Particle beam system
A particle beam system includes: a multi-beam particle source configured to generate a multiplicity of particle beams; an imaging optical unit configured to image an object plane in particle-optical fashion into an image plane and direct the multiplicity of particle beams on the image plane; and a field generating arrangement configured to generate electric and/or magnetic deflection fields of adjustable strength in regions close to the object plane. The particle beams are deflected in operation by the deflection fields through deflection angles that depend on the strength of the deflection fields.
1. A particle beam system, comprising:
a.) a multi-beam particle source configured to generate a first multiplicity of particle beams;
b.) a first imaging optical unit having an optical axis, the first imaging unit configured to:
i) particle-optically image a first object plane into an image plane; and
ii) direct the first multiplicity of particle beams onto the image plane; and
c.) a field generating arrangement configured to generate electric and/or magnetic deflection fields of adjustable strength,
wherein:
during operation of the particle beam system, the first multiplicity of particle beams are deflected by the deflection fields of the field generating arrangement by deflection angles dependent on the strength of the deflection fields;
the field generating arrangement is configured so that, for one particle beam, two straight lines coincide with a trajectory of the particle beam before entering the field generating arrangement and after emerging from the field generating arrangement;
the two straight lines are in a first plane;
the two straight lines intersect at a vertex;
the two straight lines define a deflection angle between each other;
the vertex is in a second plane parallel to the object plane;
the vertex is a first distance from the optical axis;
a normal to the first plane through the vertex is a second distance from the optical axis;
the second distance is less than 0.99 times the first distance;
the second plane is a third distance from the object plane;
the image plane is a fourth distance from the object plane; and
the third distance is less than 0.1 times the fourth distance.
2. The particle beam system of claim 1 , wherein the first imaging optical unit comprises an objective lens configured to provide a focusing magnetic field having a magnetic field strength that is greater than 20 mT at the image plane.
3. The particle beam system of claim 1 , wherein:
the multi-beam particle source comprises a first multiplicity of particle emitters alongside one another near the first object plane;
each particle emitter is configured to generate at least one of particle beam of the first multiplicity of particle beams;
the field generating arrangement comprises a magnetic coil configured to generate a magnetic field having a field direction in the first object plane that is orthogonal to the first object plane; and
the particle emitters are in the magnetic field.
4. The particle beam system of claim 1 , wherein, for each of at least 10% of the particle beams of the first multiplicity of particle beams, the field generating arrangement is configured so that:
two straight lines coincide with a trajectory of the particle beam before entering the field generating arrangement and after emerging from the field generating arrangement;
the two straight lines are in a first plane;
the two straight lines intersect at a vertex;
the two straight lines define a deflection angle between each other;
the vertex is in a second plane parallel to the object plane;
the vertex is a first distance from the optical axis;
a normal to the first plane through the vertex is a second distance from the optical axis;
the second distance is less than 0.99 times the first distance;
the second plane is a third distance from the object plane;
the image plane is a fourth distance from the object plane; and
the third distance is less than 0.1 times the fourth distance; and
the deflection angle by which the one particle beam is deflected by the field generating arrangement is greater than 10 μrad.
5. The particle beam system of claim 1 , wherein:
the field generating arrangement comprises a deflector array comprising a multiplicity of deflectors arranged alongside one another; and
for each deflector, during operation of the particle beam system, a group of particle beams passes through each of the deflectors.
6. The particle beam system of claim 5 , wherein:
each deflector comprises a pair of electrodes opposite one another;
for each deflector, during operation of the particle beam system, the group of particle beams passes through its pair of electrodes; and
the particle beam system further comprises a controller configured to apply, for each deflector, mutually different adjustable electrical potentials to the electrodes of the pair of electrodes.
7. The particle beam system of claim 5 , wherein:
each of the deflectors comprises a first plate and a second plate are behind the first plate along the beam path;
the first plate has a first opening;
the second plate has a second opening;
for each deflector, during operation of the particle beam system, the group of particle beams passes through the first and second openings;
for each deflector, a center of the first opening, as viewed in a direction of the beam path, is laterally offset relative to a center of the second opening; and
the particle beam system further comprises a controller configured to apply, for each deflector, mutually different electrical potentials to the first and second plates.
8. The particle beam system of claim 5 , wherein the group of particle beams comprises a single particle beam.
9. The particle beam system of claim 1 , wherein:
the deflection fields are generated so that, for each of at least half of a multiplicity of pairs of the particle beams of the first multiplicity of particle beams, 0.9<r1/r2*α2/α1<1.1;
r1 represents a radial distance between a location at which a first particle beam of the pair passes through the first object plane and a center of the first object plane;
r2 represents a radial distance between a location at which a second particle beam of the pair passes through the first object plane and the center of the first object plane;
α1 represents the absolute value of the deflection angle by which the first particle beam is deflected; and
α2 represents the absolute value of the deflection angle by which the second particle beam is deflected.
10. The particle beam system of claim 9 , wherein, during operation of the particle beam system, the deflection fields are configured to deflect the particles substantially in a circumferential direction around the center of the first object plane.
11. The particle beam system of claim 1 , wherein:
the multi-beam particle source comprises:
a particle emitter configured to generate a particle beam; and
a multi-aperture plate comprising a multiplicity of openings configured so that, during operation of the particle beam system, the particles of the particle beam pass through the openings to generate the first multiplicity of particle beams downstream of the multi-aperture plate.
12. A particle beam system, comprising:
a) an illumination system configured to direct the first multiplicity of particle beams alongside one another onto an object plane so that the first multiplicity of particle beams illuminate a multiplicity of incidence locations of the object plane;
b) an imaging optical unit having an optical axis, the imaging optical unit configured to:
i) direct a second multiplicity of particle beams emanating from the incidence locations onto a detector array; and
ii) image the object plane into an intermediate image plane in a beam path between the object plane and the detector array; and
c) a field generating arrangement configured to generate electric and/or magnetic deflection fields of adjustable strength,
wherein:
during operation of the particle beam system, the particle beams are deflected by the deflection fields of the field generating arrangement by deflection angles dependent on the strength of the deflection fields;
the field generating arrangement is configured so that, for one particle beam, two straight lines coincide with a trajectory of the particle beam before entering the field generating arrangement and after emerging from the field generating arrangement;
the two straight lines are in a first plane;
the two straight lines intersect at a vertex;
the two straight lines define a deflection angle between each other;
the vertex is in a second plane parallel to the intermediate image plane;
the vertex is a first distance from the optical axis;
a normal to the first plane through the vertex is a second distance from the optical axis;
the second distance is less than 0.99 times the first distance;
the second plane is a third distance from the intermediate image plane;
the intermediate image plane is a fourth distance from the detector array; and
the third distance is less than 0.1 times the fourth distance.
13. The particle beam system of claim 12 , wherein the imaging optical unit comprises an objective lens configured to provide a focusing magnetic field having a magnetic field strength that is greater than 20 mT at the object plane.
14. The particle beam system of claim 12 , wherein, for each of at least 10% of the particle beams of the first multiplicity of particle beams, the field generating arrangement is configured so that:
two straight lines coincide with a trajectory of the particle beam before entering the field generating arrangement and after emerging from the field generating arrangement;
the two straight lines are in a first plane;
the two straight lines intersect at a vertex;
the two straight lines define a deflection angle between each other;
the vertex is in a second plane parallel to the object plane;
the vertex is a first distance from the optical axis;
a normal to the first plane through the vertex is a second distance from the optical axis;
the second distance is less than 0.99 times the first distance;
the second plane is a third distance from the object plane;
the image plane is a fourth distance from the object plane; and
the third distance is less than 0.1 times the fourth distance; and
the deflection angle by which the one particle beam is deflected by the field generating arrangement is greater than 10 μrad.
15. The particle beam system of claim 12 , wherein:
the field generating arrangement comprises a deflector array comprising a multiplicity of deflectors arranged alongside one another; and
for each deflector, during operation of the particle beam system, a group of particle beams passes through each of the deflectors.
16. The particle beam system of claim 15 , wherein:
each deflector comprises a pair of electrodes opposite one another;
for each deflector, during operation of the particle beam system, the group of particle beams passes through its pair of electrodes; and
the particle beam system further comprises a controller configured to apply, for each deflector, mutually different adjustable electrical potentials to the electrodes of the pair of electrodes.
17. The particle beam system of claim 15 , wherein:
each of the deflectors comprises a first plate and a second plate are behind the first plate along the beam path;
the first plate has a first opening;
the second plate has a second opening;
for each deflector, during operation of the particle beam system, the group of particle beams passes through the first and second openings;
for each deflector, a center of the first opening, as viewed in a direction of the beam path, is laterally offset relative to a center of the second opening; and
the particle beam system further comprises a controller configured to apply, for each deflector, mutually different electrical potentials to the first and second plates.
18. The particle beam system of claim 15 , wherein the group of particle beams comprises a single particle beam.
19. The particle beam system of claim 12 , wherein:
the deflection fields are generated so that, for each of at least half of a multiplicity of pairs of the particle beams of the first multiplicity of particle beams, 0.9<r1/r2*α2/α1<1.1;
r1 represents a radial distance between a location at which a first particle beam of the pair passes through the first object plane and a center of the first object plane;
r2 represents a radial distance between a location at which a second particle beam of the pair passes through the first object plane and the center of the first object plane;
α1 represents the absolute value of the deflection angle by which the first particle beam is deflected; and
α2 represents the absolute value of the deflection angle by which the second particle beam is deflected.
20. The particle beam system of claim 19 , wherein, during operation of the particle beam system, the deflection fields are configured to deflect the particles substantially in a circumferential direction around the center of the first object plane.
21. The particle beam system of claim 19 , wherein:
the multi-beam particle source comprises:
a particle emitter configured to generate a particle beam; and
a multi-aperture plate comprising a multiplicity of openings configured so that, during operation of the particle beam system, the particles of the particle beam pass through the openings to generate the first multiplicity of particle beams downstream of the multi-aperture plate.
22. A particle beam system, comprising:
an illumination system configured to direct a multiplicity of particle beams onto a sample plane so that the particle beams illuminate a field of incidence locations at the sample plane,
wherein the illumination system comprises:
a multi-aperture plate in a beam path of the particle beams, the multi-aperture plate comprising a multiplicity of openings configured so that, for each opening in the multi-aperture plate, a particle beam passes through the opening;
a first single-aperture plate comprising an opening configured so that the multiplicity of particle beams passes through the opening of the first single-aperture plate;
a second single-aperture plate comprising an opening configured so that the multiplicity of particle beams passes through the opening of the second single-aperture plate; and
a voltage supply configured to apply to: i) to the first single-aperture plate an adjustable first electrical potential relative to the multi-aperture plate; and ii) to the second single-aperture plate an adjustable second electrical potential relative to the multi-aperture plate,
wherein:
the first single-aperture plate is a first distance from the multi-aperture plate;
the second single-aperture is a second distance from the multi-aperture plate; and
the first distance is less than half the second distance.
23. The particle beam system of claim 22 , wherein, other the first and second single-aperture plates, no further single-aperture plate is disposed at a distance from the multi-aperture plate which is less than the second distance.
24. The particle beam system of claim 22 , wherein the opening in the first plate has a first diameter, the opening in the second plate has a second diameter, and the second diameter is more than 1.5 times that first diameter.
25. The particle beam system of claim 22 , wherein the first single-aperture plate is between the multi-aperture plate and the second single-aperture plate.
26. The particle beam system of claim 22 , wherein the multi-aperture plate is between the first single-aperture plate and the second single-aperture plate.
27. The particle beam system of claim 22 , further comprising a third single-aperture plate having an opening through which the multiplicity of particle beams passes during use of the particle beam system, wherein:
the third single-aperture plate is a third distance from the multi-aperture plate;
the third distance is greater than the second distance;
a distance between the second and third multi-aperture plates is less than the third distance.
28. The particle beam system of claim 22 , further comprising a voltage supply configured to apply adjustable electrical potentials to the multi-aperture plate and the single-aperture plates.
29. The particle beam system of claim 28 , wherein the illumination system is configured to focus the particle beams respectively in the beam path downstream of the multi-aperture plate and upstream of the object plane, and the corresponding beam foci are arranged on a curved surface.
30. The particle beam system of claim 29 , further comprising a controller configured to control the voltage supply and to receive a first signal representing a desired curvature of the surface, wherein, when the first signal changes, the controller causes the voltage supply to change a potential difference between the multi-aperture plate and the first single-aperture plate to a greater extent than a potential difference between the multi-aperture plate and the second or third single-aperture plate.
31. The particle beam system of claim 29 , further comprising a controller configured to control the voltage supply and to receive a second signal representing a desired distance between the incidence locations of the particle beams in the object plane, wherein, when the second signal changes, the controller causes the voltage supply to change a potential difference between the multi-aperture plate and the first single-aperture plate to a lesser extent than a potential difference between the multi-aperture plate and the second or third single-aperture plate.
32. A particle beam system, comprising:
an illumination system configured to direct a multiplicity of particle beams onto an object plane so that the particle beams illuminate a field of incidence locations at the object plane,
wherein the illumination system comprises:
a particle emitter configured to generate a particle beam;
a condenser lens through which the particle beam passes;
a first multi-aperture plate in a beam path of the particle beam downstream of the condenser lens, the first multi-aperture plate comprising a multiplicity of openings through which particles of the particle beam pass to generate a multiplicity of particle beams downstream of the first multi-aperture plate;
a second multi-aperture plate arranged in the beam path downstream of the first multi-aperture plate, the second multi-aperture plate comprising a multiplicity of openings configured so that, for each opening in the second multi-aperture plate, one of the particle beams of the multiplicity of particle beams passes through the opening; and
a controller configured to:
excite the condenser lens so that the condenser lens provides an adjustable refractive power;
receive a first signal representing a desired distance between the incidence locations of the particle beams in the object plane; and
adjust the refractive power of the condenser lens when the first signal changes.
33. The particle beam system of claim 32 , wherein:
the illumination system is configured to focus the particle beams respectively in the beam path downstream of the multi-aperture plate and upstream of the object plane;
the corresponding beam foci are arranged on a curved surface;
the particle beam system further comprises a single-aperture plate in the beam path upstream or downstream of the second multi-aperture plate;
the single-aperture plate has an opening through which the multiplicity of particle beams passes during use of the particle beam system; and
the controller is configured to:
i) provide an adjustable electrical potential difference between the single-aperture plate and the multi-aperture plate;
ii) receive a second signal representing a desired curvature of the surface; and
iii) change the potential difference between the single-aperture plate and the multi-aperture plate in the event of a change in the second signal.