Semiconductor structure and manufacturing method thereof
A semiconductor structure and a manufacturing method thereof are provided. A semiconductor structure includes top, bottom, and middle tiers. The bottom tier includes a first interconnect structure overlying a first semiconductor substrate, and a first front-side bonding structure overlying the first interconnect structure. The middle tier interposed between and electrically coupled to the top and bottom tiers includes a second interconnect structure overlying a second semiconductor substrate, a second front-side bonding structure interposed between the top tier and the second interconnect structure, and a back-side bonding structure interposed between the second semiconductor substrate and the first front-side bonding structure. A bonding feature of the second front-side bonding structure includes a first bonding via in contact with the second interconnect structure, a first bonding contact overlying the first bonding via, and a barrier layer interface between a bottom of the first bonding contact and a top of the first bonding via.
1. A semiconductor structure, comprising:
a top tier;
a bottom tier comprising a first interconnect structure overlying a first semiconductor substrate, and a first front-side bonding structure overlying the first interconnect structure; and
a middle tier interposed between and electrically coupled to the top tier and the bottom tier, the middle tier comprising:
a second interconnect structure overlying a second semiconductor substrate;
a second front-side bonding structure interposed between the top tier and the second interconnect structure, a first bonding feature of the second front-side bonding structure comprising a first bonding via in contact with the second interconnect structure, a first bonding contact overlying the first bonding via, and a barrier layer interface between a bottom of the first bonding contact and a top of the first bonding via; and
a back-side bonding structure interposed between the second semiconductor substrate and the first front-side bonding structure of the bottom tier.
2. The semiconductor structure of claim 1 , wherein the middle tier further comprises:
a first through substrate via (TSV) extending through the second semiconductor substrate, the first TSV comprising a first surface connected to the back-side bonding structure and a second surface connected to the second interconnect structure, wherein the first surface is wider than the second surface.
3. The semiconductor structure of claim 1 , wherein:
the first front-side bonding structure of the bottom tier comprises a second bonding feature which comprises a second bonding via in contact with the first interconnect structure, and a second bonding contact overlying the second bonding via; and
the back-side bonding structure of the middle tier comprises a third bonding contact that is in direct contact with a first TSV of the middle tier and the second bonding contact of the bottom tier.
4. The semiconductor structure of claim 3 , wherein a surface of the third bonding contact of the back-side bonding structure of the middle tier connected to a surface of the first TSV of the middle tier comprises a first lateral dimension less than a second lateral dimension of the surface of the first TSV of the middle tier.
5. The semiconductor structure of claim 1 , wherein:
the first front-side bonding structure of the bottom tier comprises a first dummy feature; and
the back-side bonding structure of the middle tier comprises a second dummy feature bonded to the first dummy feature of the bottom tier, wherein the second dummy feature is electrically floating.
6. The semiconductor structure of claim 1 , wherein a bonding interface of the first front-side bonding structure of the bottom tier and the back-side bonding structure of the middle tier comprises a metal-to-metal bond and a dielectric-to-dielectric bond.
7. The semiconductor structure of claim 1 , wherein the top tier comprises:
a third interconnect structure underlying a third semiconductor substrate;
a third front-side bonding structure underlying the third interconnect structure and facing the middle tier; and
a second TSV extending through the third semiconductor substrate to be coupled to the third interconnect structure, wherein a portion of the second TSV protruded from the third semiconductor substrate comprises a curved sidewall in a cross-sectional view.
8. A semiconductor structure, comprising:
a first stack and a second stack underlying and electrically coupled to the first stack, the second stack comprising:
a first tier comprising a first interconnect structure overlying a first semiconductor substrate; and
a second tier interposed between and electrically coupled to the first stack and the first tier, the second tier comprising:
a second interconnect structure overlying a second semiconductor substrate; and
a first through substrate via (TSV) extending through the second semiconductor substrate, the first TSV comprising a first end bonded to a first metal pattern of the first interconnect structure of the first tier and a second end landing on a second metal pattern of the second interconnect structure.
9. The semiconductor structure of claim 8 , wherein a first lateral dimension of the first metal pattern of the first tier is greater than a second lateral dimension of the first end of the first TSV of the second tier.
10. The semiconductor structure of claim 8 , wherein the first tier further comprises:
a first bonding dielectric layer laterally covering the first metal pattern of the first interconnect structure, wherein a surface of the first bonding dielectric layer and a surface the first metal pattern are substantially level.
11. The semiconductor structure of claim 8 , wherein the second tier further comprises:
a second bonding dielectric layer underlying the second semiconductor substrate and laterally covering a portion of the first TSV protruded from the second semiconductor substrate, wherein a surface of the second bonding dielectric layer and a surface the first end of the first TSV are substantially level.
12. The semiconductor structure of claim 11 , wherein the portion of the first TSV comprises a tapered sidewall having a curved shape in a cross-sectional view.
13. The semiconductor structure of claim 8 , wherein a bonding interface of the first tier and the second tier comprises a metal-to-metal bond and a dielectric-to-dielectric bond.
14. The semiconductor structure of claim 8 , wherein the first stack comprises:
a middle tier comprising a third semiconductor substrate disposed over the second stack, a third interconnect structure overlying the third semiconductor substrate, and a first front-side bonding structure overlying the third interconnect structure; and
an outermost tier comprising a second front-side bonding structure overlying and bonded to the first front-side bonding structure of the middle tier, a fourth interconnect structure overlying the second front-side bonding structure, and a fourth semiconductor substrate overlying the fourth interconnect structure.
15. A manufacturing method of a semiconductor structure, comprising:
providing a first semiconductor wafer, wherein the first semiconductor wafer comprises a back-side bonding structure overlying a first semiconductor substrate, a first interconnect structure underlying the first semiconductor substrate, and a bonding via connected to an interconnect layer of the first interconnect structure;
bonding a second semiconductor wafer to the first semiconductor wafer to form a bonded wafer, wherein the second semiconductor wafer comprises a second semiconductor substrate, a first front-side bonding structure bonded to the back-side bonding structure of the first semiconductor wafer, a second interconnect structure interposed between the second semiconductor substrate and the first front-side bonding structure;
trimming the bonded wafer; and
forming a bonding contact on the bonding via of the first semiconductor wafer to form a second front-side bonding structure of the first semiconductor wafer after the trimming.
16. The manufacturing method of claim 15 , wherein providing the first semiconductor wafer comprises:
thinning the first semiconductor substrate and then forming a through substrate via (TSV) in the first semiconductor substrate to be electrically coupled to the first interconnect structure;
forming a hole in a bonding dielectric material overlying the first semiconductor substrate to form a bonding dielectric layer accessibly exposing at least a portion of the TSV; and
forming conductive materials in the hole of the bonding dielectric layer to form a bonding feature of the back-side bonding structure on the TSV.
17. The manufacturing method of claim 15 , wherein bonding the second semiconductor wafer to the first semiconductor wafer comprises:
forming dielectric-dielectric bonds and metal-to-metal bonds at a bonding interface of the first front-side bonding structure of the second semiconductor wafer and the back-side bonding structure of the first semiconductor wafer.
18. The manufacturing method of claim 15 , wherein forming the bonding contact on the bonding via comprises:
forming a bonding dielectric layer with an opening over the first interconnect structure, wherein the opening accessibly exposes the bonding via;
forming a barrier material lining the opening and contacting an exposed surface of the bonding via; and
forming a conductive material on the barrier material to fill the opening.
19. The manufacturing method of claim 15 , further comprising:
attaching the first semiconductor wafer to a temporary carrier before the bonding, wherein the temporary carrier is removed during the trimming.
20. The manufacturing method of claim 16 , further comprising:
bonding a wafer stack to the second front-side bonding structure of the first semiconductor wafer; and
performing a singulation process to form a semiconductor structure.