Heterogeneous integration of an electro-optical platform
A hybrid photonic integrated circuit and a method of its manufacture are provided. A SiP functional layer is fabricated on an SOI wafer. A lithium niobate thin film is bonded to the SiP functional layer. The silicon handle layer is removed from the SOI wafer to expose buried oxide, and at least one III-V die is bonded to the exposed buried oxide. In embodiments, at least one waveguiding component is fabricated in the SiP functional layer. In embodiments, the SiP functional layer comprises a top waveguiding layer.
1. A hybrid photonic integrated circuit, comprising:
a silicon photonics (SiP) functional layer that comprises a top silicon layer, a layer of buried oxide, and at least one optical or optoelectronic component formed in the top silicon layer;
a thin film of lithium niobate bonded to the SiP functional layer, wherein the thin film of lithium niobate is backed by a silicon handle; and
at least one III-V die bonded to the layer of buried oxide, wherein the thin film of lithium niobate and the III-V die are positioned on opposing sides of the SiP functional layer;
wherein the SiP functional layer comprises one or more SiP waveguiding components, a first of the one or more SiP waveguiding components adapted to be optically coupled to a first of the at least one III-V die so as to support a first hybrid optical mode that is partly confined in the first of the at least one III-V die and partly confined in the first of the one or more SiP waveguiding components, the first hybrid optical mode corresponding to light simultaneously traveling in the first of the at least one III-V die and in the first of the one or more SiP waveguiding components in a direction parallel to and at an interface between the SiP functional layer and the first of the at least one III-V die.
2. The hybrid photonic integrated circuit of claim 1 ,
wherein at least one of the one or more SiP waveguiding components is adapted to be optically coupled to the thin film of lithium niobate.
3. The hybrid photonic integrated circuit of claim 1 ,
wherein the SiP functional layer comprises one or more additional waveguiding layers; and
wherein a first of the one or more additional waveguiding layer layers is adapted to be optically coupled to the thin film of lithium niobate so as to support a second hybrid optical mode that is partly confined in lithium niobate material of the thin film of lithium niobate and partly confined in the first of the one or more additional waveguiding layers, the second hybrid optical mode corresponding to light simultaneously traveling in the lithium niobate material of the thin film of lithium niobate and in the first of the one or more additional waveguiding layers in a direction parallel to and at an interface between the SiP functional layer and the thin film of lithium niobate.
4. The hybrid photonic integrated circuit of claim 1 ,
wherein the SiP functional layer comprises one or more silicon nitride waveguiding layers; and
wherein a silicon nitride waveguiding component formed in one of the one or more silicon nitride waveguiding layers is adapted to be optically coupled to the thin film of lithium niobate so as to support a third hybrid optical mode that is confined partly in the thin film of lithium niobate and partly confined in the silicon nitride waveguiding component.
5. The hybrid photonic integrated circuit of claim 1 ,
wherein the SiP functional layer comprises at least two silicon nitride waveguiding layers situated at different vertical levels within the SiP functional layer;
wherein a first of the at least two silicon nitride waveguiding layers comprises a first silicon nitride waveguiding component that is adapted to be optically coupled to the thin film of lithium niobate so as to support a fourth hybrid optical mode that is confined partly in the thin film of lithium niobate and partly confined in the first silicon nitride waveguiding component;
wherein a second of the at least two silicon nitride waveguiding layers is situated at a vertical level between the first of the at least two silicon nitride waveguiding layers and the top silicon layer; and
wherein the second of the at least two silicon nitride waveguiding layers comprises a second silicon nitride waveguiding component that is adapted to be optically coupled both to the first silicon nitride waveguiding component and to a waveguiding component formed in the top silicon layer.
6. The hybrid photonic integrated circuit of claim 1 ,
wherein an active III-V device formed in one of the at least one III-V die is bonded to the layer of buried oxide; and
wherein the hybrid photonic integrated circuit further comprises a thermal shunt that extends from the active III-V device, through the SiP functional layer, and down to or down into the silicon handle.
7. The hybrid photonic integrated circuit of claim 1 , wherein the SiP functional layer comprises at least one germanium photodetector.
8. The hybrid photonic integrated circuit of claim 1 , wherein at least one active III-V device formed in one of the at least one III-V die is bonded to the layer of buried oxide.
9. A hybrid photonic integrated circuit, comprising:
a silicon photonics (SiP) functional layer that comprises a top waveguiding layer and a layer of buried oxide;
a thin film of lithium niobate bonded to the SiP functional layer, wherein the thin film of lithium niobate is backed by a silicon handle; and
at least one III-V die bonded to the layer of buried oxide, wherein the thin film of lithium niobate and the III-V die are positioned on opposing sides of the SiP functional layer;
wherein the SiP functional layer comprises one or more SiP waveguiding components, a first of the one or more SiP waveguiding components adapted to be optically coupled to a first of the at least one III-V die so as to support a first hybrid optical mode that is partly confined in the first of the at least one III-V die and partly confined in the first of the one or more SiP waveguiding components, the first hybrid optical mode corresponding to light simultaneously traveling in the first of the at least one III-V die and in the first of the one or more SiP waveguiding components in a direction parallel to and at an interface between the SiP functional layer and the first of the at least one III-V die.
10. The hybrid photonic integrated circuit of claim 9 ,
wherein at least one of the one or more SiP waveguiding components is adapted to be optically coupled to the thin film of lithium niobate.
11. The hybrid photonic integrated circuit of claim 9 ,
wherein the SiP functional layer comprises one or more additional waveguiding layers; and
wherein a first of the one or more additional waveguiding layer layers is adapted to be optically coupled to the thin film of lithium niobate so as to support a second hybrid optical mode that is partly confined in lithium niobate material of the thin film of lithium niobate and partly confined in the first of the one or more additional waveguiding layers, the second hybrid optical mode corresponding to light simultaneously traveling in the lithium niobate material of the thin film of lithium niobate and in the first of the one or more additional waveguiding layers in a direction parallel to and at an interface between the SiP functional layer and the thin film of lithium niobate.
12. The hybrid photonic integrated circuit of claim 9 ,
wherein the SiP functional layer comprises one or more silicon nitride waveguiding layers; and
wherein a silicon nitride waveguiding component formed in one of the one or more silicon nitride waveguiding layers is adapted to be optically coupled to the thin film of lithium niobate so as to support a third hybrid optical mode that is confined partly in the thin film of lithium niobate and partly confined in the silicon nitride waveguiding component.
13. The hybrid photonic integrated circuit of claim 9 ,
wherein the SiP functional layer comprises at least two silicon nitride waveguiding layers situated at different vertical levels within the SiP functional layer;
wherein a first of the at least two silicon nitride waveguiding layers comprises a first silicon nitride waveguiding component that is adapted to be optically coupled to the thin film of lithium niobate so as to support a fourth hybrid optical mode that is confined partly in the thin film of lithium niobate and partly confined in the first silicon nitride waveguiding component;
wherein a second of the at least two silicon nitride waveguiding layers is situated at a vertical level between the first of the at least two silicon nitride waveguiding layers and the top silicon layer; and
wherein the second of the at least two silicon nitride waveguiding layers comprises a second silicon nitride waveguiding component that is adapted to be optically coupled both to the first silicon nitride waveguiding component and to a waveguiding component formed in the top silicon layer.
14. The hybrid photonic integrated circuit of claim 9 ,
wherein an active III-V device formed in one of the at least one III-V die is bonded to the layer of buried oxide; and
wherein the hybrid photonic integrated circuit further comprises a thermal shunt that extends from the active III-V device, through the SiP functional layer, and down to or down into the silicon handle.
15. The hybrid photonic integrated circuit of claim 9 , wherein the SiP functional layer comprises at least one germanium photodetector.
16. The hybrid photonic integrated circuit of claim 9 , wherein at least one active III-V device formed in one of the at least one III-V die is bonded to the layer of buried oxide.