the second gate structure includes a second gate insulation pattern, a second workfunction control pattern, and a second gate electrode;
a material included in the first gate insulation pattern is substantially the a same material as a material included in the second gate insulation pattern;
a thickness of the first gate insulation pattern is substantially the same as a thickness of the second gate insulation pattern, a material included in the first workfunction control pattern and is substantially the same as a material included the second workfunction control pattern;
a thickness of the first workfunction control pattern is substantially equal to a thickness of the second workfunction control pattern;
a material included the first gate electrode is substantially the same as a material included in the second gate electrode; and
a thickness of the first gate electrode is substantially the same as a thickness of the second gate electrode.
5. The semiconductor device of claim 4 , wherein
the second workfunction control pattern covers a sidewall and a lower surface of the second gate electrode, and
the first workfunction control pattern covers a sidewall, a lower surface and an upper surfaces of the first gate electrode.
6. The semiconductor device of claim 1 , wherein
the first gate structure includes a first gate insulation pattern, a first workfunction control pattern, and a first gate electrode;
the second gate structure includes a second gate insulation pattern, a second workfunction control pattern and a second gate electrode;
a material included in the first gate insulation pattern is substantially a same material as a material included in the second gate insulation pattern;
a thickness of the first workfunction control pattern is substantially equal to a thickness of the second workfunction control pattern; and
a material of first gate electrode is different than a material of the second gate electrode.
7. The semiconductor device of claim 1 , further comprising:
a third gate structure on the substrate, wherein
the first source/drain layer is at each of opposite sides of the first gate structure in a first direction substantially parallel to the upper surface of the substrate;
the second source/drain layer is at each of opposite sides of the second gate structure in the first direction; and
the third gate structure is at opposite sides in a second direction of the first gate structure and the second gate structure;
the second direction is substantially parallel to the upper surface of the substrate and substantially perpendicular to the first direction; and
the third gate structure extends in the vertical direction.
8. The semiconductor device of claim 7 , wherein
a lower surface of the third gate structure is substantially coplanar with a lower surface of the first gate structure; and
an upper surface of the third gate structure is substantially coplanar with an upper surface of the second gate structure.
9. The semiconductor device of claim 1 , further comprising:
a third gate structure and a fourth gate structure on the substrate, wherein
the first source/drain layer is at each of opposite sides of the first gate structure in a first direction substantially parallel to the upper surface of the substrate; and
the second source/drain layer is at each of opposite sides of the second gate structure in the first direction;
the third gate structure is at each of opposite sides of the first gate structure in a second direction substantially parallel to the upper surface of the substrate and substantially perpendicular to the first direction;
the third gate structure contacts the first gate structure; and
the fourth gate structure is at each of opposite sides of the second gate structure in the second direction;
a material in the fourth gate structure is different than a material in the third gate structure; and
the fourth gate structure contacts the third gate structure.
10. The semiconductor device of claim 9 , wherein
a lower surface of the third gate structure is substantially coplanar with a lower surface of the first gate structure; and
an upper surface of the fourth gate structure is substantially coplanar with an upper surface of the second gate structure.
11. The semiconductor device of claim 1 , further comprising:
a connection plug extending through an upper portion of the first source/drain layer and the second source/drain layer, the connection plug electrically connecting the first source/drain layer and the second source/drain layer with each other.
12. The semiconductor device of claim 1 , further comprising:
an inner spacer between a portion of the second gate structure and the second source/drain layer, the portion of the second gate structure being between the second semiconductor patterns, and the inner spacer including an insulating material.
13. A semiconductor device, comprising:
a substrate;
a gate structure on the substrate, the gate structure extending in a first direction substantially parallel to an upper surface of the substrate,
the first direction crossing a second direction,
the second direction being substantially parallel to the upper surface of the substrate,
the gate structure extending in a third direction and including a lower portion and an upper portion divided at a height over the substrate, and
the third direction being substantially perpendicular to the upper surface of the substrate;
a division pattern extending partially through the gate structure in the second direction on the substrate,
the division pattern including an insulating material,
the division pattern being arranged such that the lower portion and the upper portion of the gate structure contact each other at an area where the division pattern is not formed, and
the height over the substrate where the lower portion and the upper portion of the gate structure are divided corresponds to a central portion of the division pattern in the third direction;
a first source/drain layer at each of opposite sides in the second direction of the gate structure, the first source/drain layer being under the division pattern, and the lower portion of the gate structure and the first source/drain layer defining a first transistor, and a distance in a vertical direction between an upper surface of the substrate and a lowermost surface of the lower portion of the gate structure being less than a distance in the vertical direction between the upper surface of the substrate and a lowermost surface of the first source/drain layer; and
a second source/drain layer at each of opposite sides in the second direction of the gate structure, the second source/drain layer being over the division pattern,
the second source/drain layer and the first source/drain layer being spaced apart from each other by the division pattern in the third direction, and the upper portion of the gate structure and the second source/drain layer define a second transistor.
14. The semiconductor device of claim 13 , further comprising:
a plurality of division patterns on the substrate that are spaced apart from each other in the first direction, wherein
the plurality of division patterns include the division pattern.
15. The semiconductor device of claim 13 , further comprising:
first semiconductor patterns spaced apart from each other in the third direction, each of the first semiconductor patterns extending through the lower portion of the gate structure to contact the first source/drain layer; and
second semiconductor patterns spaced apart from each other in the third direction, each of the second semiconductor patterns extending through the upper portion of the gate structure to contact the second source/drain layer; and
wherein the lower portion of the gate structure is between the first semiconductor patterns; and
wherein the upper portion of the gate structure is between the second semiconductor patterns.
16. The semiconductor device of claim 13 , wherein
the first source/drain layer includes silicon-germanium doped with p-type impurities; and
the second source/drain layer includes silicon doped with n-type impurities or silicon carbide doped with n-type impurities.
17. The semiconductor device of claim 13 , wherein the first source/drain layer and the second source/drain layer each include silicon-germanium doped with p-type impurities, silicon doped with n-type impurities, or silicon carbide doped with n-type impurities.
18. The semiconductor device of claim 13 , further comprising:
a connection plug extending through an upper portion of the first source/drain layer and the second source/drain layer, wherein
the connection plug electrically connects the first source/drain layer and the second source/drain layer to each other.
19. A semiconductor device, comprising:
a substrate;
a first insulating interlayer on the substrate;
a gate structure on the first insulating interlayer, the gate structure extending in a first direction substantially parallel to an upper surface of the substrate;
first source/drain layers on the first insulating interlayer, the first source/drain layers contacting lower portions of opposite sidewalls, respectively, in a second direction of the gate structure,
the second direction being substantially parallel to the upper surface of the substrate and crossing the first direction;
a first wiring structure in the first insulating interlayer, the first wiring structure contacting one of the first source/drain layers;
a division pattern extending through the gate structure to contact upper surfaces of the first source/drain layers;
second source/drain layers contacting upper portions of opposite sidewalls, respectively, in the second direction of the gate structure;
a connection plug extending through one of the second source/drain layers, the division pattern and one of the first source/drain layers;
a second insulating interlayer on the gate structure, the connection plug and the second source/drain layers; and
a second wiring structure in the second insulating interlayer, the second wiring structure contacting one of the second source/drain layers.
20. The semiconductor device of claim 19 , wherein
a lower portion of the gate structure is under the division pattern and an upper portion of the gate structure is over the division patter;
the lower portion of the gate structure and the first source/drain layers define a first transistor,
the upper portion of the gate structure and the second source/drain layers define a second transistor;
the first transistor and the second transistor are symmetrical with respect to the division pattern in a third direction; and
the third direction is substantially perpendicular to the upper surface of the substrate.