IP Library Granted Patent US 11,467,486
Granted Patent B2
US 11,467,486 · App. 16/969,211 · Granted Oct 11, 2022

Graphene pellicle lithographic apparatus

Inventors: Evgenia Kurganova (Nijmegen, NL); Adrianus Johannes Maria Giesbers (Vlijmen, NL); Alexander Ludwig Klein (Eindhoven, NL); Maxim Aleksandrovich Nasalevich (Eindhoven, NL); Arnoud Willem Notenboom (Rosmalen, NL); Mária Péter (Eindhoven, NL); Pieter-Jan Van Zwol (Eindhoven, NL); David Ferdinand Vles (Eindhoven, NL); Sten Vollebregt (s'-Gravenhage, NL); Willem-Pieter Voorthuijzen ('s-Hertogenbosch, NL)
Assignee: ASML Netherlands B.V.
G03F1/62G03F7/70983
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Quick Facts
Patent No.
US 11,467,486
App. No.
16/969,211
Granted
Oct 11, 2022
Kind
B2
Abstract

A catalyst including: a first layer including a transition metal; a base layer; and an interlayer, wherein the interlayer is disposed between the base layer and the first layer is disclosed. Also disclosed are methods for preparing a catalyst as well as for synthesizing graphene, a pellicle produced using the catalyst or methods disclosed herein, as well as a lithography apparatus including such a pellicle.

Claims (32)

1. A pellicle configured for a lithography apparatus, the pellicle comprising graphene formed by catalysis with a catalyst comprising:

(i) a first layer comprising a transition metal;

(ii) a base layer; and

(iii) an interlayer,

wherein the interlayer is disposed between the base layer and the first layer.

2. The pellicle according to claim 1 , further comprising a capping layer and a pellicle core.

3. The pellicle according to claim 2 , wherein the capping layer comprises at least one selected from: molybdenum, aluminium, ruthenium and molybdenum, molybdenum and boron, zirconium and boron, yttrium and boron, lanthanum and boron, zirconium boride, molybdenum boride, yttrium boride, molybdenum silicide, yttrium silicide, zirconium dioxide, molybdenum oxide, yttrium oxide, diamond-like carbon, niobium oxide, carbon nitride, silicon nitride, molybdenum carbide, zirconium carbide, yttrium carbide, silicon carbide, zirconium nitride, or aluminium oxide.

4. The pellicle according to claim 2 , wherein the capping layer comprises one or more selected from: ruthenium, molybdenum, boron, yttrium, lanthanum, boron, zirconium, carbon, niobium, silicon, aluminium, nitrogen, or oxygen.

5. The pellicle according to claim 4 , wherein the capping layer is one or more selected from: ruthenium, aluminium, ruthenium and molybdenum, molybdenum and boron, zirconium and boron, yttrium and boron, or lanthanum and boron.

6. The pellicle according to claim 2 , wherein the pellicle core comprises the graphene.

7. The pellicle according to claim 1 , comprising a carbide of the transition metal and further comprising layers of amorphous carbon, SiO 2 and c-Si.

8. The pellicle according to claim 7 , wherein the transition metal is selected from Mo, W, Pt, Cu or Ni.

9. A lithography apparatus comprising the pellicle according to claim 1 .

10. A pellicle structure comprising a catalyst, the catalyst comprising:

(i) a first layer comprising a transition metal;

(ii) a base layer; and

(iii) an interlayer,

wherein the interlayer is disposed between the base layer and the first layer, and

wherein the pellicle is configured for a lithography apparatus.

11. The pellicle structure according to claim 10 , wherein the transition metal in the first layer is selected from Mo, W, Pt, Cu or Ni.

12. The pellicle structure according to claim 10 , wherein the interlayer comprises a metal oxide and/or a metal silicide and/or carbon.

13. The pellicle structure according to claim 12 , wherein the interlayer comprises a metal oxide and the metal oxide is zirconium dioxide or wherein the interlayer comprises a metal silicide and the metal silicide comprises molybdenum silicide.

14. The pellicle structure according to claim 10 , wherein the first layer comprises elemental molybdenum and/or molybdenum carbide.

15. The pellicle structure according to claim 10 , comprising a carbide of the transition metal and further comprising layers of amorphous carbon, SiO 2 and c-Si.

16. A method of manufacturing a pellicle configured for a lithography apparatus, the method comprising:

(i) providing an interlayer on a base layer, the interlayer comprising a metal oxide, metal silicide, and/or carbon; and

(ii) providing a first layer of a catalyst comprising a transition metal, wherein the interlayer is disposed between the base layer and the first layer.

17. The method according to claim 16 , further comprising depositing carbon on the catalyst and forming a graphene layer on the catalyst.

18. The method according to claim 16 , wherein the transition metal in the first layer is selected from Mo, W, Pt, Cu or Ni.

19. The method according to claim 16 , wherein the first layer comprises elemental molybdenum and/or molybdenum carbide.

20. The method according to claim 16 , further comprising providing a capping layer, wherein the capping layer comprises at least one selected from: molybdenum, aluminum, ruthenium and molybdenum, molybdenum and boron, zirconium and boron, yttrium and boron, lanthanum and boron, zirconium boride, molybdenum boride, yttrium boride, molybdenum silicide, yttrium silicide, zirconium dioxide, molybdenum oxide, yttrium oxide, diamond-like carbon, niobium oxide, carbon nitride, silicon nitride, molybdenum carbide, zirconium carbide, yttrium carbide, silicon carbide, zirconium nitride, or aluminum oxide.

21. The method according to claim 16 , comprising a carbide of the transition metal and further comprising providing layers of amorphous carbon, SiO 2 and c-Si.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 12, 2020
From: KURGANOVA, EVGENIA; KLEIN, ALEXANDER LUDWIG; NASALEVICH, MAXIM ALEKSANDROVICH; NOTENBOOM, ARNOUD WILLEM; PÉTER, MÁRIA; VAN ZWOL, PIETER-JAN; GIESBERS, ADRIANUS JOHANNES MARIA; VLES, DAVID FERDINAND; VOLLEBREGT, STEN; VOORTHUIJZEN, WILLEM-PIETER
To: ASML NETHERLANDS B.V.
Reel/Frame 053474/0407 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 12, 2020
From: KURGANOVA, EVGENIA; KLEIN, ALEXANDER LUDWIG; NOTENBOOM, ARNOUD WILLEM; PÉTER, MÁRIA; GIESBERS, ADRIANUS JOHANNES MARIA; NASALEVICH, MAXIM ALEKSANDROVICH; VAN ZWOL, PIETER-JAN; VLES, DAVID FERDINAND; VOLLEBREGT, STEN; VOORTHUIJZEN, WILLEM-PIETER
To: ASML NETHERLANDS B.V.
Reel/Frame 053476/0899 →
Priority Claims (2)
EP 18160866 · Mar 9, 2018 · regional
EP 18212646 · Dec 14, 2018 · regional
Continuity (1)
Related Publication 20200406244A1 · Dec 31, 2020
Cited By (3)
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