Optical transmission element, having a super-hydrophobic nanostructured surface having an anti-reflective property and covered with a compliant high-density thin film deposit
An optical element is provided, which is transparent at a wavelength of use λ, and which has a super-hydrophobic nanostructured surface that has an anti-reflection property, the surface having an array of pads. —The pads have a nanoscale width, a height h, an aspect ratio of less than 1/2, and the pitch p of the array is such that p<h and the element comprises a top layer of thickness less than h/5 which covers without discontinuity and conformally the nanostructured surface, the top layer being obtained via a step of annealing at a temperature comprised between 500° C. and 1200° C. and being in a material of a hardness greater than the hardness of the material of said nanostructured surface.
1. An optical element, which is transparent at a wavelength of use λ, comprising a super-hydrophobic nanostructured surface that has an anti-reflection property, said surface comprising an array of pads, wherein the pads have a nanoscale width, a height h, an aspect ratio of less than 1/2, the pitch p of the array is such that p<h and the element comprises a top layer of thickness less than h/5 which covers without discontinuity and conformally said nanostructured surface, said top layer being obtained via a step of annealing at a temperature comprised between 500° C. and 1200° C. and being in a material of a hardness greater than the hardness of the material of said nanostructured surface.
2. The optical element as claimed in claim 1 , wherein the pads are cylinders, cones, or truncated cones.
3. The optical element as claimed in claim 1 , wherein the array of pads is periodic.
4. The optical element as claimed in claim 1 , wherein the top layer is made of alumina, preferably in sapphire phase, of DLC or of ZrO 2 .
5. The optical element as claimed in claim 1 , wherein the nanostructured surface is made of germanium and the wavelength of use is comprised between 8 and 12 μm.
6. The optical element as claimed in claim 1 , wherein the pads have an aspect ratio of less than 1/10.
7. The optical element as claimed in claim 1 , wherein the thickness of the top layer is less than h/10.
8. The optical element as claimed in claim 1 , wherein the material of the top layer has a hardness greater by at least 1.3 units on the Mohs scale than the hardness of the material of the nanostructured surface.
9. A process for manufacturing an optical element as claimed in claim 1 , comprising the following steps:
a. nanostructuring the array of pads on the surface of the optical element;
b. depositing the top layer by atomic layer deposition, so as to cover the nanostructured surface conformally and without discontinuity.
10. The process for manufacturing an optical element as claimed in claim 9 , comprising, after step b), a step c) of annealing the top layer at a temperature between 500° C. and 1200° C.
11. The process for manufacturing an optical element as claimed in claim 9 , wherein the nanostructuring step, step a), comprises 3 sub-steps:
i. placing a lithographed hard mask on the surface to be nanostructured;
ii. etching via plasma, ionic or chemical etches or combinations of these techniques the array of pads on said surface to be nanostructured; and
iii. removing the hard mask.