Method of forming a laminate structure having a plated through-hole using a removable cover layer
A core or sub-composite structure is provided including a dielectric layer between a first conductive film and a second conductive film. The first conductive film may include a first peelable/removable cover layer formed on or coupled to a first conductive layer. The second conductive film may include a second peelable/removable cover layer formed on or coupled to a second conductive layer.
1. A method for making a laminated structure, comprising:
forming a first core or sub-composite structure, the first core or sub-composite structure comprising:
a first conductive film comprising a removable or peelable first cover layer formed on a first conductive layer;
a dielectric layer coupled to the first conductive layer of the first conductive film;
forming a hole in the first core or sub-composite structure, the hole extending through the first conductive film and the dielectric layer;
depositing a plating resist in the hole in the first core or sub-component structure, and over at least a portion of the first cover layer; and
removing the first cover layer to clean off excess or residual plating resist on the first core or sub-component structure.
2. The method of claim 1 , further comprising:
forming a through-hole through the first core or sub-composite structure and the plating resist; and
plating an interior surface of the through-hole with a conductive material forming a segmented plated through-hole.
3. The method of claim 1 , further comprising:
patterning at least of the first conductive layer to form via pads, antipads, and/or electrical traces.
4. The method of claim 1 , further comprising:
laminating one or more additional dielectric layers and one or more additional core or sub-composite structures to the first core or sub-composite structure.
5. The method of claim 1 , wherein the removable or peelable first cover layer is less than 35 microns.
6. The method of claim 1 , wherein the first conductive layer has a thickness of between 3 microns and 210 microns.
7. The method of claim 1 , wherein the first conductive layer has a thickness of between 12 microns and 35 microns.
8. The method of claim 1 , wherein the first core or sub-composite structure further comprises:
a second conductive film comprising a second peelable cover layer formed on a second conductive layer, the second conductive layer coupled to the core or sub-composite structure on a surface opposite the first conductive film.