Defect correction on metal resists
A method for forming a semiconductor device includes depositing a metal resist layer over a layer to be patterned that is formed over a substrate; patterning the metal resist layer using a lithography process to form a patterned metal resist layer and expose portions of the layer to be patterned; selectively depositing a silicon containing layer over the patterned resist layer by exposing the substrate to a gas mixture comprising a silicon precursor, the silicon containing layer being preferentially deposited over a top surface of the metal resist layer; and performing a surface cleaning process by exposing the layer to be patterned and the patterned metal resist layer covered with the silicon containing layer to a plasma process with an etch chemistry comprising a halogen or hydrogen.
1. A method for forming a semiconductor device, the method comprising:
depositing a metal resist layer over a layer to be patterned that is formed over a substrate;
patterning the metal resist layer using a lithography process to form a patterned metal resist layer and expose portions of the layer to be patterned;
selectively depositing a silicon containing layer over the patterned metal resist layer by exposing the substrate to a gas mixture comprising a silicon precursor, the silicon containing layer being preferentially deposited over a top surface of the metal resist layer; and
performing a surface cleaning process by exposing the layer to be patterned and the patterned metal resist layer covered with the silicon containing layer to a plasma process with an etch chemistry comprising a halogen or hydrogen.
2. The method of claim 1 , further comprising patterning, with an etch mask comprising the patterned metal resist layer covered with the silicon containing layer, the layer to be patterned by exposing the layer to be patterned to a directional etch process.
3. The method of claim 1 , wherein patterning the metal resist layer comprises forming a metal defect over one of the exposed portions of the layer to be patterned, and wherein the surface cleaning process removes the metal defect.
4. The method of claim 1 , wherein the gas mixture comprises oxygen and the silicon precursor comprises silicon tetrachloride, and wherein the silicon containing layer comprises silicon oxide.
5. The method of claim 4 , further comprising patterning the layer to be patterned by exposing the layer to be patterned covered with an etch mask comprising the patterned metal resist layer covered with the silicon containing layer to an inductively coupled plasma or a capacitively coupled plasma.
6. The method of claim 1 , wherein the silicon precursor comprises dichloro silane, and wherein the silicon containing layer comprises a layer of silicon.
7. The method of claim 6 , further comprising patterning the layer to be patterned by exposing the layer to be patterned covered with the etch mask comprising the patterned metal resist layer covered with the silicon containing layer to a capacitively coupled plasma.
8. The method of claim 1 , wherein the metal resist layer further comprises a metal oxide extreme ultraviolet (EUV) resist, and wherein forming the patterned metal resist layer further comprises:
exposing the metal resist layer to an EUV light beam; and
developing the metal resist layer after exposing to form the patterned metal resist layer.
9. The method of claim 1 , wherein the silicon containing layer is selectively deposited on the top surface and sidewalls of the patterned resist layer.
10. The method of claim 1 , wherein the etch chemistry comprising the halogen or hydrogen comprises BCl 3 or HBr.
11. The method of claim 1 , wherein the etch chemistry comprising the halogen or hydrogen comprises H 2 or CH 4 .
12. A method for forming a semiconductor device, the method comprising:
depositing a metal resist layer over a layer to be patterned that is disposed over a substrate;
patterning the metal resist layer using an extreme ultraviolet (EUV) lithography process to form a patterned metal resist layer and expose portions of the layer to be patterned, wherein the patterning leaves a metal residue over one of the exposed portions of the layer to be patterned;
covering a top surface of the patterned metal resist layer with a material comprising silicon;
selectively removing the metal residue with a plasma process comprising a halogen while covering the top surface of the patterned metal resist layer with the material comprising silicon; and
patterning the layer to be patterned with a directional plasma etch process.
13. The method of claim 12 , wherein the material comprising silicon is selectively deposited on the top surface and sidewalls of the patterned metal resist layer.
14. The method of claim 12 , wherein covering the top surface of the patterned metal resist layer with the material comprising silicon comprises performing a chemical vapor deposition process to deposit a silicon oxide layer.
15. The method of claim 14 , wherein performing the chemical vapor deposition comprises flowing silicon tetrachloride and oxygen into a deposition chamber to selectively deposit the silicon oxide layer on the patterned metal resist layer.
16. The method of claim 12 , wherein covering the top surface of the patterned metal resist layer with the material comprising silicon comprises performing a plasma deposition process to deposit a layer of silicon, wherein performing the plasma deposition process comprises generating a plasma from a gaseous mixture comprising dichloro silane.
17. A method for forming a semiconductor device, the method comprising:
depositing a metal resist layer over a layer to be patterned that is disposed over a substrate;
patterning the metal resist layer using an extreme ultraviolet (EUV) lithography process to form a patterned metal resist layer so as to expose a first set of regions of the layer to be patterned;
depositing a first material over the first set of regions;
selectively removing the patterned metal resist layer to expose a second set of regions of the layer to be patterned;
depositing a second material covering the second set of regions of the layer to be patterned, the second material being different from the first material;
selectively removing the first material to re-expose the first set of regions of the layer to be patterned;
performing a surface cleaning process by exposing the first set of regions of the layer to be patterned to a plasma process; and
etching the first set of regions of the layer to be patterned to form a pattern in the layer to be patterned.
18. The method of claim 17 , wherein the first material comprises silicon oxide and the second material comprises silicon nitride.
19. The method of claim 17 , wherein the removing the first material, the performing the surface cleaning process, and the etching the first set of regions are all performed sequentially in a common etching process.
20. The method of claim 17 , wherein the removing the first material comprises exposing to a first plasma generated from a gas comprising a fluorocarbon and oxygen, wherein performing the surface cleaning process comprises exposing to a second plasma generated from a halogen, H 2 , or CH 4 , and wherein etching the first set of regions comprises exposing to a third plasma generated from a gas comprising a fluorocarbon and oxygen.
21. The method of claim 17 , wherein a bridging defect is formed on a major surface of a region of the first set of regions of the layer to be patterned on patterning the metal resist layer.