IP Library › Granted Patent US 11,669,664
Granted Patent B2
US 11,669,664 · App. 17/222,108 · Granted Jun 6, 2023

System on chip (SOC) current profile model for integrated voltage regulator (IVR) co-design

Inventors: Haohua Zhou (Fremont, CA); Tze-Chiang Huang (Saratoga, CA); Mei Hsu Wong (Saratoga, CA)
Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
G06F30/30G06F30/367G06F30/39H01L23/50H01L23/5286H01L23/5384
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Quick Facts
Patent No.
US 11,669,664
App. No.
17/222,108
Granted
Jun 6, 2023
Kind
B2
Abstract

A method includes: extracting a first current profile model corresponding to a System on Chip (SOC) at a first design stage of the SOC; determining that a first design data of an Integrated Voltage Regulator (IVR) and the SOC pass a first co-simulation based on the extracted first current profile model; extracting a second current profile model corresponding to the SOC at a second design stage of the SOC, the second design stage being subsequent to the first design stage; refining the first design data of the IVR to generate a second design data of the IVR; determining that the second design data of the IVR and the SOC pass a second co-simulation based on the extracted second current profile model.

Claims (46)

1. A method comprising:

extracting a first current profile model corresponding to a System on Chip (SOC) at a first design stage of the SOC;

determining that a first design data of an Integrated Voltage Regulator (IVR) and the SOC pass a first co-simulation based on the extracted first current profile model;

extracting a second current profile model corresponding to the SOC at a second design stage of the SOC, the second design stage being subsequent to the first design stage;

refining the first design data of the IVR to generate a second design data of the IVR;

determining that the second design data of the IVR and the SOC pass a second co-simulation based on the extracted second current profile model;

extracting a third current profile model corresponding to the SOC at a third design stage of the SOC, the third design stage being subsequent to the second design stage;

refining the second design data of the IVR to generate a third design data of the IVR; and

determining that the third design data of the IVR and the SOC pass a third co-simulation based on the extracted third current profile model.

2. The method of claim 1 , wherein the first design stage comprises a Register-Transfer Level (RTL) design stage.

3. The method of claim 1 , wherein the second design stage comprises a pre-simulation design stage of the SOC.

4. The method of claim 1 , wherein the third design stage comprises a post-simulation design stage of the SOC.

5. The method of claim 1 , wherein at least one of the first current profile model, the second current profile model, and the third current profile model includes a decoupling capacitor model.

6. The method of claim 1 , wherein at least one of the first current profile model, the second current profile model, and the third current profile model includes a power grid model.

7. The method of claim 6 , wherein the power grid model corresponds to at least one of the following: bumps and Through-Silicon Vias (TSV).

8. The method of claim 6 , wherein the power grid model corresponds to a power mesh of the SOC.

9. The method of claim 1 , wherein at least one of the first current profile model, the second current profile model, and the third current profile model comprises a Piecewise Linear (PWL) description of an SOC I(t) extracted from a dynamic power waveform.

10. The method of claim 9 , further comprising selecting a T step for the SOC I(t) comprising min (0.1×T period , T rise /T fall ).

11. The method of claim 10 , further comprising flipping back the I(t) during at least one of the first co-simulation, the second co-simulation, and the third co-simulation.

12. The method of claim 1 , further comprising applying a regression scaling to the first current profile, the second current profile, and the third current profile.

13. The method of claim 1 , wherein the IVR comprises a switching regulator.

14. The method of claim 1 , wherein the IVR comprises a low-dropout (LDO) regulator.

15. A method comprising:

extracting a first current profile model corresponding to a System on Chip (SOC) at a Register-Transfer Level (RTL) design stage of the SOC;

determining that a first design data of an Integrated Voltage Regulator (IVR) and the SOC pass a first co-simulation based on the extracted first current profile model;

extracting a second current profile model corresponding to the SOC at a pre-simulation design stage of the SOC;

refining the first design data of the IVR to generate a second design data of the IVR; and

determining that the second design data of the IVR and the SOC pass a second co-simulation based on the extracted second current profile model.

16. The method of claim 15 , further comprising:

extracting a third current profile model corresponding to the SOC at a post-simulation design stage of the SOC;

refining the second design data of the IVR to generate a third design data of the IVR; and

determining that the third design data of the IVR and the SOC pass a third co-simulation based on the extracted third current profile model.

17. The method of claim 16 , wherein at least one of the first current profile model, the second current profile model, and the third current profile model includes at least one of the following a decoupling capacitor model, a power grid model, and a Piecewise Linear (PWL) description of an SOC I(t) extracted from a dynamic power waveform.

18. A method comprising:

extracting a first current profile model corresponding to a System on Chip (SOC) at a first design stage of the SOC;

determining that a first design data of an Integrated Voltage Regulator (IVR) and the SOC pass a first co-simulation based on the extracted first current profile model;

extracting a second current profile model corresponding to the SOC at a second design stage of the SOC, the second design stage being subsequent to the first design stage;

refining the first design data of the IVR to generate a second design data of the IVR;

determining that the second design data of the IVR and the SOC pass a second co-simulation based on the extracted second current profile model; and

applying a first regression scaling to the first current profile and a second regression scaling to the second current profile, wherein the second regression scaling is larger than the first regression scaling.

19. The method of claim 18 , further comprising:

extracting a third current profile model corresponding to the SOC at a third design stage of the SOC, the third design stage being subsequent to the second design stage;

refining the second design data of the IVR to generate a third design data of the IVR;

determining that the third design data of the IVR and the SOC pass a third co-simulation based on the extracted third current profile model; and

applying a third regression scaling to the third current profile, wherein the third regression scaling is larger than the second regression scaling.

20. The method of claim 19 , wherein the first design stage comprises a Register-Transfer Level (RTL) design stage, the second design stage comprises a pre-simulation design stage of the SOC, and the third design stage comprises a post-simulation design stage of the SOC.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 5, 2021
From: ZHOU, HAOHUA; HUANG, TZE-CHIANG; WONG, MEI HSU
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 055825/0032 →
Continuity (4)
Continuation 16599823 · Oct 11, 2019
Provisional Application 62857373 · Jun 5, 2019
Provisional Application 62772966 · Nov 29, 2018
Related Publication 20210224445A1 · Jul 22, 2021
Cited By (1)
US 12,271,667