IP Library Granted Patent US 12,393,118
Granted Patent B2
US 12,393,118 · App. 17/333,622 · Granted Aug 19, 2025

Composition for photoresist underlayer

Inventors: Jung June Lee (Hwaseong-si, KR); Jae Hwan Sim (Hwaseong-si, KR); Suwoong Kim (Hwaseong-si, KR); Jin Hong Park (Hwaseong-si, KR); Bhooshan Popere (Sturbridge, MA)
Assignees: DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC; DUPONT SPECIALTY MATERIALS KOREA LTD
G03F7/11C08F220/24C08G18/8108C09D175/04
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Quick Facts
Patent No.
US 12,393,118
App. No.
17/333,622
Granted
Aug 19, 2025
Kind
B2
Abstract

A photoresist underlayer composition, comprising: a first polymer comprising a crosslinkable group; a second polymer comprising: a first repeating unit comprising a repeating unit comprising a photoacid generator, and a second repeating unit comprising a hydroxy-substituted C 1-30 alkyl group, a hydroxy-substituted C 3-30 cycloalkyl group, or a hydroxy-substituted C 6-30 aryl group; an acid catalyst; and a solvent.

Claims (83)

1. A coated substrate, comprising:

a cured layer of a photoresist underlayer composition disposed on a substrate; and

a photoresist layer disposed on the cured layer of the photoresist underlayer composition,

wherein the photoresist underlayer composition is different from the photoresist layer,

wherein the photoresist underlayer composition comprises:

a first polymer comprising an isocyanurate repeating unit and a crosslinkable group;

a second polymer comprising:

a first repeating unit comprising a repeating unit comprising a photoacid generator, and

a second repeating unit comprising a hydroxy-substituted C 1-30 alkyl group, a hydroxy-substituted C 3-30 cycloalkyl group, or a hydroxy-substituted C 6-30 aryl group;

an acid catalyst, wherein the acid catalyst is different from the photoacid generator of the second polymer; and

a solvent.

2. The coated substrate of claim 1 , wherein the isocyanurate repeating unit is derived from a monomer of formula (1):

wherein, in formula (1),

K, L, and M are each independently a linear or branched C 1-10 hydrocarbon group, a C 1-10 alkoxycarbonyl group, a C 1-10 alkanoyloxy group, each of which is optionally substituted with a carboxylic acid group, or a linear or branched C 1-10 hydroxyalkyl group optionally substituted with a C 1-5 alkoxycarbonyl group or a C 1-5 substituted alkoxy group, and

wherein at least one hydrogen atom of the first polymer is substituted with a functional group independently chosen from hydroxyl, carboxyl, thiol, amino, epoxy, alkoxy, amido, vinyl, and a combination thereof.

3. The coated substrate of claim 1 , wherein the first repeating unit of the second polymer comprises a repeating unit derived from a monomer of formula (2):

wherein, in formula (2),

R a is hydrogen, fluorine, cyano, a substituted or unsubstituted C 1-10 alkyl, or a substituted or unsubstituted C 1-10 fluoroalkyl,

L 1 is a single bond or a divalent linking group,

A is a divalent linking group;

Z − is an anionic moiety comprising sulfonate, an anion of a sulfonamide, an anion of a sulfonimide, or a methide anion; and

G + is an organic cation.

4. The coated substrate of claim 3 , wherein -L 1 -A-Z − is represented by one of formulae (3) to (5b):

wherein, in formulae (3) to (5b),

Q 1 and Q 2 are each independently a fluorine-substituted divalent linking group;

Q 3 is a divalent linking group;

Q 4 is a single bond or a divalent linking group; and

R f is a fluorine-substituted C 1-30 alkyl, a fluorine-substituted C 3-30 cycloalkyl, or a single bond forming a ring with Q 3 .

5. The coated substrate of claim 3 , wherein G + is a cation represented by one of formulae (6), (7), or (8):

wherein, in formulae (6), (7), and (8):

X is I or S;

R h , R i , R j , and R k are each independently hydroxy, nitrile, halogen, substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 1-30 fluoroalkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 1-30 fluorocycloalkyl, substituted or unsubstituted C 1-30 alkoxy, substituted or unsubstituted C 3-30 alkoxycarbonylalkyl, substituted or unsubstituted C 3-30 alkoxycarbonylalkoxy, substituted or unsubstituted C 3-30 cycloalkoxy, substituted or unsubstituted C 5-30 cycloalkoxycarbonylalkyl, substituted or unsubstituted C 5-30 cycloalkoxycarbonylalkoxy, substituted or unsubstituted C 1-30 fluoroalkoxy, substituted or unsubstituted C 3-30 fluoroalkoxycarbonylalkyl, substituted or unsubstituted C 3-30 fluoroalkoxycarbonylalkoxy, substituted or unsubstituted C 3-30 fluorocycloalkoxy, substituted or unsubstituted C 5-30 fluorocycloalkoxycarbonylalkyl, substituted or unsubstituted C 5-30 fluorocycloalkoxycarbonylalkoxy, substituted or unsubstituted C 6-30 aryl, C 6-30 fluoroaryl, substituted or unsubstituted C 6-30 aryloxy, or substituted or unsubstituted C 6-30 fluoroaryloxy;

each R aa is independently substituted or unsubstituted C 1-20 alkyl, substituted or unsubstituted C 1-20 fluoroalkyl, substituted or unsubstituted C 3-20 cycloalkyl, substituted or unsubstituted C 3-20 fluorocycloalkyl, substituted or unsubstituted C 2-20 alkenyl, substituted or unsubstituted C 2-20 fluoroalkenyl, substituted or unsubstituted C 6-30 aryl group, substituted or unsubstituted C 6-30 fluoroaryl, substituted or unsubstituted C 6-30 iodoaryl, substituted or unsubstituted C 4-30 heteroaryl, substituted or unsubstituted C 7-20 arylalkyl, substituted or unsubstituted C 7-20 fluoroarylalkyl, substituted or unsubstituted C 5-30 heteroarylalkyl, or substituted or unsubstituted C 5-30 fluoroheteroarylalkyl, wherein each R aa is either separate or connected to another group R aa via a single bond or a divalent linking group to form a ring;

when X is I, p is 2, and R 1 is a lone pair of electrons;

when X is S, p is 3, and R 1 is a substituted or unsubstituted C 6-20 aryl group;

q and r are each independently an integer from 0 to 5; and

s and t are each independently an integer from 0 to 4.

6. The coated substrate of claim 1 , wherein the second repeating unit of the second polymer is derived from a monomer of formula (9):

wherein, in formula (9),

R a is hydrogen, halogen, cyano, substituted or unsubstituted C 1-10 alkyl, or substituted or unsubstituted C 1-10 fluoroalkyl;

L 2 is a single bond or a divalent linking group;

Y comprises a hydroxy-substituted C 1-30 alkyl group, a hydroxy-substituted C 3-30 cycloalkyl group, a hydroxy-substituted C 6-30 aryl group, a hydroxy-substituted C 5-30 heteroaryl group, or a combination thereof, each of which is optionally further substituted.

7. The coated substrate of claim 1 ,

wherein the crosslinkable group of the first polymer comprises hydroxyl, carboxyl, thiol, amino, epoxy, alkoxy, amido, vinyl, or a combination thereof.

8. The coated substrate of claim 1 , wherein the second polymer further comprises a third repeating unit comprising an unsubstituted C 1-30 alkyl group, a fluorine-substituted C 1-30 alkyl group, a C 1-30 alkyl group substituted with a polymerizable group, a C 3-30 cycloalkyl group substituted with a polymerizable group, or a C 6-30 aryl group substituted with a polymerizable group, wherein the polymerizable group is reactive to self-crosslink the second polymer.

9. A method of forming a pattern, the method comprising:

applying a layer of the photoresist underlayer composition on the substrate;

curing the applied layer of the photoresist underlayer composition to form an underlayer film;

applying a layer of the photoresist composition on the underlayer film to form the photoresist layer and provide the coated substrate of claim 1 ;

pattern-wise exposing the applied photoresist layer to activating radiation; and

developing the exposed photoresist layer to provide a resist relief image.

10. The method of claim 9 , wherein the first polymer comprises an isocyanurate repeating unit derived from a monomer of formula (1):

wherein, in formula (1),

K, L, and M are each independently a linear or branched C 1-10 hydrocarbon group, a C 1-10 alkoxycarbonyl group, a C 1-10 alkanoyloxy group, each of which is optionally substituted with a carboxylic acid group, or a linear or branched C 1-10 hydroxyalkyl group optionally substituted with a C 1-5 alkoxycarbonyl group or a C 1-5 substituted alkoxy group, and

wherein at least one hydrogen atom of the first polymer is substituted with a functional group independently chosen from hydroxyl, carboxyl, thiol, amino, epoxy, alkoxy, amido, vinyl, and a combination thereof.

11. The method of claim 9 , wherein the second repeating unit of the second polymer is derived from a monomer of formula (9):

wherein, in formula (9),

R a is hydrogen, halogen, cyano, substituted or unsubstituted C 1-10 alkyl, or substituted or unsubstituted C 1-10 fluoroalkyl;

L 2 is a single bond or a divalent linking group;

Y comprises a hydroxy-substituted C 1-30 alkyl group, a hydroxy-substituted C 3-30 cycloalkyl group, a hydroxy-substituted C 6-30 aryl group, a hydroxy-substituted C 5-30 heteroaryl group, or a combination thereof, each of which is optionally further substituted.

12. The method of claim 9 , wherein the first repeating unit of the second polymer comprises a repeating unit derived from a monomer of formula (2):

wherein, in formula (2),

R a is hydrogen, fluorine, cyano, a substituted or unsubstituted C 1-10 alkyl, or a substituted or unsubstituted C 1-10 fluoroalkyl,

L 1 is a single bond or a divalent linking group,

A is a divalent linking group;

Z − is an anionic moiety comprising sulfonate, an anion of a sulfonamide, an anion of a sulfonimide, or a methide anion; and

G + is an organic cation.

13. The method of claim 12 , wherein -L 1 -A-Z − is represented by one of formulae (3) to (5b):

wherein, in formulae (3) to (5b),

Q 1 and Q 2 are each independently a fluorine-substituted divalent linking group;

Q 3 is a divalent linking group;

Q 4 is a single bond or a divalent linking group; and

R f is a fluorine-substituted C 1-30 alkyl, a fluorine-substituted C 3-30 cycloalkyl, or a single bond forming a ring with Q 3 .

14. The method of claim 12 , wherein G + is a cation represented by one of formulae (6), (7), or (8):

wherein, in formulae (6), (7), and (8):

X is I or S;

R h , R i , R j , and R k are each independently hydroxy, nitrile, halogen, substituted or unsubstituted C 1-30 alkyl, substituted or unsubstituted C 1-30 fluoroalkyl, substituted or unsubstituted C 3-30 cycloalkyl, substituted or unsubstituted C 1-30 fluorocycloalkyl, substituted or unsubstituted C 1-30 alkoxy, substituted or unsubstituted C 3-30 alkoxycarbonylalkyl, substituted or unsubstituted C 3-30 alkoxycarbonylalkoxy, substituted or unsubstituted C 3-30 cycloalkoxy, substituted or unsubstituted C 5-30 cycloalkoxycarbonylalkyl, substituted or unsubstituted C 5-30 cycloalkoxycarbonylalkoxy, substituted or unsubstituted C 1-30 fluoroalkoxy, substituted or unsubstituted C 3-30 fluoroalkoxycarbonylalkyl, substituted or unsubstituted C 3-30 fluoroalkoxycarbonylalkoxy, substituted or unsubstituted C 3-30 fluorocycloalkoxy, substituted or unsubstituted C 5-30 fluorocycloalkoxycarbonylalkyl, substituted or unsubstituted C 5-30 fluorocycloalkoxycarbonylalkoxy, substituted or unsubstituted C 6-30 aryl, C 6-30 fluoroaryl, substituted or unsubstituted C 6-30 aryloxy, or substituted or unsubstituted C 6-30 fluoroaryloxy;

each R aa is independently substituted or unsubstituted C 1-20 alkyl, substituted or unsubstituted C 1-20 fluoroalkyl, substituted or unsubstituted C 3-20 cycloalkyl, substituted or unsubstituted C 3-20 fluorocycloalkyl, substituted or unsubstituted C 2-20 alkenyl, substituted or unsubstituted C 2-20 fluoroalkenyl, substituted or unsubstituted C 6-30 aryl group, substituted or unsubstituted C 6-30 fluoroaryl, substituted or unsubstituted C 6-30 iodoaryl, substituted or unsubstituted C 4-30 heteroaryl, substituted or unsubstituted C 7-20 arylalkyl, substituted or unsubstituted C 7-20 fluoroarylalkyl, substituted or unsubstituted C 5-30 heteroarylalkyl, or substituted or unsubstituted C 5-30 fluoroheteroarylalkyl, wherein each R aa is either separate or connected to another group R aa via a single bond or a divalent linking group to form a ring;

when X is I, p is 2, and R 1 is a lone pair of electrons;

when X is S, p is 3, and R 1 is a substituted or unsubstituted C 6-20 aryl group;

q and r are each independently an integer from 0 to 5; and

s and t are each independently an integer from 0 to 4.

15. The coated substrate of claim 1 , wherein the second repeating unit comprises a hydroxy-substituted C 1-30 alkyl group, or a hydroxy-substituted C 6-30 aryl group.

Assignments (6)
SECURITY INTEREST Recorded Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 073515/0243 →
SECURITY INTEREST Recorded Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 073517/0298 →
CHANGE OF NAME Recorded Oct 29, 2024
From: ROHM & HAAS ELECTRONIC MATERIALS LLC
To: DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC
Reel/Frame 069272/0383 →
CHANGE OF NAME Recorded Oct 17, 2024
From: ROHM & HAAS ELECTRONIC MATERIALS KOREA LTD
To: DUPONT SPECIALTY MATERIALS KOREA LTD
Reel/Frame 069185/0438 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 28, 2021
From: LEE, JUNG JUNE; SIM, JAE HWAN; KIM, SUWOONG; PARK, JIN HONG
To: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
Reel/Frame 056384/0638 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 28, 2021
From: POPERE, BHOOSHAN
To: ROHM AND HAAS ELECTRONIC MATERIALS LLC
Reel/Frame 056384/0793 →
Continuity (1)
Related Publication 20220397827A1 · Dec 15, 2022
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