Semiconductor device with dummy fin and liner and method of forming the same
Semiconductor device and the manufacturing method thereof are disclosed. An exemplary semiconductor device comprises semiconductor layers over a substrate, wherein the semiconductor layers are separated from each other and are stacked up along a direction substantially perpendicular to a top surface of the substrate; a gate structure wrapping each of the semiconductor layers; a spacer structure wrapping an edge portion of each of the semiconductor layers; and a dummy fin structure contacting a sidewall of the gate structure, wherein the dummy fin structure is separated from a sidewall of the spacer structure by a dielectric liner.
1. A semiconductor device comprising:
semiconductor layers over a substrate, wherein the semiconductor layers are separated from each other and are stacked up along a direction substantially perpendicular to a top surface of the substrate;
a gate structure wrapping each of the semiconductor layers;
a spacer structure wrapping an edge portion of each of the semiconductor layers; and
a dummy fin structure contacting a sidewall of the gate structure, wherein the dummy fin structure is separated from a sidewall of the spacer structure by a dielectric liner.
2. The semiconductor device of claim 1 , further comprising an isolation feature isolating active regions of the semiconductor device, wherein the dielectric liner is disposed between the dummy fin structure and the isolation feature.
3. The semiconductor device of claim 1 , wherein the dielectric liner includes a dielectric material having silicon and oxygen.
4. The semiconductor device of claim 1 , wherein a thickness of the dielectric liner is about 1 nm to about 2 nm.
5. The semiconductor device of claim 1 , further comprising an epitaxial source/drain (S/D) feature contacting a sidewall of the dummy fin structure.
6. The semiconductor device of claim 1 , wherein the gate structure includes a gate dielectric layer wrapping a middle portion of each of the semiconductor layers and a gate electrode over the gate dielectric layer and contacting the dummy fin structure.
7. The semiconductor device of claim 1 , wherein the spacer structure includes a gate spacer over a topmost semiconductor layer and an inner spacer below the gate spacer.
8. The semiconductor device of claim 7 , wherein the dummy fin structure includes a top portion and a bottom portion below the top portion, the top portion of the dummy fin structure is separated from the gate spacer by the dielectric liner and the bottom portion of the dummy fin structure is separated from the inner spacer by the dielectric liner.
9. The semiconductor device of claim 8 , wherein a bottom surface of the top portion of the dummy fin structure is below a top surface of the topmost semiconductor layer.
10. The semiconductor device of claim 8 , wherein the dummy fin structure includes one or more low-k dielectric materials different than the dielectric material of the dielectric liner.
11. A method of forming a semiconductor device, comprising:
forming a semiconductor stack including alternate first semiconductor layers and second semiconductor layers over a substrate, wherein the first semiconductor layers and the second semiconductor layers include different materials and are stacked up along a direction generally perpendicular to a top surface of the substrate;
conformally depositing a dielectric liner along a sidewall of the semiconductor stack;
forming a dummy fin structure along a sidewall of the dielectric liner;
forming a dummy gate structure over the semiconductor stack;
forming a spacer structure wrapping edge portions of the first semiconductor layers; and
replacing the dummy gate structure with a metal gate structure wrapping middle portions of the first semiconductor layers.
12. The method of claim 11 , further comprising forming an isolation feature isolating active regions of the semiconductor device, wherein the dielectric liner is conformally deposited between the isolation feature and the dummy fin structure.
13. The method of claim 12 , wherein the forming the dummy fin structure includes:
conformally forming a first dummy layer over the dielectric liner to form a dummy trench;
depositing a second dummy layer in the dummy trench;
recessing the first dummy layer and the second dummy layer below a top surface of a topmost first semiconductor layer; and
depositing a third dummy layer over the recessed first dummy layer and the second dummy layer.
14. The method of claim 11 , wherein the forming a dummy gate structure includes:
removing a top portion of the semiconductor stack to expose a top surface of a topmost first semiconductor layer;
depositing dummy gate layers over the semiconductor stack, the dielectric liner, and the dummy fin structure; and
patterning the dummy gate layers to form the dummy gate structure.
15. The method of claim 11 , wherein the forming the spacer structure includes:
forming a gate spacer along a sidewall of the dummy gate structure, wherein the gate spacer contacts the dielectric liner;
etching the semiconductor stack along a sidewall of the gate spacer to form a source/drain (S/D) trench, wherein edge portions of the first semiconductor layers and the second semiconductor layers are exposed in the S/D trench;
selectively removing the edge portions of the second semiconductor layers from the S/D trench; and
forming an inner spacer to fill in the removed edge portions of the second semiconductor layers, wherein the inner spacer contacting the dielectric liner.
16. The method of claim 15 , further comprising:
removing a portion of the dielectric liner exposed in the S/D trench; and
epitaxially growing a S/D feature in the S/D trench.
17. A method of forming a semiconductor device, comprising:
forming a semiconductor stack including alternate first semiconductor layers and second semiconductor layers over a substrate, wherein the first semiconductor layers and the second semiconductor layers include different materials and are stacked up along a direction generally perpendicular to a top surface of the substrate;
depositing a third semiconductor layer around the semiconductor stack, wherein the third semiconductor layer includes the same material as the second semiconductor layers;
conformally depositing a dielectric liner along a sidewall of the third semiconductor layer;
forming a dummy fin structure along the dielectric liner;
forming a dummy gate structure over the semiconductor stack;
forming a gate spacer along a sidewall of the dummy gate structure;
forming an inner spacer between edge portions of the first semiconductor layers;
removing the dummy gate structure to form a gate trench;
selectively removing the second semiconductor layers, the third semiconductor layer, and a portion of the dielectric liner exposed in the gate trench; and
forming a metal gate structure wrapping middle portions of the first semiconductor layers exposed in the gate trench.
18. The method of claim 17 , wherein the forming the inner spacer includes:
etching the semiconductor stack along a sidewall of the gate spacer to form a source/drain (S/D) trench, wherein edge portions of the first semiconductor layers, the second semiconductor layers, and the third semiconductor layers are exposed in the S/D trench;
selectively removing the edge portions of the second semiconductor layers and the third semiconductor layers from the S/D trench;
depositing an inner spacer layer in the S/D trench; and
removing a portion of the inner spacer layer along the gate spacer until the edge portions of the first semiconductor layers are exposed in the S/D trench.
19. The method of claim 18 , further comprising:
removing a portion of the dielectric liner along the dummy fin structure exposed in the S/D trench; and
epitaxially growing an S/D feature from the substrate in the S/D trench, wherein a top surface of the S/D feature is below a top surface of the dummy fin structure.
20. The method of claim 17 , wherein the dielectric liner is conformally deposited for a thickness of about 1 nm to about 2 nm.