IP Library Granted Patent US 10,970,831
Granted Patent B2
US 10,970,831 · App. 17/029,703 · Granted Apr 6, 2021

Systems, devices, and methods for providing feedback on and improving the accuracy of super-resolution imaging

Inventors: Matthew C. Putman (Brooklyn, NY); John B. Putman (Celebration, FL); Vadim Pinskiy (Wayne, NJ); Joseph Succar (Brooklyn, NY)
Assignee: Nanotronics Imaging, Inc.
G06T5/50G06K9/00134G06K9/036G06K9/627G06K9/6269G06T3/4053
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Quick Facts
Patent No.
US 10,970,831
App. No.
17/029,703
Filed
Sep 23, 2020
Granted
Apr 6, 2021
Kind
B2
Art Unit
2488
USPC
348/79
Abstract

Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.

Claims (53)

1. A method comprising:

obtaining, by a computing system, a training data set comprising a plurality of low resolution images of artifacts and an assigned suitability classification for each artifact;

generating, by the computing system, a detection model for determining whether a detected artifact in a low resolution image is suitable for super-resolution generation by:

inputting the training data set into a machine learning algorithm; and

learning, via the machine learning algorithm, to identify low resolution images of artifacts that are suitable for super-resolution generation by determining at least a context of each artifact;

obtaining, by the computing system, a target low resolution image of a specimen;

scanning, by the computing system, the target low resolution image to identify a target artifact in the specimen;

analyzing, by the computing system via the detection model, the target artifact to determine whether the target low resolution image is suitable for super-resolution imaging; and

upon determining, by the computing system via the detection model, that the target low resolution image is suitable for the super-resolution generation, performing super-resolution generation on the target low resolution image.

2. The method of claim 1 , wherein learning, via the machine learning algorithm, to identify the low resolution images of artifacts that are suitable for super-resolution generation by determining at least the context of each artifact, comprises:

identifying a location of each artifact on a respective specimen containing the artifact.

3. The method of claim 1 , wherein learning, via the machine learning algorithm, to identify the low resolution images of artifacts that are suitable for super-resolution generation by determining at least the context of each artifact, comprises:

determining a type of artifact undergoing inspection.

4. The method of claim 1 , wherein learning, via the machine learning algorithm, to identify the low resolution images of artifacts that are suitable for super-resolution generation by determining at least the context of each artifact, comprises:

mapping an input attribute vector comprising attributes of an artifact to a confidence that an input in the input attribute vector belongs to a suitability class.

5. The method of claim 4 , wherein the attributes comprise an artifact type, size, shape, composition, location on a specimen, or reference design.

6. The method of claim 4 , wherein the machine learning algorithm is a support vector machine.

7. The method of claim 1 , wherein the learning further comprises analyzing attributes of each artifact to classify each artifact.

8. The method of claim 1 , wherein a suitable artifact is a measure of a likelihood that the artifact can be used to product all or a portion of an accurate super-resolution image.

9. The method of claim 1 , further comprising:

identifying, by the computing system, an accuracy assessment of a super-resolution image of the target low resolution image based on one or more degrees of equivalence between the super-resolution image and the target low resolution image.

10. A super-resolution system comprising:

one or more processors; and

a memory having programming instructions stored thereon, which, when executed by the one or more processors, causes the super-resolution system to perform operations, comprising:

obtaining a training data set comprising a plurality of low resolution images of artifacts and an assigned suitability classification for each artifact;

generating a detection model for determining whether a detected artifact in a low resolution image is suitable for super-resolution generation by:

inputting the training data set into a machine learning algorithm; and

learning, via the machine learning algorithm, to identify low resolution images of artifacts that are suitable for super-resolution generation by determining at least a context of each artifact;

obtaining a target low resolution image of a specimen;

scanning the target low resolution image to identify a target artifact in the specimen;

analyzing, via the detection model, the target artifact to determine whether the target low resolution image is suitable for super-resolution imaging; and

upon determining, via the detection model, that the target low resolution image is suitable for super-resolution imaging, performing super-resolution imaging on the target low resolution image.

11. The super-resolution system of claim 10 , wherein learning, via the machine learning algorithm, to identify the low resolution images of artifacts that are suitable for super-resolution generation by determining at least the context of each artifact, comprises:

identifying a location of the artifact on a specimen containing the artifact.

12. The super-resolution system of claim 10 , wherein learning, via the machine learning algorithm, to identify the low resolution images of artifacts that are suitable for super-resolution generation by determining at least the context of each artifact, comprises:

determining a type of artifact undergoing inspection.

13. The super-resolution system of claim 10 , wherein learning, via the machine learning algorithm, to identify the low resolution images of artifacts that are suitable for super-resolution generation by determining at least the context of the artifact, comprises:

mapping an input attribute vector comprising attributes of an artifact to a confidence that an input in the input attribute vector belongs to a suitability class.

14. The super-resolution system of claim 13 , wherein the attributes comprise an artifact type, size, shape, composition, location on a specimen, or reference design.

15. The super-resolution system of claim 13 , wherein the machine learning algorithm is a support vector machine.

16. The super-resolution system of claim 10 , wherein the learning further comprises analyzing attributes of each artifact to classify the artifact.

17. The super-resolution system of claim 10 , wherein a suitable artifact is a measure of a likelihood that the artifact can be used to product all or a portion of an accurate super-resolution image.

18. The super-resolution system of claim 10 , wherein the operations further comprise:

identifying an accuracy assessment of a super-resolution image of the target low resolution image based on one or more degrees of equivalence between the super-resolution image and the target low resolution image.

19. A method comprising:

generating, by a computing system, a detection model for determining whether a detected artifact in a low resolution image is suitable for super-resolution generation by:

learning, via a machine learning algorithm, to identify low resolution images of artifacts that are suitable for super-resolution generation by determining at least a context of each artifact;

obtaining, by the computing system, a target low resolution image of a specimen;

scanning, by the computing system, the target low resolution image to identify at least one target artifact in the specimen;

analyzing, by the computing system via the detection model, the target artifact to determine whether the target low resolution image is suitable for super-resolution imaging; and

upon determining, by the computing via the detection model, that the target low resolution image is suitable for super-resolution imaging, performing super-resolution imaging on the target low resolution image.

20. The method of claim 19 , wherein generating, by the computing system, the detection model for determining whether the detected artifact in the low resolution image is suitable for the super-resolution generation, comprises:

generating a training data set comprising a plurality of low resolution images of artifacts and an assigned suitability classification for each artifact.

Assignments (2)
SECURITY INTEREST Recorded Nov 30, 2023
From: NANOTRONICS IMAGING, INC.; NANOTRONICS HEALTH LLC; CUBEFABS INC.
To: ORBIMED ROYALTY & CREDIT OPPORTUNITIES IV, LP
Reel/Frame 065726/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 23, 2020
From: PUTMAN, MATTHEW C.; PUTMAN, JOHN B.; PINSKIY, VADIM; SUCCAR, JOSEPH R.
To: NANOTRONICS IMAGING, INC.
Reel/Frame 053861/0501 →
Continuity (4)
Continuation 16576732 · Sep 19, 2019
Continuation 16233258 · Dec 27, 2018
Continuation 16027056 · Jul 3, 2018
Related Publication 20210012473A1 · Jan 14, 2021
Cited By (2)
US 12,293,010 US 12,511,731