Optical element with an anti-fog layer and method for its production

1. An optical component comprising:

an optical element;

a fog reducing polymer layer; and

a reflection reducing nanostructure formed at a surface of the fog reducing polymer layer, wherein the nanostructure extends from the surface of the fog reducing polymer layer to a depth of 50 nm or more into the fog reducing polymer layer.

2. The optical component according to claim 1 , wherein the nanostructure is created by means of a plasma etching method.

3. The optical component according to claim 1 , wherein the nanostructure extends from the surface of the fog reducing polymer layer to a depth of between 80 nm and 600 nm into the fog reducing polymer layer.

4. The optical component according to claim 1 , wherein the fog reducing polymer layer comprises a coat of lacquer.

5. The optical component according to claim 1 , wherein the fog reducing polymer layer comprises a polyurethane, a polyol, a poly(ethylene-alt-maleic acid), a siloxane, or an acrylate.

6. The optical component according to claim 1 , wherein the fog reducing polymer layer has a thickness of 1 μm up to 20 μm.

7. The optical component according to claim 1 , wherein the optical element comprises a plastic, wherein the plastic comprises a polymer selected from the group consisting of polymethylmethacrylate, polycarbonate, polyethersulfone, polycycloolefin, CR39, polyiourethane, polyethylene terephthalate, and triacetylacetate.

8. An optical component comprising:

an optical element;

a fog reducing polymer layer;

a reflection reducing nanostructure formed at a surface of the fog reducing polymer layer; and

a transparent protective layer over the nanostructure.

9. The optical component according to claim 8 , wherein the transparent protective layer has a thickness between 10 nm and 50 nm.

10. The optical component according to claim 1 , further comprising a hydrophobic layer over the nanostructure.

11. The optical component according to claim 10 , wherein the hydrophobic layer comprises silicon or a fluorine-containing organic material.

12. The optical component according to claim 10 , wherein the hydrophobic layer has a thickness between 1 nm and 10 nm.

13. A method for producing a reflection and fog reducing polymer layer on a surface of an optical element, the method comprising:

forming a fog reducing polymer layer over the surface of the optical element;

forming a thin layer over the fog reducing polymer layer; and

subsequently forming a nanostructure by means of a plasma etching method on a surface of the fog reducing polymer layer.

14. The method according to claim 13 , wherein the thin layer comprises an oxide layer, a nitride layer or a fluoride layer.

15. The method according to claim 14 , wherein the thin layer comprises silicon oxide, silicon nitride, titanium oxide, or magnesium fluoride.

16. The method according to claim 13 , wherein the thin layer has an average thickness of 2 nm or less.

17. The method according to claim 13 , wherein the thin layer comprises an island shaped layer.

18. The method according to claim 13 , wherein the nanostructure extends from the surface of the fog reducing polymer layer to a depth of 50 nm or more into the fog reducing polymer layer.

19. The method according to claim 18 , wherein the nanostructure extends from the surface of the fog reducing polymer layer to a depth of between 80 nm and 600 nm into the fog reducing polymer layer.

20. The method according to claim 13 , further comprising forming a transparent protective layer over the nanostructure.

21. The method according to claim 20 , wherein the transparent protective layer has a thickness between about 10 nm and 50 nm.

22. The method according to claim 13 , further comprising forming a hydrophobic layer over the nanostructure.

23. The method according to claim 22 , wherein the hydrophobic layer comprises silicon or a fluorine-containing organic material.

24. The method according to claim 22 , wherein the hydrophobic layer has a thickness between 1 nm and 10 nm.