Semiconductor device and method for manufacturing semiconductor device
View Patent ↗A method for manufacturing a semiconductor device includes a process of providing two source electrodes on a substrate, a process of providing a gate electrode on one surface of the substrate between the two source electrodes, a process of providing an insulating film on the gate electrode, the substrate, and side surfaces of the two source electrodes, a process of providing an airbridge foundation resist on the insulating film, providing an airbridge on the two source electrodes and the airbridge foundation resist, and a process of removing the airbridge foundation resist, in which surfaces of the two source electrodes at sides opposite to the substrate and a front surface of the airbridge foundation resist provided in the subsequent process are substantially coplanar.
1. A semiconductor device, comprising:
a substrate;
a pair of source electrodes provided to be separated from each other on an upper surface of the substrate, a direction from one of the pair of source electrodes to another one of the pair of source electrodes being along a first direction;
source portions extending in a second direction crossing the first direction, at least one of the source portions being connected to the one of the pair of source electrodes, at least another one of the source portions being connected to the other one of the pair of source electrodes;
a gate electrode provided on the upper surface of the substrate between the pair of source electrodes, the gate electrode being separated from the pair of source electrodes, an upper surface of the gate electrode being lower than upper surfaces of the pair of source electrodes;
a drain electrode provided between the at least one of the source portions and the at least the other one of the source portions connected to the other one of the pair of source electrodes in the first direction;
an insulating film provided on inside side surfaces of the pair of source electrodes, and over a top surface of the gate electrode; and
an airbridge provided to be separated from the substrate and the gate electrode by a space, the airbridge being connected to the upper surfaces of the pair of source electrodes,
an upper surface of the airbridge including:
a pair of first regions facing the pair of source electrodes, and
a second region positioned between the pair of first regions,
the second region being located at a lower position than the pair of first regions;
a lower surface of the airbridge including:
a pair of third regions and a fourth region between the pair of third regions, the pair of third regions being below the pair of first regions of the upper surface of the airbridge, and the fourth region being below the second region of the upper surface of the airbridge, and
the lower surface of the fourth region being below the lower surface of the pair of third regions;
wherein the inside side surfaces of the pair of source electrodes are covered by the insulating film,
an upper edge of the insulating film is covered by the airbridge, and
the drain electrode is not provided between the substrate and the airbridge in a third direction crossing a plane including the first direction and the second direction.
2. The semiconductor device according to claim 1 , wherein
when viewed in top-view, connection portions of the airbridge to the source electrodes protrude further in the third direction than a portion of the airbridge overlapping the gate electrode.
3. The semiconductor device according to claim 2 , further comprising:
an insulating film covering a surface of the substrate facing the space, surfaces of the pair of source electrodes facing the space, and a surface of the gate electrode facing the space.
4. The semiconductor device according to claim 1 , further comprising:
an insulating film covering a surface of the substrate facing the space, surfaces of the pair of source electrodes facing the space, and a surface of the gate electrode facing the space.
5. A semiconductor device, comprising:
a substrate;
a pair of source electrodes provided to be separated from each other on an upper surface of the substrate, a direction from one of the pair of source electrodes to another one of the pair of source electrodes being along a first direction;
source portions extending in a second direction crossing the first direction, at least one of the source portions being connected to the one of the pair of source electrodes, at least another one of the source portions being connected to the other one of the pair of source electrodes;
a gate electrode provided on the upper surface of the substrate between the pair of source electrodes, the gate electrode being separated from the pair of source electrodes, an upper surface of the gate electrode being lower than upper surfaces of the pair of source electrodes;
a drain electrode provided between the at least one of the source portions and the at least the other one of the source portions connected to the other one of the pair of source electrodes in the first direction;
an insulating film provided on inside side surfaces of the pair of source electrodes, and over a top surface of the gate electrode; and
an airbridge provided to be separated from the substrate and the gate electrode by a space, the airbridge being connected to the upper surfaces of the pair of source electrodes,
an upper surface of the airbridge including a pair of first regions facing the pair of source electrodes, and
a second region positioned between the pair of first regions,
the second region being located at a position at or lower than the pair of first regions;
a lower surface of the airbridge including:
a pair of third regions and a fourth region between the pair of third regions, the pair of third regions being below the pair of first regions of the upper surface of the airbridge, and the fourth region being below the second region of the upper surface of the airbridge, and
the lower surface of the fourth region being below the lower surface of the pair of third regions;
when viewed in top-view, connection portions of the airbridge to the source electrodes protrude further in a direction crossing a direction in which the pair of source electrodes is arranged than a portion of the airbridge overlapping the gate electrode,
wherein the inside side surfaces of the pair of source electrodes are covered by the insulating film,
an upper edge of the insulating film is covered by the airbridge, and
the drain electrode is not provided between the substrate and the airbridge in a third direction crossing a plane including the first direction and the second direction.
6. The semiconductor device according to claim 5 , further comprising:
an insulating film covering a surface of the substrate facing the space, surfaces of the pair of source electrodes facing the space, and a surface of the gate electrode facing the space.
7. A method for manufacturing a semiconductor device, comprising:
providing, on an upper surface of a substrate a pair of source electrodes that is separated from each other, and a gate electrode that is located between the pair of source electrodes, a direction from one of the pair of source electrodes to another one of the pair of source electrodes being along a first direction;
the gate electrode being separated from the pair of source electrodes, an upper surface of the gate electrode being lower than upper surfaces of the pair of source electrodes;
providing source portions extending in a second direction crossing the first direction, at least one of the source portions being connected to the one of the pair of source electrodes, at least another one of the source portions being connected to the other one of the pair of source electrodes;
providing a drain electrode between the at least one of the source portions and the at least the other one of the source portions connected to the other one of the pair of source electrodes in the first direction;
providing an insulating film on inside side surfaces of the pair of source electrodes, and over a top surface of the gate electrode;
providing an airbridge foundation resist covering the gate electrode between the pair of source electrodes, an upper surface of the airbridge foundation resist being positioned at a position at or lower than the upper surfaces of the pair of source electrodes;
providing an airbridge on the upper surfaces of the pair of source electrodes and the upper surface of the airbridge foundation resist; and
removing the airbridge foundation resist,
a second region of an upper surface of the airbridge being formed, in the providing of the airbridge, at a lower position than a pair of first regions of the upper surface of the airbridge,
the pair of first regions facing the pair of source electrodes,
the second region being positioned between the pair of first regions;
and further in the providing of the airbridge, a lower surface of the airbridge including:
a pair of third regions and a fourth region between the pair of third regions, the pair of third regions being below the pair of first regions of the upper surface of the airbridge, and the fourth region being below the second region of the upper surface of the airbridge, and
the lower surface of the fourth region being below the lower surface of the pair of third regions;
wherein in the providing the insulating film and the airbridge, the inside side surfaces of the pair of source electrodes are covered by the insulating film,
an upper edge of the insulating film is covered by the airbridge, and
the drain electrode is not provided between the substrate and the airbridge in a third direction crossing a plane including the first direction and the second direction.