Impedance matching network and method
In one embodiment, a method of impedance matching and controlling the power delivered to a plasma chamber is disclosed. A matching network includes a variable reactance element (VRE), the VRE having different positions for providing different reactances. Based on a determined parameter, the method determines potential new positions for the VRE that would have a threshold effectiveness in providing an impedance match between the RF source and the plasma chamber. A preferred position for the VRE is determined by determining the one of the potential new positions meeting the threshold effectiveness whose efficiency in delivering RF power from the RF input to the RF output would cause an RF power at the RF output to be closest to a desired RF power.
1. An impedance matching network comprising:
an RF input configured to operably couple to an RF source;
an RF output configured to operably couple to a plasma chamber;
a variable reactance element (VRE), the VRE having different positions for providing different reactances; and
a control circuit configured to carry out the operations of:
determining a parameter related to the matching network or plasma chamber;
determining, based on the determined parameter, potential new positions for the VRE that would have a threshold effectiveness in providing an impedance match between the RF source and the plasma chamber;
determining a preferred position for the VRE by determining a one of the potential new positions meeting the threshold effectiveness whose efficiency in delivering RF power from the RF input to the RF output would cause an RF power at the RF output to be closest to a desired RF power; and
altering the VRE to the preferred position.
2. The matching network of claim 1 wherein the determination of the potential new position having the efficiency for the desired RF power is made by determining the one of the potential new positions that would cause a chamber-related parameter to achieve a value closest to a value associated with a predetermined deposited film thickness or an etch depth.
3. The matching network of claim 2 wherein the plasma-related parameter is a DC voltage developed in the plasma chamber and fed back to the RF output of the matching network, an RF output current, or an RF output voltage.
4. The matching network of claim 1 wherein the preferred position is determined by calculating, for each of the potential new positions meeting the threshold effectiveness, a resulting RF power at the RF output, the calculation of the RF power being based on the determined parameter and the potential new position.
5. The matching network of claim 1 wherein it is determined whether a potential position has the threshold effectiveness in providing an impedance match by determining whether the potential position will cause, in view of the determined parameter, a reflection parameter to exceed a predetermined limit.
6. The matching network of claim 5 wherein the reflection parameter is an input reflection coefficient or a reflected power.
7. The matching network of claim 1 :
wherein the VRE comprises discrete reactance elements and corresponding switches, each switch configured to switch in and out one of the discrete reactance elements to provide the different positions of the VRE; and
wherein the preferred position does not require switching in or out of any of the discrete reactance elements that are currently restricted from switching.
8. The matching network of claim 7 wherein a determination of which of the discrete reactance elements of the VRE are currently restricted from switching is made based on whether any of the discrete reactance elements has previously switched a predetermined number of times in a predetermined period of time.
9. A semiconductor processing tool comprising:
a plasma chamber configured to deposit a material onto a substrate or etch a material from the substrate; and
an impedance matching network comprising:
an RF input configured to operably couple to an RF source;
an RF output configured to operably couple to the plasma chamber;
a variable reactance element (VRE), the VRE having different positions for providing different reactances; and
a control circuit configured to carry out the operations of:
determining a parameter related to the matching network or plasma chamber;
determining, based on the determined parameter, potential new positions for the VRE that would have a threshold effectiveness in providing an impedance match between the RF source and the plasma chamber;
determining a preferred position for the VRE by determining a one of the potential new positions meeting the threshold effectiveness whose efficiency in delivering RF power from the RF input to the RF output would cause an RF power at the RF output to be closest to a desired RF power; and
altering the VRE to the preferred position.
10. A method of impedance matching and controlling the power delivered to a plasma chamber:
operably coupling an impedance matching network between a radio frequency (RF) source and a plasma chamber, the matching network comprising:
an RF input configured to operably couple to the RF source;
an RF output configured to operably couple to the plasma chamber; and
a variable reactance element (VRE), the VRE having different positions for providing different reactances;
determining a parameter related to the matching network or plasma chamber;
determining, based on the determined parameter, potential new positions for the VRE that would have a threshold effectiveness in providing an impedance match between the RF source and the plasma chamber;
determining a preferred position for the VRE by determining a one of the potential new positions meeting the threshold effectiveness whose efficiency in delivering RF power from the RF input to the RF output would cause an RF power at the RF output to be closest to a desired RF power; and
altering the VRE to the preferred position.
11. The method of claim 10 wherein the determination of the potential new position having the efficiency for the desired RF power is made by determining the one of the potential new positions that would cause a chamber-related parameter to achieve a value closest to a value associated with a predetermined deposited film thickness or an etch depth.
12. The method of claim 11 wherein the plasma-related parameter is a DC voltage developed in the plasma chamber and fed back to the RF output of the matching network, an RF output current, or an RF output voltage.
13. The method of claim 10 wherein the preferred position is determined by calculating, for each of the potential new positions meeting the threshold effectiveness, a resulting RF power at the RF output, the calculation of the RF power being based on the determined parameter and the potential new position.
14. The method of claim 10 wherein it is determined whether a potential position has the threshold effectiveness in providing an impedance match by determining whether the potential position will cause, in view of the determined parameter, a reflection parameter to exceed a predetermined limit.
15. The method of claim 14 wherein the reflection parameter is an input reflection coefficient or a reflected power.
16. The method of claim 10 :
wherein the VRE comprises discrete reactance elements and corresponding switches, each switch configured to switch in and out one of the discrete reactance elements to provide the different positions of the VRE; and
wherein the preferred position does not require switching in or out of any of the discrete reactance elements that are currently restricted from switching.
17. The method of claim 16 wherein a determination of which of the discrete reactance elements of the VRE are currently restricted from switching is made based on whether any of the discrete reactance elements has previously switched a predetermined number of times in a predetermined period of time.
18. The method of claim 10 wherein the VRE is an electronically variable capacitor (EVC) and the different reactances are different capacitances.
19. The method of claim 10 wherein the parameter is a reflection parameter that is determined based on a detected value at the RF input.
20. A method of manufacturing a semiconductor, the method comprising:
placing a substrate in a plasma chamber configured to deposit a material layer onto the substrate or etch a material layer from the substrate;
operably coupling an impedance matching network between an RF source and the plasma chamber, the matching network comprising:
an RF input configured to operably couple to the RF source;
an RF output configured to operably couple to the plasma chamber; and
a variable reactance element (VRE), the VRE having different positions for providing different reactances;
determining a parameter related to the matching network or plasma chamber;
determining, based on the determined parameter, potential new positions for the VRE that would have a threshold effectiveness in providing an impedance match between the RF source and the plasma chamber;
determining a preferred position for the VRE by determining a one of the potential new positions meeting the threshold effectiveness whose efficiency in delivering RF power from the RF input to the RF output would cause an RF power at the RF output to be closest to a desired RF power; and
altering the VRE to the preferred position.