Coated die for use in hot stamping
A coated die for use in hot stamping has a hard film having an alternating lamination section formed by alternating lamination of a1 layers consisting of nitride having 30% or more of chromium in atomic ratio in a metal part, and a2 layers consisting of nitride having 50% or more of vanadium in atomic ratio in a metal part. When t a1 and t a2 are defined as thicknesses of the a1 layer and the a2 layer respectively, a film thickness ratio Xb is defined as a film thickness ratio t a2 /t a1 of a1 layers and a2 layers adjacent to each other in a substrate-side region of the alternating lamination section and a film thickness ratio Xt is defined as a film thickness ratio t a2 /t a1 of a1 layers and a2 layers adjacent to each other in an outermost surface side region of the alternating lamination section, it holds that Xt>Xb.
1. A coated die for use in hot stamping, which has a hard film on a work surface, wherein
the hard film has an alternating lamination section formed by alternating lamination of a1 layers consisting of nitride in which a metal part including semimetals has 30% or more of chromium in atomic ratio, and a2 layers consisting of nitride in which a metal part including semimetals has 50% or more of vanadium in atomic ratio, and
when ta 1 and ta 2 are defined as thicknesses of the a1 layer and the a2 layer respectively,
a film thickness ratio Xb is defined as a film thickness ratio t a2 /t a1 of a1 layers and a2 layers adjacent to each other in a substrate-side region of the alternating lamination section and a film thickness ratio Xt is defined as a film thickness ratio t a2 /t a1 of a1 layers and a2 layers adjacent to each other in an outermost surface side region of the alternating lamination section,
it holds that Xt>Xb,
the Xt is 1.2 or more, and the Xb is 1.0 or less.
2. The coated die for use in hot stamping according to claim 1 , wherein a total film thickness of the alternating lamination section is 6 μm or more.