Apparatus of plural charged-particle beams
A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
1. A charged-particle beam apparatus, comprising:
a charged particle source configured to provide a primary beam;
an image forming unit configured to form a plurality of images of the charged particle source using a plurality of beamlets of the primary beam;
a first projection system including a transfer lens and an objective lens, wherein the transfer lens is configured to focus the plurality of beamlets, and wherein the objective lens is configured to receive the focused plurality of beamlets and form a plurality of probe spots on a sample from the plurality of beamlets;
a second projection system configured to focus a plurality of secondary beams generated by the plurality of probe spots on the sample;
a beam separator configured to separate the plurality of beamlets and the plurality of secondary beams; and
a detection device with a plurality of detection elements configured to receive the plurality of secondary beams,
wherein the second projection system includes an anti-rotation magnetic lens configured to minimize a rotation of the plurality of secondary beams directed to the detection device.
2. The charged-particle beam apparatus of claim 1 , wherein the transfer lens is configured to focus the plurality of beamlets to land on the sample perpendicularly.
3. The charged-particle beam apparatus of claim 2 , wherein the transfer lens is configured to focus the plurality of beamlets to pass through a front focal point of the objective lens.
4. The charged-particle beam apparatus of claim 1 , wherein the transfer lens is configured to reduce variation of imaging magnification by adjusting a focusing power of the transfer lens.
5. The charged-particle beam apparatus of claim 4 , wherein the transfer lens is configured to influence the trajectory of the corresponding beamlet by adjusting the focusing power.
6. The charged-particle beam apparatus of claim 1 , further comprising:
a deflection scanning unit configured to scan the plurality of probe spots on the sample.
7. The charged-particle beam apparatus of claim 6 , wherein the deflection scanning unit is configured to reduce off-axis aberrations of each off-axis beamlet by individually optimizing a trajectory of a corresponding beamlet.
8. The charged-particle beam apparatus of claim 7 , wherein the deflection scanning unit comprises a plurality of deflectors and each deflector of the plurality of deflectors is configured to reduce off-axis aberrations of each off-axis beamlet by individually optimizing a trajectory of a corresponding beamlet.
9. The charged-particle beam apparatus of claim 1 , further comprising:
a beam-limiting element having a plurality of beam-limit openings for limiting the plurality of beamlets.
10. The charged-particle beam apparatus of claim 1 , further comprising:
a condenser lens configured to focus the primary beam to vary electric currents of the plurality of probe spots on the sample.
11. The charged-particle beam apparatus of claim 1 , wherein the second projection system includes a zoom lens configured to minimize radial displacements of the plurality of secondary beams.
12. The charged-particle beam apparatus of claim 11 , wherein the zoom lens includes a plurality of lenses.
13. The charged-particle beam apparatus of claim 11 , wherein the zoom lens and the anti-rotation magnetic lens are configured to focus the plurality of secondary beams onto the detection elements.