Molybdenum(IV) and molybdenum(III) precursors for deposition of molybdenum films
Molybdenum(IV) and molybdenum(III) coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
1. A metal coordination complex comprising molybdenum(IV) or molybdenum(III),
wherein the metal coordination complex has a structure of Formula (I):
wherein L is independently selected from the group consisting of pyrazolo, pyrazolato, guanidino, and iminato, and
wherein the metal coordination complex comprises less than 5% of halogen and carbonyl.
2. The metal coordination complex of claim 1 , wherein L is independently selected from the group consisting of
and R is an unsubstituted or substituted C 1 -C 10 alkyl group.
3. The metal coordination complex of claim 1 , wherein the structure of Formula (I) is selected from the group consisting of