Test array structure, wafer structure and wafer testing method
A test array structure includes a substrate, first and second cells, first and second bit-line rings and four word-lines. Each of the first and second cells has a first drain region, a first gate region, a source region, a second gate region and a second drain region connected together in sequence. The first drain region and the first gate region of the first cell are located within the first bit-line ring. The second drain region and the second gate region of the first cell are located between the first and second bit-line rings. The first drain region and the first gate region of the second cell is located within the second bit-line ring. The second drain region of the first cell and the first drain region of the second cell are located between the two immediately-adjacent word-lines.
1. A test array structure, comprising:
a substrate;
a first cell and a second cell, wherein each of the first and second cells has a first drain region, a first gate region, a source region, a second gate region and a second drain region connected together in sequence;
a first bit-line ring and a second bit-line ring located on the substrate, wherein the first drain region and the first gate region of the first cell are located within the first bit-line ring, the second drain region and the second gate region of the first cell is located between the first and second bit-line rings, the first drain region and the first gate region of the second cell is located within the second bit-line ring, and the second drain region and the second gate region of the second cell is located beyond the first and second bit-line rings; and
a first word-line, a second word-line, a third word-line and a fourth word-line located over the first and second bit-line rings, wherein the second drain region of the first cell and the first drain region of the second cell is located between the second and third word-lines.
2. The test array structure of claim 1 , wherein each of the first and second bit-line rings is a closed oval ring extending along a first direction.
3. The test array structure of claim 2 , wherein the first, second, third and fourth word-lines are parallel to each other and extend along a second direction intersecting the first direction.
4. The test array structure of claim 1 , further comprising:
a plurality of capacitors, wherein each of the first and second drain regions is connected to corresponding one of the capacitors.
5. The test array structure of claim 1 , wherein the source region of the first cell is located under and connected to the first bit-line ring, and the source region of the second cell is located under and connected to the second bit-line ring.
6. The test array structure of claim 1 , wherein the first gate region of the first cell is located under and connected to the first word-line, the second gate region of the first cell is located under and connected to the second word-line, the first gate region of the second cell is located under and connected to the third word-line, and the second gate region of the second cell is located under and connected to the fourth word-line.
7. The test array structure of claim 1 , further comprising:
a third cell having a first drain region, a first gate region, a source region, a second gate region and a second drain region connected together in sequence, wherein the first drain region and the first gate region of the third cell is located between the first and second bit-line ring, the second drain region and the second gate region of the third cell is located within the second bit-line ring.
8. The test array structure of claim 1 , wherein each of the first and second cells has two channel regions located under the corresponding first and second gate regions respectively.
9. A wafer structure comprising a plurality of chips, and at least one of the chips having the test array structure of claim 1 .
10. A wafer testing method comprising:
providing a wafer structure having the test array structure of claim 1 ;
applying an “on” voltage to the first bit-line ring and an “off” voltage to the second bit-line ring;
applying “on” voltages to the first, second, third and fourth word-line and measuring a first leakage amplitude which is a current between the second drain region of the first cell to drain region of the second cell;
applying “off” voltages to the first and the third word-line, applying “on” voltages to the second and fourth word-line, and measuring a second leakage amplitude which is a current between the second drain region of the first cell and the first drain region of the second cell;
comparing the first leakage amplitude and the second leakage amplitude to determine whether a leakage of the first and second cells appears; and
marking the wafer structure as a failure wafer if the leakage of the first and second cells appears.
11. The wafer testing method of claim 10 , wherein the test array structure further comprises a third cell having a first drain region, a first gate region, a source region, a second gate region and a second drain region connected together in sequence, wherein the first drain region and the first gate region of the third cell is located between the first and second bit-line ring, the second drain region and the second gate region of the third cell is located within the second bit-line ring, the wafer testing method further comprising:
measuring a third leakage amplitude which is a current between the second drain region of the first cell and the first drain region of the third cell;
determining whether a leakage of the first and third cells appears according to the third leakage amplitude; and
marking the wafer structure as a failure wafer if the leakage of the first and third cells appears.