Semiconductor device and manufacturing method thereof
A semiconductor device includes a fin structure disposed over a substrate, a gate structure and a source. The fin structure includes an upper layer being exposed from an isolation insulating layer. The gate structure disposed over part of the upper layer of the fin structure. The source includes the upper layer of the fin structure not covered by the gate structure. The upper layer of the fin structure of the source is covered by a crystal semiconductor layer. The crystal semiconductor layer is covered by a silicide layer formed by Si and a first metal element. The silicide layer is covered by a first metal layer. A second metal layer made of the first metal element is disposed between the first metal layer and the isolation insulating layer.
1. A semiconductor device comprising:
a fin structure disposed over a substrate, the fin structure including an upper layer being located above an upper surface of an isolation insulating layer;
a gate structure disposed over part of the upper layer of the fin structure; and
a source which includes the upper layer of the fin structure, is located above the upper surface of the isolation insulating layer and is not covered by the gate structure, wherein:
the source of the upper layer of the fin structure, which is located above the upper surface of the isolation insulating layer, is covered by a crystal semiconductor layer,
the crystal semiconductor layer is covered by a first silicide layer formed by Si and a first metal element and a second silicide layer formed by Si and a second metal element different from the first metal element, and
the second silicide layer is in direct contact with a different portion of the crystal semiconductor layer than a portion of the crystal semiconductor layer with which the first silicide layer is in direct contact.
2. The semiconductor device of claim 1 , wherein the first and second silicide layers are covered by a first metal layer containing the second metal element.
3. The semiconductor device of claim 2 , further comprising a second metal layer made of the first metal element disposed between the first metal layer and the isolation insulating layer and in direct contact with the isolation insulating layer.
4. The semiconductor device of claim 3 , wherein a thickness of the second metal layer is in a range from 0.5 nm to 3 nm.
5. The semiconductor device of claim 3 , wherein the second metal layer is in contact with the first silicide layer.
6. The semiconductor device of claim 1 , wherein the first metal element is at least one of Co, Ti, Ta, W and Ni.
7. The semiconductor device of claim 1 , wherein the second metal element is at least one of Co, Ti, Ta, W and Ni.
8. The semiconductor device of claim 1 , wherein the crystal semiconductor layer is doped with impurities at an amount of 2×10 20 cm −3 to 1×10 21 cm −3 .
9. The semiconductor device of claim 8 , wherein the impurities are phosphorous.
10. The semiconductor device of claim 1 , wherein the first metal element has a lower silicide formation temperature than a second metal element.
11. The semiconductor device of claim 1 , wherein the crystal semiconductor layer is disposed on a top face and side faces of the upper layer of the fin structure of the source and fully covers the upper layer of the fin structure of the source.
12. The semiconductor device of claim 10 , wherein the first silicide layer is disposed on side faces of the crystal semiconductor and the second silicide layer is disposed on a top face of the crystal semiconductor.
13. A semiconductor device comprising:
a first fin structure and a second fin structure both disposed over a substrate, each of the first and second fin structures including an upper layer being located above an upper surface of an isolation insulating layer, wherein:
each of the first and second fin structures includes a source region and a drain region, which are located above the upper surface of the isolation insulating layer,
each of the source and the drain regions of the upper layer of each of the first and second fin structures, which is located above the upper surface of the isolation insulating layer, is covered by a crystal semiconductor layer,
the crystal semiconductor layer is covered by a first silicide layer formed by Si and a first metal element and a second silicide layer formed by Si and a second metal element different from the first metal element, and
the second silicide layer is in direct contact with a different portion of the crystal semiconductor layer than a portion of the crystal semiconductor layer with which the first silicide layer is in direct contact.
14. The semiconductor device of claim 13 , wherein the first and second silicide layers are covered by a first metal layer containing the second metal element.
15. The semiconductor device of claim 14 , wherein the first and second silicide layers disposed over the first fin structure are discontinuous from the first and second silicide layers disposed over the second fin structure, respectively.
16. The semiconductor device of claim 15 , wherein a second metal layer made of the first metal element is disposed between the first metal layer and the isolation insulating layer and in direct contact with the isolation insulating layer.
17. The semiconductor device of claim 16 , wherein the second metal layer is disposed between the silicide layer disposed over the first fin structure and the silicide layer disposed over the second fin structure.
18. A semiconductor device comprising:
a first fin structure, a second fin structure and a third fin structure, all disposed over a substrate, each of the first to third fin structures including an upper layer located above an upper surface of an isolation insulating layer, wherein:
each of the first to third fin structures includes a source region and a drain region, which are located above the upper surface of the isolation insulating layer,
each of the source and the drain regions of the upper layer, which is located above the upper surface of the isolation insulating layer, of each of the first to third fin structures is covered by a crystal semiconductor layer,
the crystal semiconductor layer is covered by a silicide layer,
the silicide layer is covered by a first metal layer made of a first metal element, and
a second metal layer made of a second metal element different from the first metal element is disposed between the first metal layer and the isolation insulating layer and between the source regions of first and the second fin structures.
19. The semiconductor device of claim 18 , wherein:
the silicide layer includes a first silicide layer formed by Si and the first metal element and a second silicide layer formed by Si and the second metal element, and
the second silicide layer covers a different portion of the crystal semiconductor layer than the first silicide layer.
20. The semiconductor device of claim 19 , wherein the first metal layer fully fills spaces between the source regions of first and the second fin structures and the source regions of second and the third fin structures.