Extreme ultraviolet light generation apparatus and electronic device manufacturing method
An extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target with a pulse laser beam includes: a chamber; a magnet that is positioned outside the chamber and forms a magnetic field ( 70 ) inside the chamber; a discharge path ( 37 a ) that is opened at a position on an inner wall surface of the chamber where the inner wall surface intersects a central axis of the magnetic field ( 70 ) and through which gas inside the chamber is discharged; and a gas supply unit ( 10 a ) configured to supply gas into the discharge path ( 37 a ) through an inner wall surface of the discharge path.
1. An extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target with a pulse laser beam, the extreme ultraviolet light generation apparatus comprising:
a chamber;
a magnet positioned outside the chamber, the magnet forming a magnetic field inside the chamber;
a discharge path that is opened at a position on an inner wall surface of the chamber where the inner wall surface intersects a central axis of the magnetic field and through which gas inside the chamber is discharged; and
a gas supply unit configured to supply gas into the discharge path through an inner wall surface of the discharge path.
2. The extreme ultraviolet light generation apparatus according to claim 1 , wherein
a groove is formed in the inner wall surface of the discharge path, and
the gas supply unit is opened to the groove.
3. The extreme ultraviolet light generation apparatus according to claim 2 , wherein the groove has a shape that is long in a direction different from the direction of discharge in the discharge path.
4. The extreme ultraviolet light generation apparatus according to claim 1 , wherein
a plurality of grooves are formed in the inner wall surface of the discharge path, and
the gas supply unit is opened to each groove.
5. The extreme ultraviolet light generation apparatus according to claim 1 , wherein the gas supply unit supplies gas from around the position on the inner wall surface of the chamber where the inner wall surface intersects the central axis of the magnetic field.
6. The extreme ultraviolet light generation apparatus according to claim 1 , wherein gas supplied by the gas supply unit contains hydrogen gas.
7. The extreme ultraviolet light generation apparatus according to claim 1 , further comprising a chamber gas supply unit configured to supply gas into the chamber, wherein an amount of gas supplied into the discharge path is smaller than an amount of gas supplied into the chamber.
8. The extreme ultraviolet light generation apparatus according to claim 7 , wherein the amount of gas supplied into the discharge path is 1/40 to ⅕ inclusive of the amount of gas supplied into the chamber.
9. The extreme ultraviolet light generation apparatus according to claim 1 , wherein
the discharge path is connected with a discharge pump, and
the gas supply unit supplies gas in a first amount from a first position at the inner wall surface of the discharge path, and supplies gas in a second amount larger than the first amount from a second position at the inner wall surface of the discharge path, the second position being farther from the discharge pump than the first position.
10. The extreme ultraviolet light generation apparatus according to claim 1 , wherein the gas supply unit ejects gas through the inner wall surface of the discharge path toward the position at which the discharge path is opened to the inner wall surface of the chamber.
11. The extreme ultraviolet light generation apparatus according to claim 1 , wherein
a hole is formed in the inner wall surface of the discharge path, and
the gas supply unit is connected with the hole.
12. The extreme ultraviolet light generation apparatus according to claim 1 , wherein
a plurality of holes are formed in the inner wall surface of the discharge path, and
the gas supply unit is connected with each hole.
13. The extreme ultraviolet light generation apparatus according to claim 1 , further comprising a cooling unit configured to cool the inner wall surface of the discharge path.
14. The extreme ultraviolet light generation apparatus according to claim 13 , wherein the cooling unit includes a refrigerant path disposed in a member forming the inner wall surface of the discharge path, and a refrigerant pump configured to supply a cooling medium to the refrigerant path.
15. The extreme ultraviolet light generation apparatus according to claim 1 , wherein the inner wall surface of the discharge path includes a first member connected with the chamber, and a second member configured to be detachable from the first member.
16. The extreme ultraviolet light generation apparatus according to claim 15 , wherein the gas supply unit supplies gas through an inner wall surface of the second member.
17. The extreme ultraviolet light generation apparatus according to claim 1 , wherein
the inner wall surface of the discharge path includes a tilt surface tilted relative to the central axis of the magnetic field, and
the gas supply unit supplies gas through the tilt surface.
18. An electronic device manufacturing method comprising:
generating extreme ultraviolet light by irradiating a target with a pulse laser beam in an extreme ultraviolet light generation apparatus including
a chamber,
a magnet that is positioned outside the chamber and forms a magnetic field inside the chamber,
a discharge path that is opened at a position on an inner wall surface of the chamber where the inner wall surface intersects a central axis of the magnetic field and through which gas inside the chamber is discharged, and
a gas supply unit configured to supply gas into the discharge path through an inner wall surface of the discharge path;
emitting the extreme ultraviolet light to an exposure apparatus; and
exposing a photosensitive substrate to the extreme ultraviolet light in the exposure apparatus to manufacture an electronic device.