Semiconductor package structure and method for forming the same
A semiconductor package structure and method of manufacturing a semiconductor package structure are provided. The semiconductor package structure includes a connection layer formed on a metal base layer, at least one die unit formed on the connection layer, a metal pillar connecting the metal base layer and surrounding the die unit, and an interconnect structure overlaid onto the die unit and the metal pillar. Each die unit comprises at least one die attached onto the connection layer and surrounded by a molding structure. The interconnect structure includes a first interconnect layer overlaid onto the die unit and the metal pillar and a second interconnect layer formed on the first interconnect layer. The first and second interconnect layers comprise first and second metal layers being parallel with the top surface of the die unit. A projection of the metal layers overlaps an upper surface of the die.
1. A semiconductor package structure, comprising:
a metal base layer;
a connection layer formed on the metal base layer and comprising a plurality of dielectric layers arranged at a same level and a connecting via;
a die array disposed on one of the plurality of dielectric layers of the connection layer and comprising:
a plurality of dies;
a plurality of compartments separated by an insulating structure and each compartment accommodating one die of the plurality of dies; and
an inner molding structure surrounding the compartments and serving as a sidewall of the die array;
a metal pillar connecting the metal base layer through the connecting via and surrounding the inner molding structure;
an outer molding structure formed on one of the plurality of dielectric layers of the connection layer and surrounding the metal pillar; and
an interconnect structure formed on the die array, the metal pillar and the outer molding structure and connecting to the plurality of dies and the metal pillar.
2. The semiconductor package structure of claim 1 , wherein the
interconnect structure comprises a first interconnect layer and a second interconnect layer,
wherein the first interconnect layer is disposed on the die array, the metal pillar and the outer molding structure and comprises:
a first dielectric layer overlaid onto the die array, the metal pillar and the outer molding structure,
at least one first metal layer formed in the first dielectric layer and being parallel with an upper surface of the die; and
at least one first metal connection connecting the at least one first metal layer with the metal pillar;
wherein the second interconnect layer stacks on the first interconnect layer and comprises:
a second dielectric layer overlaid onto the at least one first metal layer,
at least one second metal layer formed in the second dielectric layer and being parallel with the upper surface of the die; and
at least one second metal connection connecting the at least one second metal layer with a die of the die array; and
wherein a projection of the at least one first metal layer and a projection of the at least one second metal layer overlap the upper surface of the die.
3. The semiconductor package structure of claim 2 , wherein the projection of the at least one first metal layer overlaps the upper surface of the die by about 50% or more.
4. The semiconductor package structure of claim 2 , wherein the projection of the at least one second metal layer overlaps the upper surface of the die by about 50% or more.
5. The semiconductor package structure of claim 2 , wherein the
interconnect structure further comprises at least one overlying interconnect layer stacking
on the second interconnect layer and comprising:
an overlying dielectric layer overlaid onto the second interconnect layer;
at least one overlying metal layer formed in the overlying dielectric layer and being parallel with the upper surface of the die; and
at least one overlying metal connection connecting the overlying metal layer with the at least one first metal layer, the second at least one metal layer or a combination thereof.
6. The semiconductor package structure of claim 1 , further comprising a plurality of external connectors connecting the interconnect structure.
7. The semiconductor package structure of claim 2 , wherein the at least one second metal layer further connects to the metal pillar through the second metal connection.
8. The semiconductor package structure of claim 1 , wherein
the metal base layer comprises a first conductive material;
the connecting vias comprises a second conductive material;
the metal pillar comprises a third conductive material;
wherein the first conductive material, the second conductive material and the third conductive material are identical.
9. A semiconductor package structure, comprising:
a metal base layer;
a connection layer formed on the metal base layer and comprising a plurality of dielectric layers arranged at a same level and a connecting via;
a die array disposed on one of the plurality of dielectric layers of the connection layer and comprising:
a plurality of dies, each of the plurality of dies having a first die surface abutting the connection layer and a second die surface opposite to the first die surface;
a plurality of compartments separated by an insulating structure and each compartment accommodating one die of the plurality of compartments; and
an inner molding structure surrounding the compartments and serving as a sidewall of the die array, wherein the inner molding structure has a first molding surface abutting the connection layer and aligned with the first die surface, and a second molding surface opposite to the first molding surface;
a metal pillar connecting the metal base layer through the connecting via and surrounding the inner molding structure, wherein the metal pillar comprises a first pillar surface aligned with the first die surface and the first molding surface and a second pillar surface opposite to the first pillar surface;
an outer molding structure formed on one of the plurality of dielectric layers of the connection layer and surrounding the metal pillar; and
an interconnect structure formed on the die array, the metal pillar and the outer molding structure and connecting to the plurality of dies and the metal pillar.
10. The semiconductor package structure of claim 9 , wherein the interconnect structure comprises a first interconnect layer and a second interconnect layer,
wherein the first interconnect layer is disposed on the die array, the metal pillar and the outer molding structure, and comprises:
a first dielectric layer overlaid onto the die array, the metal pillar and the outer molding structure;
at least one first metal layer formed in the first dielectric layer and being parallel with an upper surface of the die; and
at least one first metal connection connecting the at least one first metal layer with the metal pillar;
wherein the second interconnect layer stacks on the first interconnect layer and comprises:
a second dielectric layer overlaid onto the at least one first metal layer;
at least one second metal layer formed in the second dielectric layer and being parallel with the upper surface of the die; and
at least one second metal connection connecting the at least one second metal layer with a die of the die array,
wherein a projection of the at least one first metal layer and a projection of the at least one second metal layer overlap an upper surface of the die.
11. The semiconductor package structure of claim 10 , wherein the interconnect structure further comprises at least one overlying interconnect layer stacking on the second interconnect layer and comprising:
an overlying dielectric layer overlaid onto the second interconnect layer;
at least one overlying metal layer formed in the overlying dielectric layer and being parallel with the upper surface of the die; and
at least one overlying metal connection connecting the overlying metal layer with the at least one first metal layer, the at least one second metal layer or a combination thereof.
12. The semiconductor package structure of claim 9 , further comprising a plurality of external connectors connecting the interconnect structure.
13. The semiconductor package structure of claim 10 , wherein the at least one second metal layer further connects to the metal pillar through the second metal connection.
14. The semiconductor package structure of claim 9 , wherein
the metal base layer comprises a first conductive material;
the connecting vias comprises a second conductive material;
the metal pillar comprises a third conductive material;
wherein the first conductive material, the second conductive material and the third conductive material are identical.
15. A semiconductor package structure, comprising:
a metal base layer;
a connection layer formed on the metal base layer and comprising a plurality of dielectric layers arranged at a same level and a connecting via;
a die array disposed on one of the plurality of dielectric layers of the connection layer and comprising:
a plurality of dies;
four compartments arranged in an array with two rows and each row including two columns and the compartments separated by an insulating structure and each compartment accommodating one die of the plurality of dies; and
an inner molding structure surrounding the compartments and serving as a sidewall of the die array;
a metal pillar connecting the metal base layer through the connecting via and surrounding the inner molding structure;
an outer molding structure formed on one of the plurality of dielectric layers of the connection layer and surrounding the metal pillar; and
an interconnect structure formed on the die array, the metal pillar and the outer molding structure, and connecting to the plurality of die and the metal pillar;
wherein a thickness of the outer molding structure is the same as a thickness of the inner molding structure, is the same as a thickness of the metal pillar and is also the same as a thickness of the die.
16. The semiconductor package structure of claim 15 , wherein the interconnect structure comprises a first interconnect layer and a second interconnect layer,
wherein the first interconnect layer is disposed on the die array, the metal pillar and the outer molding structure and comprises:
a first dielectric layer overlaid onto the die array, the metal pillar and the outer molding structure;
at least one first metal layer formed in the first dielectric layer and being parallel with an upper surface of the die; and
at least one first metal connection connecting the at least one first metal layer with the metal pillar;
wherein the second interconnect layer stacks on the first interconnect layer and comprises:
a second dielectric layer overlaid onto the at least one first metal layer;
at least one second metal layer formed in the second dielectric layer and being parallel with the upper surface of the die; and
at least one second metal connection connecting the at least one second metal layer with the plurality of dies of the die array; and
wherein a projection of the at least one first metal layer and a projection of the at least one second metal layer overlap the upper surface of the die.
17. The semiconductor package structure of claim 16 , wherein the projection of the at least one first metal layer overlaps the upper surface of the die by about 50% or more; and the projection of the at least one second metal layer overlaps the upper surface of the die by about 50% or more.
18. The semiconductor package structure of claim 16 , wherein the interconnect structure further comprises at least one overlying interconnect layer stacking on the second interconnect layer and comprising:
an overlying dielectric layer overlaid onto the second interconnect layer;
at least one overlying metal layer formed in the overlying dielectric layer and being parallel with the upper surface of the die; and
at least one overlying metal connection connecting the overlying metal layer with the at least one first metal layer, the at least one second metal layer or a combination thereof.
19. The semiconductor package structure of claim 16 , wherein the at least one second metal layer further connects to the metal pillar through the second metal connection.
20. The semiconductor package structure of claim 15 , wherein
metal base layer comprises a first conductive material;
the connecting vias comprises a second conductive material;
the metal pillar comprises a third conductive material;
wherein the first conductive material, the second conductive material and the third conductive material are identical.