Method and apparatus for diffraction pattern guided source mask optimization
A diffraction pattern guided source mask optimization (SMO) method that includes determining a source variable region from a diffraction pattern. The source variable region corresponds to one or more areas of a diffraction pattern in a pupil for which one or more pupil variables are to be adjusted. The source variable region in the diffraction pattern includes a plurality of pixels in an image of a selected region of interest in the diffraction pattern. Determining the source variable region can include binarization of the plurality of pixels in the image such that individual pixels are either included in the source variable region or excluded from the source variable region. The method can include adjusting the one or more pupil variables for the one or more areas of the pupil that correspond to the source variable region; and rendering a final pupil based on the adjusted one or more pupil variables.
1. A method for configuring a lithographic apparatus or process, the method comprising:
determining a source variable region from a diffraction pattern, the source variable region corresponding to one or more areas of a diffraction pattern of a pupil for which one or more pupil variables are to be adjusted;
adjusting the one or more pupil variables for the one or more areas of the pupil that correspond to the source variable region; and
rendering, by a hardware computer system, a final pupil based on the adjusted one or more pupil variables.
2. The method of claim 1 , further comprising determining the diffraction pattern and the pupil based on a pattern of a source mask design and an initial pupil.
3. The method of claim 1 , wherein determining the source variable region comprises selecting a region of interest in the diffraction pattern with different but overlapping diffraction orders, and/or
wherein the source variable region comprises a plurality of pixels in an image of a region of interest in the diffraction pattern, and determining the source variable region further comprises binarization of the plurality of pixels in the image such that individual pixels are either included in the source variable region or excluded from the source variable region.
4. The method of claim 1 , wherein the source variable region comprises a plurality of pixels in an image of a region of interest in the diffraction pattern,
wherein determining the source variable region further comprises binarization of the plurality of pixels in the image such that individual pixels are either included in the source variable region or excluded from the source variable region, and
wherein the binarization is:
performed using a step function, a sigmoid or a hyperbolic binarization function,
performed by applying sigmoid and hyperbolic binarization functions sequentially, or
performed by applying a clustering based image thresholding method.
5. The method of claim 1 , wherein the source variable region comprises a plurality of pixels in an image of a region of interest in the diffraction pattern,
wherein determining the source variable region further comprises binarization of the plurality of pixels in the image such that individual pixels are either included in the source variable region or excluded from the source variable region, and
wherein non-zero intensity pixels are included in the source variable region and zero intensity pixels are excluded from the source variable region.
6. The method of claim 5 , wherein determining the source variable region further comprises dilation of a shape formed by individual pixels included in the source variable region.
7. The method of claim 1 , wherein the diffraction pattern is determined using a full rigorous or compact mask three dimensional (M3D) effect or a thin mask model.
8. The method of claim 1 , further comprising determining one or more additional diffraction patterns based on additional patterns of illumination and design target, and a corresponding optimized mask, and wherein one or more source variable regions are further determined for the diffraction pattern and the one or more additional diffraction patterns.
9. The method of claim 1 , wherein the source variable region comprises a plurality of pixels in an image of a region of interest in the diffraction pattern, individual pixels of the plurality of pixels having a given intensity, and the method further comprises adjusting diffraction pattern amplitude constrained variables to optimize diffraction pattern amplitude level variables, the adjusting of the diffraction pattern amplitude constrained variables causing changes to pixels having a given intensity between a lower amplitude threshold and an upper amplitude threshold.
10. The method of claim 1 , wherein adjusting the one or more pupil variables comprises a pixel base freeform, parametric base source optimization.
11. The method of claim 1 , further comprising determining a diffraction pattern constrained source variable region, adjusting one or more pupil variables in the diffraction pattern constrained source variable region, and rendering the final pupil based on the adjusted one or more pupil variables in the diffraction pattern constrained source variable region, to enhance illumination efficiency and increase throughput in a source mask optimization (SMO) process.
12. The method of claim 1 , further comprising determining a diffraction pattern constrained source variable region, adjusting one or more pupil variables in the diffraction pattern constrained source variable region, and rendering the final pupil based on the adjusted one or more pupil variables in the diffraction pattern constrained source variable region, to optimize the pupil for generating an aerial image.
13. The method of claim 1 , further comprising determining a diffraction pattern constrained source variable region, adjusting one or more pupil variables in the diffraction pattern constrained source variable region, and rendering the final pupil based on the adjusted one or more pupil variables in the diffraction pattern constrained source variable region, to optimize the pupil for generating a resist image.
14. The method of claim 1 , further comprising determining a diffraction pattern constrained source variable region, adjusting pupil variables in the diffraction pattern constrained source variable region, and rendering the final pupil based on the adjusted pupil variables in the diffraction pattern constrained source variable region, at any numerical aperture and/or wavelength.
15. A computer program product comprising a non-transitory computer readable medium having instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:
determine a source variable region from a diffraction pattern, the source variable region corresponding to one or more areas of a diffraction pattern of a pupil for which one or more pupil variables are to be adjusted;
adjust the one or more pupil variables for the one or more areas of the pupil that correspond to the source variable region; and
render a final pupil based on the adjusted one or more pupil variables.
16. The computer program product of claim 15 , wherein the instructions are further configured to cause the computer system to determine the diffraction pattern and the pupil based on a pattern of a source mask design and an initial pupil.
17. The computer program product of claim 15 , wherein the instructions configured to cause the computer system to determine the source variable region are further configured to cause the computer system to:
select a region of interest in the diffraction pattern with different but overlapping diffraction orders, and/or
perform binarization of a plurality of pixels in an image of a region of interest in the diffraction pattern such that individual pixels are either included in the source variable region or excluded from the source variable region.
18. The computer program product of claim 15 , wherein the diffraction pattern is determined using a full rigorous or compact mask three dimensional (M3D) effect or a thin mask model.
19. The computer program product of claim 15 , wherein the instructions are further configured to cause the computer system to determine one or more additional diffraction patterns based on additional patterns of illumination and design target, and a corresponding optimized mask, and wherein one or more source variable regions are further determined for the diffraction pattern and the one or more additional diffraction patterns.
20. The computer program product of claim 15 , wherein the source variable region comprises a plurality of pixels in an image of a region of interest in the diffraction pattern, individual pixels of the plurality of pixels having a given intensity, and the instructions are further configured to cause the computer system to adjust diffraction pattern amplitude constrained variables to optimize diffraction pattern amplitude level variables, the adjustment of the diffraction pattern amplitude constrained variables causing changes to pixels having a given intensity between a lower amplitude threshold and an upper amplitude threshold.