IP Library Granted Patent US 11,495,493
Granted Patent B2
US 11,495,493 · App. 17/082,579 · Granted Nov 8, 2022

Backside metal patterning die singulation systems and related methods

Inventor: Michael J. Seddon (Gilbert, AZ)
Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
H01L21/76871H01L21/32136H01L21/32139H01L21/78
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Quick Facts
Patent No.
US 11,495,493
App. No.
17/082,579
Granted
Nov 8, 2022
Kind
B2
Abstract

Implementations of die singulation systems and related methods may include forming a plurality of die on a first side of a substrate, forming a seed layer on a second side of a substrate opposite the first side of the substrate, using a shadow mask, applying a mask layer over the seed layer, forming a backside metal layer over the seed layer, removing the mask layer, and singulating the plurality of die included in the substrate through removing substrate material in the die street and through removing seed layer material in the die street.

Claims (35)

1. A method of singulating a plurality of die comprised on a substrate, the method comprising:

forming a plurality of die on a first side of a substrate;

using a shadow mask, applying a mask layer over the second side of the substrate;

forming a backside metal layer over the second side of the substrate;

removing the mask layer; and

singulating the plurality of die comprised in the substrate through removing substrate material in a die street.

2. The method of claim 1 , wherein the mask layer comprises a polymer material.

3. The method of claim 1 , wherein the mask layer comprises a photoresist material.

4. The method of claim 1 , wherein the backside metal layer comprises copper.

5. The method of claim 1 , wherein removing substrate material in the die street further comprises plasma etching.

6. The method of claim 1 , wherein removing substrate material in the die street further comprises using one of a laser beam or a saw blade.

7. The method of claim 1 , further comprising thinning the second side of the substrate to a thickness less than 30 micrometers.

8. The method of claim 1 , further comprising aligning the substrate from a backside of the substrate.

9. A method of singulating a plurality of die comprised on a substrate, the method comprising:

forming a plurality of die on a first side of a substrate;

using a shadow mask, applying a mask layer over the second side of the substrate;

removing the shadow mask;

forming a backside metal layer over the second side of the substrate;

removing the mask layer; and

singulating the plurality of die comprised in the substrate through removing substrate material in a die street using one of a laser beam or a saw blade.

10. The method of claim 9 , wherein the mask layer comprises a resin material.

11. The method of claim 9 , wherein the mask layer comprises a photoresist material.

12. The method of claim 9 , further comprising remote plasma healing a sidewall of the die street.

13. The method of claim 9 , further comprising thinning the second side of the substrate to a thickness less than 30 micrometers.

14. The method of claim 9 , further comprising aligning the substrate from a backside of the substrate.

15. A method of singulating a plurality of die comprised on a substrate, the method comprising:

forming a plurality of die on a first side of a substrate;

using a shadow mask corresponding to die streets of the substrate, forming a mask layer over the die streets of the substrate;

forming a backside metal layer;

removing the mask layer from the die streets;

singulating the plurality of die comprised in the substrate through removing substrate material in the die street using one of a laser beam or a saw blade.

16. The method of claim 15 , wherein the mask layer comprises a photoresist material.

17. The method of claim 15 , further comprising remote plasma healing a sidewall of the plurality of die.

18. The method of claim 15 , wherein the backside metal layer is 10 micrometers thick.

19. The method of claim 15 , wherein the mask layer comprises a resin.

Assignments (3)
RELEASE OF SECURITY INTEREST IN PATENTS PREVIOUSLY RECORDED AT REEL 055315, FRAME 0350 Recorded Aug 17, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
Reel/Frame 064618/0881 →
SECURITY INTEREST Recorded Feb 17, 2021
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 055315/0350 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 28, 2020
From: SEDDON, MICHAEL J.
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 054196/0895 →