IP Library Granted Patent US 11,233,036
Granted Patent B2
US 11,233,036 · App. 17/183,276 · Granted Jan 25, 2022

Interconnect structure with redundant electrical connectors and associated systems and methods

Inventor: Anilkumar Chandolu (Boise, ID)
Assignee: Micron Technology, Inc.
H01L25/0657H01L21/56H01L21/76898H01L23/481H01L24/02H01L24/11H01L24/13H01L24/14H01L24/17H01L24/81H01L25/18H01L25/50H01L23/3128H01L23/3675H01L23/49816H01L24/05H01L24/16H01L24/32H01L2224/0239H01L2224/02371H01L2224/02372H01L2224/0401H01L2224/05548H01L2224/05647H01L2224/1145H01L2224/1147H01L2224/11462H01L2224/131H01L2224/133H01L2224/13024H01L2224/1329H01L2224/13083H01L2224/13084H01L2224/13111H01L2224/13147H01L2224/13155H01L2224/13164H01L2224/13565H01L2224/13647H01L2224/1411H01L2224/14181H01L2224/16113H01L2224/16145H01L2224/17107H01L2224/17181H01L2224/32225H01L2224/32245H01L2224/73253H01L2224/81193H01L2224/81815H01L2224/8385H01L2224/83424H01L2224/83447H01L2224/83455H01L2224/83487H01L2225/06513H01L2225/06517H01L2225/06541H01L2225/06544H01L2225/06555H01L2225/06582H01L2225/06589H01L2924/1033H01L2924/10253H01L2924/14H01L2924/1431H01L2924/1434H01L2924/1436H01L2924/1437H01L2924/15311H01L2924/16235H01L2924/16251H01L2924/3512
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Quick Facts
Patent No.
US 11,233,036
App. No.
17/183,276
Granted
Jan 25, 2022
Kind
B2
Abstract

Semiconductor die assemblies having interconnect structures with redundant electrical connectors are disclosed herein. In one embodiment, a semiconductor die assembly includes a first semiconductor die, a second semiconductor die, and an interconnect structure between the first and the second semiconductor dies. The interconnect structure includes a first conductive film coupled to the first semiconductor die and a second conductive film coupled to the second semiconductor die. The interconnect structure further includes a plurality of redundant electrical connectors extending between the first and second conductive films and electrically coupled to one another via the first conductive film.

Claims (40)

1. A semiconductor device, comprising:

a semiconductor substrate;

a plurality of through-substrate vias (TSVs) extending through the semiconductor substrate;

a conductive trace disposed at a surface of the semiconductor substrate and electrically coupled to the plurality of TSVs; and

a plurality of redundant electrical connectors electrically coupled to the conductive trace.

2. The semiconductor device of claim 1 , wherein the redundant electrical connectors extend away from the conductive trace in a first direction and the TSVs extend away from the conductive trace in a second direction generally opposite to the first direction.

3. The semiconductor device of claim 1 , further comprising:

a substrate contact coupled to a portion of the conductive trace and positioned directly between the conductive trace and at least one TSV of the plurality.

4. The semiconductor device of claim 1 , wherein the conductive trace is a first conductive trace, and the surface is a first surface of the semiconductor substrate, wherein the plurality of TSVs extend from the first surface to a second surface of the semiconductor substrate opposite to the first surface, the semiconductor device further comprising:

a second conductive trace disposed at the second surface and electrically coupled to the plurality of TSVs; and

a plurality of conductive bond pads electrically coupled to the second conductive trace.

5. The semiconductor device of claim 4 , wherein the redundant electrical connectors coupled to the first conductive trace extend away from the semiconductor substrate in a first direction and the conductive bond pads coupled to the second conductive trace extend away from the semiconductor substrate in a second direction generally opposite to the first direction.

6. The semiconductor device of claim 1 , further comprising:

a dielectric material over the surface of the semiconductor substrate, wherein the conductive trace extends at least partially through the dielectric material.

7. The semiconductor device of claim 6 , wherein the dielectric material includes a plurality of openings exposing portions of the conductive trace, wherein the redundant electrical connectors are formed in the openings.

8. The semiconductor device of claim 1 , wherein the plurality of redundant electrical connectors extend from the conductive trace and through a portion of a dielectric material disposed over the surface of the semiconductor substrate.

9. The semiconductor device of claim 1 , wherein each of the redundant electrical connectors includes:

a conductive pillar coupled to the conductive trace, and

a conductive bond material bonded to the conductive pillar.

10. The semiconductor device of claim 9 , wherein the conductive pillar comprises copper and the bond material comprises a solder material.

11. The semiconductor device of claim 9 , wherein the conductive pillar includes an end portion, and wherein the conductive bond material and conductive pillar form a conductive joint at the end portion.

12. The semiconductor device of claim 9 , wherein the conductive pillar includes generally vertical sidewalls and a barrier and/or seed material covering at least a portion of the sidewalls.

13. A semiconductor die assembly, comprising:

a first semiconductor die including a plurality of through-substrate vias (TSVs) and a first conductive trace disposed at a first surface of the first semiconductor die, the first conductive trace electrically coupled to the plurality of TSVs;

a second semiconductor die including a second conductive trace disposed at a second surface of the second semiconductor die; and

a plurality of redundant electrical connectors electrically coupling the first conductive trace to the second conductive trace.

14. The semiconductor die assembly of claim 13 , wherein the plurality of TSVs is a first plurality of TSVs, and wherein the second semiconductor die includes a second plurality of TSVs, the second conductive trace electrically coupled to the second plurality of TSVs.

15. The semiconductor die assembly of claim 14 , wherein:

the first conductive trace is electrically coupled to at least one TSV of the first plurality through a substrate contact positioned directly therebetween; and

the second conductive trace is directly connected to at least one TSV of the second plurality.

16. The semiconductor die assembly of claim 13 , wherein each of the redundant electrical connectors includes:

a conductive pillar coupled to the first conductive trace;

a bond pad coupled to the second conductive trace; and

a conductive bond material located between the conductive pillar and the bond pad.

17. The semiconductor die assembly of claim 16 , wherein the conductive pillar and the raised bond pad comprise copper, and the bond material comprises a solder material.

18. The semiconductor die assembly of claim 16 , wherein the conductive pillar includes an end portion, and wherein the conductive bond material forms a conductive joint coupling the bond pad to the end portion of the conductive pillar.

19. The semiconductor die assembly of claim 16 , wherein the conductive pillar and the bond pad include generally vertical sidewalk respectively, at least a portion of the sidewalls covered by a barrier and/or seed material.

20. The semiconductor die assembly of claim 13 , wherein:

the first semiconductor die is a first logic die or a first memory die; and

the second semiconductor die is a second logic die or a second memory die.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 23, 2021
From: CHANDOLU, ANILKUMAR
To: MICRON TECHNOLOGY, INC.
Reel/Frame 055378/0312 →
Continuity (5)
Continuation 16257438 · Jan 25, 2019
Continuation 15724102 · Oct 3, 2017
Continuation 15162209 · May 23, 2016
Division 14287418 · May 27, 2014
Related Publication 20210202446A1 · Jul 1, 2021