IP Library › Granted Patent US 11,952,266
Granted Patent B2
US 11,952,266 · App. 17/066,448 · Granted Apr 9, 2024

Micro-device structures with etch holes

Inventor: Pierluigi Rubino (Cork, IE)
Assignee: X-Celeprint Limited
B81C1/00039B81C1/00523B81C1/00555B81C2201/0105B81C2201/013
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Quick Facts
Patent No.
US 11,952,266
App. No.
17/066,448
Granted
Apr 9, 2024
Kind
B2
Abstract

A micro-device structure comprises a source substrate having a sacrificial layer comprising a sacrificial portion adjacent to an anchor portion, a micro-device disposed completely over the sacrificial portion, the micro-device having a top side opposite the sacrificial portion and a bottom side adjacent to the sacrificial portion and comprising an etch hole that extends through the micro-device from the top side to the bottom side, and a tether that physically connects the micro-device to the anchor portion. A micro-device structure comprises a micro-device disposed on a target substrate. Micro-devices can be any one or more of an antenna, a micro-heater, a power device, a MEMs device, and a micro-fluidic reservoir.

Claims (54)

1. A micro-device structure, comprising:

a source substrate having a sacrificial layer comprising a sacrificial portion adjacent to an anchor portion; and

a micro-device comprising a micro-device substrate, disposed completely and exclusively over the sacrificial portion, the micro-device substrate having a top side opposite the sacrificial portion and a bottom side adjacent to the sacrificial portion and comprising an etch hole that extends entirely through an interior portion of the micro-device substrate from the top side to the bottom side; and

a tether that physically connects the micro-device to the anchor portion,

wherein the etch hole is in contact with the sacrificial portion and exposes at least a portion of the sacrificial portion.

2. The micro-device structure of claim 1 , wherein the sacrificial portion has a crystalline structure that is anisotropically etchable.

3. The micro-device structure of claim 1 , wherein the source substrate is made of silicon {100}.

4. The micro-device structure of claim 1 , wherein the source substrate has a crystalline structure with a {100} orientation and the bottom side of the micro-device is substantially parallel to a {100} crystal plane at a surface of the source substrate.

5. The micro-device structure of claim 1 , wherein the tether physically connects the anchor portion directly to a corner of the micro-device or directly to a portion of the micro-device closer to the corner than to a center or opposite corner along an edge of the micro-device.

6. The micro-device structure of claim 1 , wherein the micro-device comprises an antenna disposed on the micro-device substrate.

7. A micro-device structure, comprising:

a source substrate having a sacrificial layer comprising a sacrificial portion adjacent to an anchor portion; and

a micro-device, comprising a micro-device substrate, disposed completely over the sacrificial portion, the micro-device substrate having a top side opposite the sacrificial portion and a bottom side adjacent to the sacrificial portion and comprising an etch hole that extends entirely through an interior portion of the micro-device substrate from the top side to the bottom side; and

a tether that physically connects the micro-device to the anchor portion,

wherein the etch hole is in contact with the sacrificial portion and exposes at least a portion of the sacrificial portion, and

wherein the hole is at a geometric center of the micro-device.

8. A micro-device structure, comprising:

a source substrate having a sacrificial layer comprising a sacrificial portion adjacent to an anchor portion; and

a micro-device, comprising a micro-device substrate, disposed completely over the sacrificial portion, the micro-device substrate having a top side opposite the sacrificial portion and a bottom side adjacent to the sacrificial portion and comprising an etch hole that extends entirely through an interior portion of the micro-device substrate from the top side to the bottom side; and

a tether that physically connects the micro-device to the anchor portion,

wherein the etch hole is in contact with the sacrificial portion and exposes at least a portion of the sacrificial portion,

wherein the source substrate has a crystalline structure with a {100} orientation and the bottom side of the micro-device is substantially parallel to a {100} crystal plane at a surface of the source substrate, and

wherein the micro-device has a micro-device edge direction oriented at an angle from 30 to 60 degrees with respect to a {110} crystal plane of the crystalline structure.

9. The micro-device structure of claim 8 , wherein the micro-device comprises a micro-device edge having a direction oriented at an angle of substantially 45 degrees with respect to the {110} crystal plane.

10. A micro-device structure, comprising:

a source substrate having a sacrificial layer comprising a sacrificial portion adjacent to an anchor portion; and

a micro-device, comprising a micro-device substrate, disposed completely over the sacrificial portion, the micro-device substrate having a top side opposite the sacrificial portion and a bottom side adjacent to the sacrificial portion and comprising an etch hole that extends entirely through an interior portion of the micro-device substrate from the top side to the bottom side; and

a tether that physically connects the micro-device to the anchor portion,

wherein the etch hole is in contact with the sacrificial portion and exposes at least a portion of the sacrificial portion,

wherein the source substrate has a crystalline structure with a {100} crystal plane, the micro-device has a micro-device length greater than a micro-device width and the micro-device length is in a direction that is substantially parallel to the {100} crystal plane,

wherein the source substrate has a crystalline structure with a {100} crystal plane, the micro-device has a micro-device length greater than a micro-device width and the micro-device length is in a direction that is substantially parallel to the {100} crystal plane.

11. A micro-device structure, comprising:

a source substrate having a sacrificial layer comprising a sacrificial portion adjacent to an anchor portion; and

a micro-device, comprising a micro-device substrate, disposed completely over the sacrificial portion, the micro-device substrate having a top side opposite the sacrificial portion and a bottom side adjacent to the sacrificial portion and comprising an etch hole that extends entirely through an interior portion of the micro-device substrate from the top side to the bottom side; and

a tether that physically connects the micro-device to the anchor portion,

wherein the etch hole is in contact with the sacrificial portion and exposes at least a portion of the sacrificial portion,

wherein the etch hole is rectangular and has an etch-hole width, the tether has a tether width connecting the micro-device to the anchor portion, and the etch-hole width is no less than the tether width.

12. The micro-device structure of claim 11 , wherein the etch-hole width is measured in a direction parallel to the tether width.

13. A micro-device structure, comprising:

a source substrate having a sacrificial layer comprising a sacrificial portion adjacent to an anchor portion; and

a micro-device, comprising a micro-device substrate, disposed completely over the sacrificial portion, the micro-device substrate having a top side opposite the sacrificial portion and a bottom side adjacent to the sacrificial portion and comprising an etch hole that extends entirely through an interior portion of the micro-device substrate from the top side to the bottom side; and

a tether that physically connects the micro-device to the anchor portion,

wherein the etch hole is in contact with the sacrificial portion and exposes at least a portion of the sacrificial portion,

wherein the etch hole and the micro-device are both rectangular, the etch hole has an etch-hole edge, the micro-device has a micro-device edge, and the etch-hole edge is substantially parallel to the micro-device edge.

14. A micro-device structure, comprising:

a source substrate having a sacrificial layer comprising a sacrificial portion adjacent to an anchor portion; and

micro-devices, each comprising a micro-device substrate, disposed completely over the sacrificial portion, the micro-device substrate having a top side opposite the sacrificial portion and a bottom side adjacent to the sacrificial portion and comprising an etch hole that extends entirely through an interior portion of the micro-device substrate from the top side to the bottom side, and each of the micro-devices physically connected by a respective tether to the anchor portion, wherein each of the micro-devices and the respective tether are rotated or reflected with respect to any other of the micro-devices and the respective tether,

wherein the etch holes are in contact with the sacrificial portion and expose at least a portion of the sacrificial portion.

15. A micro-device structure, comprising:

a source substrate having a sacrificial layer comprising a sacrificial portion adjacent to an anchor portion; and

a micro-device, comprising a micro-device substrate, disposed completely over the sacrificial portion, the micro-device substrate having a top side opposite the sacrificial portion and a bottom side adjacent to the sacrificial portion and comprising an etch hole that extends entirely through an interior portion of the micro-device substrate from the top side to the bottom side; and

a tether that physically connects the micro-device to the anchor portion,

wherein the etch hole is in contact with the sacrificial portion and exposes at least a portion of the sacrificial portion,

wherein the micro-device comprises an antenna disposed on the micro-device substrate around the etch hole.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 18, 2020
From: RUBINO, PIERLUIGI
To: X-CELEPRINT LIMITED
Reel/Frame 054698/0786 →
Continuity (1)
Related Publication 20220112078A1 · Apr 14, 2022
Cited By (2)
US 12,398,031 US 12,448,283