Apparatus for processing a wafer, and method of controlling such an apparatus
An apparatus for processing a wafer comprises: a rotatable chuck adapted to receive a wafer; a heating assembly comprising an array of heating elements arranged to heat a wafer received by the rotatable chuck; an image sensor arranged to detect electromagnetic radiation from a surface of the wafer; and a controller configured to control supply of power to the array of heating elements based on a measurement output of the image sensor.
1 . An apparatus for processing a wafer, the apparatus comprising:
a rotatable chuck adapted to receive the wafer;
a heating assembly comprising an array of heating elements arranged to heat the wafer received by the rotatable chuck;
an image sensor arranged to detect electromagnetic radiation from a liquid on a surface of the wafer; and
a controller configured to
based on an output of the image sensor, determine a position of a drying line on the surface of the wafer, wherein the output is indicative of the detected electromagnetic radiation from the liquid, wherein the drying line corresponds to a transition between a dry area and a wet area on the surface of the wafer, and wherein determining the position comprises
analyzing the output of the image sensor and generating a temperature distribution including temperatures relative to radial locations on the wafer,
determining a plurality of differential values, each of which is indicative of a respective difference between two of the temperatures at adjacent ones of the radial locations, and
determining at which one of the radial locations there is a maximum differential in temperature and determining the position of the drying line as the radial location with the maximum differential, the maximum differential being a maximum one of the plurality of differential values, and
adjust supply of power to the array of heating elements based on the position of the drying line to heat the wafer to generate a front of localized temperature on the surface of the wafer.
2 . The apparatus according to claim 1 , wherein the image sensor is a camera.
3 . The apparatus according to claim 2 , wherein the camera is a thermal imaging camera.
4 . The apparatus according to claim 1 , wherein the image sensor is adapted to detect electromagnetic radiation having a wavelength in a range of 3 to 14 μm.
5 . The apparatus according to claim 1 , wherein the apparatus comprises a liquid dispenser for dispensing the liquid on to the surface of the wafer.
6 . The apparatus according to claim 1 , wherein the apparatus is a spin-clean apparatus.
7 . The apparatus according to claim 1 , wherein the controller is configured to:
determine a temperature, or information relating to the temperature, at one or more locations on the surface of the wafer based on the output of the image sensor; and
adjust the supply of power to the array of heating elements based on the temperature or information relating to the temperature.
8 . The apparatus according to claim 1 , wherein the controller is configured to:
determine the temperature distribution across some of all of the surface of the wafer, or information relating to the temperature distribution, based on the output of the image sensor; and
adjust the supply of power to the array of heating elements based on the determined temperature distribution or information relating to the temperature distribution.
9 . The apparatus according to claim 1 , wherein:
each of the heating elements of the array of heating elements is individually controllable; and
the controller is configured to individually control power supplied to each of the heating elements.
10 . The apparatus according to claim 1 , wherein:
the array of heating elements comprises a plurality of individually controllable groups of heating elements; and
the controller is configured to individually control power supplied to each of the plurality of individually controllable groups of heating elements.
11 . The apparatus according to claim 1 , wherein the apparatus comprises a filter adapted to selectively transmit electromagnetic radiation having a predetermined wavelength or range of wavelengths.
12 . The apparatus according to claim 11 , wherein the filter is a band-pass filter.
13 . The apparatus according to claim 11 , wherein the filter is adapted to selectively transmit thermal radiation emitted by isopropyl alcohol.
14 . The apparatus according to claim 11 , wherein the filter is adapted to selectively transmit electromagnetic radiation that has a wavelength in a range of 3.3 to 3.5 μm or in a range of 8.6 to 9.1 μm.
15 . The apparatus according to claim 1 , wherein the controller is configured to determine the position of the drying line using an edge detection algorithm.
16 . The apparatus according to claim 1 , wherein the controller is configured to adjust the supply of power to the array of heating elements so that the wafer is heated to a higher temperature adjacent to the drying line than elsewhere on the wafer.
17 . The apparatus according to claim 1 , wherein the controller is configured to control the heating elements to cause heating of the surface of the wafer along a radially moving circumferential front.
18 . The apparatus according to claim 1 , wherein the array of heating elements is arranged to heat a surface of the wafer that is on an opposite side of the wafer compared to the surface of the wafer that is imaged by the image sensor.
19 . The apparatus according to claim 1 , wherein the heating elements are light-emitting heating elements arranged to illuminate the wafer to heat the wafer.
20 . The apparatus according to claim 19 , wherein the light-emitting heating elements are LEDs.
21 . A method for processing a wafer, the method comprising:
dispensing liquid onto a surface of the wafer received by a rotatable chuck;
rotating the rotatable chuck to remove the liquid from the surface of the wafer;
during the rotating, supplying power to an array of heating elements to heat the surface of the wafer;
detecting, with an image sensor, electromagnetic radiation from the liquid on the surface of the wafer;
based on an output of the image sensor, determining via a controller a position of a drying line on the surface of the wafer, wherein the output is indicative of the detected electromagnetic radiation from the liquid, and wherein the drying line corresponds to a transition between a dry area and a wet area on the surface of the wafer, and
wherein determining the position comprises
analyzing the output of the image sensor and generating a temperature distribution including temperatures relative to radial locations on the wafer,
determining a plurality of differential values, each of which is indicative of a respective difference between two of the temperatures at adjacent ones of the radial locations, and
determining at which one of the radial locations there is a maximum differential in temperature and determining the position of the drying line as the radial location with the maximum differential, the maximum differential being a maximum one of the plurality of differential values; and
adjusting the power supplied to the array of heating elements based on the position of the drying line to heat the wafer to generate a front of localized temperature on the surface of the wafer.