Circuit board structure and manufacturing method thereof
A method of manufacturing circuit board structure includes forming a sacrificial layer having first openings on a substrate; forming a metal layer on the sacrificial layer; forming a patterned photoresist layer having second openings over the sacrificial layer, in which the second openings are connected to the first openings and expose a portion of the metal layer; forming a first circuit layer filling the second openings and the first openings; forming a first dielectric layer over the sacrificial layer and covering the metal layer, in which the first dielectric layer has third openings exposing the first circuit layer; forming a second circuit layer filling the third openings and covering a portion of the first dielectric layer; removing the substrate to expose the sacrificial layer, a portion of the metal layer and a portion of the first circuit layer; and removing the sacrificial layer and the metal layer.
1. A method of manufacturing a circuit board structure, comprising steps of:
forming a sacrificial layer on a substrate, wherein the sacrificial layer has a first opening exposing a portion of the substrate;
forming a metal layer on a sidewall and a top surface of the sacrificial layer;
forming a patterned photoresist layer over the sacrificial layer, wherein the patterned photoresist layer has a second opening connecting to the first opening and exposing a portion of the metal layer;
forming a first circuit layer filling the second opening and the first opening, wherein the first circuit layer covers the portion of the metal layer;
forming a first dielectric layer over the sacrificial layer and covering the metal layer, wherein the first dielectric layer has a third opening exposing the first circuit layer;
forming a second circuit layer filling the third opening and covering a portion of the first dielectric layer, wherein the second circuit layer is integrally formed without any interface;
removing the substrate to expose the sacrificial layer, a portion of the metal layer, and a portion of the first circuit layer; and
removing the sacrificial layer and the metal layer.
2. The method of claim 1 , wherein the first circuit layer has a first portion located in the first opening and a second portion located in the second opening, while the first portion and the second portion are integrally formed as a unitary structure.
3. The method of claim 1 , wherein the step of forming the metal layer on the sacrificial layer comprises conformally forming the metal layer on the sacrificial layer.
4. The method of claim 1 , wherein the step of forming the patterned photoresist layer over the sacrificial layer comprises:
forming a photoresist layer over the sacrificial layer;
exposing the photoresist layer by using a first light source, wherein the first light source and the sacrificial layer are respectively disposed on opposite sides of the substrate;
exposing the photoresist layer by using a second light source, wherein the second light source is disposed at a side of the substrate on which the sacrificial layer is disposed; and
performing a developing step to form the patterned photoresist layer.
5. The method of claim 4 , wherein the photoresist layer comprises a positive photoresist material.
6. The method of claim 1 , wherein the substrate is made of a light transmissive material.
7. The method of claim 1 , after the step of forming the second circuit layer and before the step of removing the substrate, further comprising:
forming a second dielectric layer over the first dielectric layer and covering the first dielectric layer and the second circuit layer, wherein the second dielectric layer has a fourth opening exposing the second circuit layer; and
forming a third circuit layer filling the fourth opening and covering a portion of the second dielectric layer.
8. The method of claim 1 , after the step of forming the second circuit layer and before the step of removing the substrate, further comprising:
forming a solder mask layer on the first dielectric layer.