POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD
A polishing liquid containing abrasive grains, a quaternary phosphonium cation, and a liquid medium, in which the abrasive grains contain at least one selected from the group consisting of a metal hydroxide and cerium oxide, and the quaternary phosphonium cation has a hydrocarbon group having two or more carbon atoms which is bonded to a phosphorus atom.
1 . A polishing liquid comprising:
abrasive grains;
a quaternary phosphonium cation; and
a liquid medium, wherein
the abrasive grains contain a metal hydroxide, and
the quaternary phosphonium cation has a hydrocarbon group having two or more carbon atoms which is bonded to a phosphorus atom.
2 . The polishing liquid according to claim 1 , wherein the metal hydroxide contains cerium hydroxide.
3 . A polishing liquid comprising:
abrasive grains;
a quaternary phosphonium cation; and
a liquid medium, wherein
the abrasive grains contain cerium oxide, and
the quaternary phosphonium cation has a hydrocarbon group having two or more carbon atoms which is bonded to a phosphorus atom.
4 . The polishing liquid according to claim 1 , wherein the hydrocarbon group contains a butyl group.
5 . The polishing liquid according to claim 1 , wherein the hydrocarbon group contains a phenyl group.
6 . The polishing liquid according to claim 1 , wherein the quaternary phosphonium cation contains a phosphonium cation represented by general formula (I) below.
[Chemical Formula 1]
[In the formula, R 1 , R 2 , R 3 , and R 4 each independently represent a hydrogen atom or a hydrocarbon group which may have a substituent, at least one of R 1 , R 2 , R 3 , and R 4 is a hydrocarbon group having two or more carbon atoms which may have a substituent, and phosphorus atoms P in the formula may be bonded to each other through R 1 , R 2 , R 3 , or R 4 .]
7 . The polishing liquid according to claim 6 , wherein at least one selected from the group consisting of R 1 , R 2 , R 3 , and R 4 in the general formula (I) is a hydrocarbon group substituted with at least one selected from the group consisting of a carboxyl group, a hydroxyl group, an alkoxy group, a halogeno group, an ether group, an ester group, an aldehyde group, a carbonyl group, a nitro group, a silyl group, a cyano group, an amino group, an alkylamino group, a dialkylamino group, a homocyclic group, and a heterocyclic group.
8 . The polishing liquid according to claim 6 , wherein two or more of R 1 , R 2 , R 3 , and R 4 in the general formula (I) are an unsubstituted hydrocarbon group.
9 . The polishing liquid according to claim 6 , wherein R 1 , R 2 , R 3 , and R 4 in the general formula (I) are an aryl group.
10 . The polishing liquid according to claim 1 , wherein a content of a quaternary phosphonium salt having the quaternary phosphonium cation is 0.001 to 1% by mass.
11 . The polishing liquid according to claim 1 , wherein a pH is less than 8.0.
12 . (canceled)
13 . A polishing liquid set comprising:
constituent components of the polishing liquid according to claim 1 stored while being divided into a plurality of liquids, a first liquid containing the abrasive grains, a second liquid containing the quaternary phosphonium cation.
14 . A polishing method comprising a step of polishing a surface to be polished by using the polishing liquid according to claim 1 .
15 . The polishing method according to claim 14 , wherein the surface to be polished contains polysilicon.
16 . The polishing liquid according to claim 9 , wherein a content of the abrasive grains is 0.5% by mass or less.
17 . The polishing liquid according to claim 11 , wherein a content of the abrasive grains is 0.5% by mass or less.
18 . The polishing liquid according to claim 3 , wherein the hydrocarbon group contains a butyl group.
19 . The polishing liquid according to claim 3 , wherein the hydrocarbon group contains a phenyl group.
20 . The polishing liquid according to claim 3 , wherein the quaternary phosphonium cation contains a phosphonium cation represented by general formula (I) below.
[In the formula, R 1 , R 2 , R 3 , and R 4 each independently represent a hydrogen atom or a hydrocarbon group which may have a substituent, at least one of R 1 , R 2 , R 3 , and R 4 is a hydrocarbon group having two or more carbon atoms which may have a substituent, and phosphorus atoms P in the formula may be bonded to each other through R 1 , R 2 , R 3 , or R 4 .]
21 . The polishing liquid according to claim 20 , wherein at least one selected from the group consisting of R 1 , R 2 , R 3 , and R 4 in the general formula (I) is a hydrocarbon group substituted with at least one selected from the group consisting of a carboxyl group, a hydroxyl group, an alkoxy group, a halogeno group, an ether group, an ester group, an aldehyde group, a carbonyl group, a nitro group, a silyl group, a cyano group, an amino group, an alkylamino group, a dialkylamino group, a homocyclic group, and a heterocyclic group.
22 . The polishing liquid according to claim 20 , wherein two or more of R 1 , R 2 , R 3 , and R 4 in the general formula (I) are an unsubstituted hydrocarbon group.
23 . The polishing liquid according to claim 20 , wherein R 1 , R 2 , R 3 , and R 4 in the general formula (I) are an aryl group.
24 . The polishing liquid according to claim 3 , wherein a content of a quaternary phosphonium salt having the quaternary phosphonium cation is 0.001 to 1% by mass.
25 . The polishing liquid according to claim 3 , wherein a pH is less than 8.0.
26 . A polishing liquid set comprising:
constituent components of the polishing liquid according to claim 3 stored while being divided into a plurality of liquids, a first liquid containing the abrasive grains, a second liquid containing the quaternary phosphonium cation.
27 . A polishing method comprising a step of polishing a surface to be polished by using the polishing liquid according to claim 3 .
28 . The polishing method according to claim 27 , wherein the surface to be polished contains polysilicon.
29 . The polishing liquid according to claim 23 , wherein a content of the abrasive grains is 0.5% by mass or less.
30 . The polishing liquid according to claim 25 , wherein a content of the abrasive grains is 0.5% by mass or less.