Methods for using a gas permeable layer to form air gaps in an image sensor
An image sensor with uniform, well-controlled air gaps is provided. A structure that is at least partially filled with organic material may be formed on the image sensor. A hybrid organic/inorganic film layer may be formed over the organic material. The image sensor may then be exposed to energy, which causes the organic material to sublimate through the hybrid film layer, which itself may become a gas permeable layer when exposed to energy. After sublimation, the regions where the organic material was previously filled become air gaps with a low index of refraction. Air gaps formed in this way can be configured over photodiodes as light guides or focusing structures, as concave/convex microlenses, in between photodiodes as isolation structures, in between color filter elements to reduce crosstalk, and/or over microlenses to enhancing focusing power.
1. A method of fabricating an image sensor, comprising:
forming photodiodes in a semiconductor substrate;
filling structures with organic material;
forming a hybrid organic and inorganic layer over the structures; and
forming air gaps by using energy to convert the hybrid organic and inorganic layer to a gas permeable layer and to sublimate the organic material through the gas permeable layer.
2. The method of claim 1 , wherein the air gaps are formed directly over the photodiodes.
3. The method of claim 1 , further comprising:
filling additional structures with color filter material; and
using the energy to only partially sublimate the color filter material through the gas permeable layer.
4. The method of claim 1 , further comprising:
filling additional structures with organic material; and
forming a blocking film over the additional structures to prevent the organic material in the additional structures from sublimating through the gas permeable layer.
5. The method of claim 1 , further comprising:
filling additional structures with color filter material; and
forming a blocking film over the additional structures to prevent the color filter material in the additional structures from sublimating through the gas permeable layer.
6. The method of claim 1 , wherein forming the air gaps comprises forming air-filled convex microlenses.
7. The method of claim 1 , wherein forming the air gaps comprises forming air-filled concave microlenses.
8. The method of claim 1 , wherein forming the air gaps comprises forming air-filled trench isolation structures in the semiconductor substrate.
9. The method of claim 1 , further comprising:
forming color filter elements over the photodiodes, wherein forming the air gaps comprises forming air-filled sidewall structures surrounding the color filter elements.
10. The method of claim 1 , wherein forming the hybrid organic and inorganic layer over the structures comprises forming a film with an inorganic molecular framework that remains in the gas permeable layer.
11. The method of claim 1 , wherein using the energy comprises exposing the image sensor to energy selected from the group consisting of: light, heat, microwave, laser, infrared radiation, and visible radiation.
12. An image sensor, comprising:
a semiconductor substrate;
photodiodes formed in the semiconductor substrate;
a gas permeable layer formed over the semiconductor substrate; and
a plurality of separate air gaps covered by the gas permeable layer.
13. The image sensor of claim 12 , wherein the gas permeable layer comprises inorganic material.
14. The image sensor of claim 12 , wherein each air gap in the plurality of separate air gaps is formed directly over a respective one of the photodiodes.
15. The image sensor of claim 12 , wherein each air gap in the plurality of separate air gaps forms a convex microlens.
16. The image sensor of claim 12 , wherein each air gap in the plurality of separate air gaps forms a concave microlens.
17. The image sensor of claim 12 , wherein each air gap in the plurality of separate air gaps is configured as a trench isolation structure in the semiconductor substrate.
18. The image sensor of claim 12 , further comprising:
color filter elements formed over the photodiodes, wherein each air gap in the plurality of separate air gaps is configured as an isolation structure between a respective pair of the color filter elements.
19. A method of manufacturing an image sensor, comprising:
forming photodiodes in a semiconductor substrate;
forming microlenses over the photodiodes; and
forming a gas permeable layer over the microlenses.
20. The method of claim 19 , further comprising:
forming an inorganic layer on the microlenses to prevent structures underneath the inorganic layer from sublimating through the gas permeable layer, wherein forming the gas permeable layer comprises exposing a hybrid organic and inorganic layer to energy to sublimate away an organic portion of the hybrid organic and inorganic layer.