Substrate processing apparatus and substrate drying method

1. A substrate processing apparatus comprising:

a processing container configured to accommodate a substrate with a liquid film formed on a pattern formation surface thereof;

a holder configured to hold the substrate thereon inside the processing container;

a processing fluid supply configured to supply a processing fluid in a supercritical state into the processing container for a drying process of the substrate; and

a controller configured to control an overall operation of the substrate processing apparatus,

wherein the holder includes a base disposed below the substrate, a plurality of support pins provided on the base and configured to support the substrate from below, and a lifting motor configured to move the plurality of support pins up and down, and

the controller controls the lifting motor to move the plurality of support pins up or down according to a liquid amount or a film thickness of the liquid film.

2. The substrate processing apparatus according to claim 1 , wherein the controller is further configured to acquire the liquid amount or the film thickness of the liquid film formed on the substrate, before the substrate is accommodated in the processing container,

wherein the controller moves the plurality of support pins up or down according to the acquired liquid amount or the film thickness.

3. The substrate processing apparatus according to claim 1 , wherein the controller is further configured to acquire liquid film variation information indicating a variation in liquid amount or film thickness of the liquid film over time during the drying process,

wherein the controller moves the plurality of support pins up or down according to the liquid amount or the film thickness that varies during the drying process, based on the acquired liquid film variation information.

4. A substrate processing apparatus comprising:

a processing container configured to accommodate a substrate with a liquid film formed on a pattern formation surface thereof;

a holder configured to hold the substrate thereon inside the processing container;

a processing fluid supply configured to supply a processing fluid in a supercritical state into the processing container for a drying process of the substrate; and

a controller configured to control an overall operation of the substrate processing apparatus,

wherein the holder includes a base disposed below the substrate, a plurality of support pins provided on the base and configured to support the substrate from below, and a lifting motor configured to move the plurality of support pins up and down, and

wherein the controller is further configured to acquire an inclination of the substrate supported by the plurality of support pins,

the lifting motor is capable of individually moving the plurality of support pins up and down, and

the controller controls the lifting motor to individually move the plurality of support pins up or down according to the acquired inclination of the substrate.

5. The substrate processing apparatus according to claim 1 , wherein the controller moves the plurality of support pins up or down according to the liquid amount or the film thickness of the liquid film such that a distance between an upper surface of the liquid film and a ceiling surface of the processing container becomes constant.

6. The substrate processing apparatus according to claim 2 , wherein the controller moves the plurality of support pins up or down according to the liquid amount or the film thickness of the liquid film such that a distance between an upper surface of the liquid film and a ceiling surface of the processing container becomes constant.

7. The substrate processing apparatus according to claim 3 , wherein the controller moves the plurality of support pins up or down according to the liquid amount or the film thickness of the liquid film such that a distance between an upper surface of the liquid film and a ceiling surface of the processing container becomes constant.

8. The substrate processing apparatus according to claim 2 , wherein the controller acquires the liquid amount or the film thickness of the liquid film formed on the substrate from at least one of a film thickness sensor, an image sensor, a weight sensor, and a displacement sensor.

9. The substrate processing apparatus according to claim 3 , wherein the controller acquires the liquid film variation information from at least one of a film thickness sensor, an image sensor, a weight sensor, and a displacement sensor.

10. The substrate processing apparatus according to claim 4 , wherein the controller acquires the inclination of the substrate from at least one of a film thickness sensor, an image sensor, a weight sensor, and a displacement sensor.

11. A drying method comprising:

holding a substrate with a liquid film formed on a pattern formation surface thereof inside a processing container, using a holder that holds the substrate, the holder including a base disposed below the substrate and a plurality of support pins provided on the base and being configured to support the substrate from below;

supplying a processing fluid in a supercritical state into the processing container; and

moving at least one of the plurality of support pins included in the holder up or down according to a liquid amount or a film thickness of the liquid film.

12. The drying method according to claim 11 , further comprising:

acquiring the liquid amount or the film thickness of the liquid film before the substrate is accommodated in the processing container; and

moving the plurality of support pins up or down according to the liquid amount or the film thickness acquired at the acquiring.