Microelectromechanical microphone having a robust backplate

1. A microelectromechanical microphone device, the microphone device comprising:

a rigid plate defining multiple openings configured to permit passage of a pressure wave; and

a stiffener member integrated into the rigid plate,

wherein the stiffener member is configured to cause stress to be distributed within the rigid plate in response to the pressure wave inducing deformation of the rigid plate,

wherein the stiffener member is buried within the rigid plate, the stiffener member forming an interface with a portion of the rigid plate,

wherein the stiffener member comprises one of a metal or an alloy of a first metal and a second metal, and

wherein the alloy of the first metal and the second metal comprises AlCu.

2. The microelectromechanical microphone device of claim 1 , wherein the stiffener member overlays a portion of the rigid plate, the stiffener member forming a substantially planar interface with the portion of the rigid plate.

3. The microelectromechanical microphone device of claim 1 , wherein the rigid plate comprises a first material, wherein the stiffener member comprises a second material, and wherein a Young's modulus of the first material being less than a Young's modulus of the second material.

4. The microelectromechanical microphone device of claim 1 , wherein the rigid plate is mechanically coupled to a flexible plate by a dielectric member that extends between the rigid plate and the flexible plate, and wherein the stiffener member is configured to cause a magnitude of stress at a suspension interface between the rigid plate and the dielectric member to be reduced by about 30% to about 50% relative to a second magnitude of the stress in absence of the stiffener member.

5. The microelectromechanical microphone device of claim 1 , wherein the stiffener member has axial symmetry relative to an axis that is perpendicular to the rigid plate and pierces a geometric center of the rigid plate, the stiffener member having a width in a range from about 5 μm to about 20 μm.

6. The microelectromechanical microphone device of claim 1 , wherein the stiffener member has a uniform thickness having a magnitude in a range from about 1 μm to about 10 μm.

7. The microelectromechanical microphone device of claim 1 , wherein the stiffener member comprises a dielectric material.

8. The microelectromechanical microphone device of claim 7 , wherein the dielectric material comprises one of silicon nitride, aluminum nitride, an alkali halide, lithium fluoride, barium titanate, lead titanate or a semiconductor material.

9. The microelectromechanical microphone device of claim 7 , wherein the dielectric material comprises one of alumina, silicon monoxide, silicon dioxide, titanium dioxide, hafnium dioxide, tantalum oxide, tungsten oxide, or zirconium dioxide.

10. A method comprising:

forming a rigid plate defining multiple openings for permitting passage of a pressure wave; and

integrating a stiffener member into the rigid plate,

wherein the stiffener member is able to cause stress to be distributed within the rigid plate in response to the pressure wave inducing deformation of the rigid plate,

wherein integrating the stiffener member into the rigid plate comprises forming the stiffener member during formation of the rigid plate,

wherein forming the rigid plate comprises forming a first section of the rigid plate,

wherein forming the stiffener member comprises depositing an amount of a first material onto a portion of the first section of the rigid plate,

wherein the rigid plate comprises polycrystalline silicon, and

wherein depositing the amount of the first material comprises depositing an oxide of silicon.

11. The method of claim 10 , wherein forming the rigid plate further comprises forming a second section of the rigid plate covering the stiffener member.

12. The method of claim 10 , wherein the rigid plate comprises a second material, and wherein a Young's modulus of the first material is greater than a Young's modulus of the second material.

13. A device comprising:

a microelectromechanical microphone device comprising:

a rigid plate mechanically defining multiple openings configured to permit passage of a pressure wave; and

a stiffener member integrated into the rigid plate, wherein the stiffener member is configured to cause stress to be distributed within the rigid plate in response to the pressure wave inducing deformation of the rigid plate, and wherein the stiffener member is buried within the rigid plate, the stiffener member forming an interface with a portion of the rigid plate; and

a circuit coupled to the microelectromechanical microphone device and,

wherein the circuit is configured to:

receive a first signal indicative of a capacitance representative of an amplitude of the pressure wave, and

generate a second signal representative of the amplitude of the pressure wave, and

wherein the rigid plate comprises polycrystalline silicon, and wherein the stiffener member comprises an oxide of silicon.

14. The device of claim 13 , wherein the rigid plate comprises a first material and the stiffener member comprises a second material, and wherein a Young's modulus of the first material is less than a Young's modulus of the second material.