Semiconductor structure with source/drain multi-layer structure and method for forming the same
A semiconductor structure and a method for forming the same are provided. The semiconductor structure includes a gate structure formed over a fin structure, and a source/drain (S/D) epitaxial layer formed in the fin structure and adjacent to the gate structure. The S/D epitaxial layer includes a first S/D epitaxial layer and a second epitaxial layer. The semiconductor structure includes a gate spacer formed on a sidewall surface of the gate structure, and the gate spacer is directly over the first S/D epitaxial layer. The semiconductor structure includes a dielectric spacer formed adjacent to the gate spacer, and the dielectric spacer is directly over the second epitaxial layer.
1. A semiconductor structure, comprising:
a gate structure formed over a fin structure;
a source/drain (S/D) epitaxial layer formed in the fin structure and adjacent to the gate structure, wherein the S/D epitaxial layer comprises a first S/D epitaxial layer and a second epitaxial layer;
a gate spacer formed on a sidewall surface of the gate structure, wherein the gate spacer is directly over the first S/D epitaxial layer; and
a dielectric spacer formed adjacent to the gate spacer, wherein the dielectric spacer is in direct contact with the second epitaxial layer.
2. The semiconductor structure as claimed in claim 1 , further comprising:
a S/D silicide layer formed on the second S/D epitaxial layer, wherein the S/D silicide layer is not in direct contact with the dielectric spacer.
3. The semiconductor structure as claimed in claim 2 , wherein a width of the S/D silicide layer is smaller than a width of the second S/D epitaxial layer.
4. The semiconductor structure as claimed in claim 1 , wherein a bottom surface of the dielectric spacer is higher than a bottom surface of the gate spacer.
5. The semiconductor structure as claimed in claim 1 , wherein a top surface of the dielectric spacer is lower than a top surface of the gate structure.
6. The semiconductor structure as claimed in claim 1 , further comprising:
a contact plug formed over the second S/D epitaxial layer, wherein the contact plug is separated from the dielectric spacer by a dielectric layer.
7. The semiconductor structure as claimed in claim 1 , wherein a lattice constant of the first S/D epitaxial layer is greater than a lattice constant of the second S/D epitaxial layer.
8. The semiconductor structure as claimed in claim 1 , wherein the dielectric spacer has a tapered width from a bottom portion to a top portion.
9. The semiconductor structure as claimed in claim 1 , wherein an interface of the first S/D epitaxial layer and the second S/D epitaxial layer is aligned with a sidewall surface of the dielectric spacer.
10. A semiconductor structure, comprising:
a gate structure formed over a fin structure;
a gate spacer formed on a sidewall surface of the gate structure; and
a source/drain (S/D) structure formed in the fin structure and adjacent to the gate spacer; and
a dielectric spacer formed on a top surface of the S/D structure, wherein a bottom surface of the dielectric spacer is higher than a bottom surface of the gate spacer, and a top surface of the dielectric spacer is lower than a top surface of the gate spacer.
11. The semiconductor structure as claimed in claim 10 , further comprising:
a S/D silicide layer formed on the S/D structure, wherein the S/D silicide layer is not in direct contact with the dielectric spacer.
12. The semiconductor structure as claimed in claim 11 , wherein a width of the S/D silicide layer is smaller than a width of the second S/D epitaxial layer.
13. The semiconductor structure as claimed in claim 11 , wherein the S/D silicide layer is lower than a bottom surface of the dielectric spacer.
14. The semiconductor structure as claimed in claim 10 , wherein the dielectric spacer has a tapered width from a bottom portion to a top portion.
15. The semiconductor structure as claimed in claim 10 , further comprising:
a contact plug formed over the S/D structure, wherein the contact plug is separated from the dielectric spacer by a dielectric layer.
16. A method for forming a semiconductor structure, comprising:
forming a gate structure over a fin structure;
forming a source/drain (S/D) structure adjacent to the gate structure, wherein the S/D structure comprises a first S/D epitaxial layer and a second S/D epitaxial layer surrounded by the first S/D epitaxial layer;
forming a blocking layer covering a top surface of the second S/D epitaxial layer; and
forming a dielectric spacer on the top surface of the blocking layer and adjacent to the gate structure;
removing the blocking layer; and
removing a portion of the dielectric spacer, such that a topmost surface of the dielectric spacer is lower than a top surface of the gate structure.
17. The method for forming a semiconductor structure as claimed in claim 16 , further comprising:
forming a gate spacer over the fin structure and on a sidewall surface of the gate structure before forming the S/D structure; and
forming the dielectric spacer on a sidewall of the gate spacer.
18. The method for forming a semiconductor structure as claimed in claim 16 , further comprising:
removing a portion of the second S/D epitaxial layer to form an opening; and
forming a contact plug in the opening.
19. The method for forming a semiconductor structure as claimed in claim 16 , wherein removing the portion of the dielectric spacer is performed by a plasma etching process.
20. The method for forming a semiconductor structure as claimed in claim 16 , wherein a portion of the S/D structure is transferred into the blocking layer.