Semiconductor test apparatus and semiconductor test method
A semiconductor test apparatus includes a chuck top on which a semiconductor wafer is mounted, and contact probes that contact measurement points of semiconductor chips formed on the semiconductor wafer, the chuck top includes a conductor that contacts a lower surface of the semiconductor wafer, a mounting table arranged below the conductor, and a first vacuum tube and a second vacuum tube connected to the mounting table, the conductor has a plurality of suction holes that are arranged in a spiral form in top view, in the mounting table, a flow pass communicating with the plurality of suction holes and having a spiral form in top view, the first vacuum tube is connected to an inner circumference portion of the flow pass, and the second vacuum tube is connected to an outer circumference portion of the flow pass.
1. A semiconductor test apparatus comprising:
a chuck top on which a semiconductor wafer is mounted; and
contact probes that contact measurement points of semiconductor chips formed on the semiconductor wafer, wherein
the chuck top includes a conductor that contacts a lower surface of the semiconductor wafer, a mounting table arranged below the conductor, and a first vacuum tube and a second vacuum tube connected to the mounting table,
the conductor has a plurality of suction holes arranged in a spiral form in top view,
in the mounting table, a flow pass communicating with the plurality of suction holes and having a spiral form in top view is formed,
the first vacuum tube is connected to an inner circumference portion of the flow pass, and
the second vacuum tube is connected to an outer circumference portion of the flow pass.
2. The semiconductor test apparatus according to claim 1 , wherein
cross-sectional areas of the flow pass are larger on an outer circumferential side than on an inner circumferential side.
3. The semiconductor test apparatus according to claim 1 , wherein
sizes of the plurality of suction holes are larger on an outer circumferential side than on an inner circumferential side.
4. A semiconductor test method using the semiconductor test apparatus according to claim 1 , comprising the steps of:
(a) mounting the semiconductor wafer on the chuck top;
(b) sucking the semiconductor wafer by the first vacuum tube, and sucking the semiconductor wafer by the second vacuum tube, and
(c) bringing the contact probes into contact with the measurement points of the semiconductor chips to measure electrical characteristics of the semiconductor chips.
5. The semiconductor test method according to claim 4 , wherein
the step (b) is a step of sucking the semiconductor wafer by the first vacuum tube, and then sucking the semiconductor wafer by the second vacuum tube.
6. The semiconductor test apparatus according to claim 1 , wherein the first vacuum tube is connected to the inner circumference portion of the flow pass such that suction force of the first vacuum tube on the flow pass is highest at the inner circumference portion of the flow pass.
7. The semiconductor test apparatus according to claim 1 , wherein the first vacuum tube is connected to the inner circumference portion of the flow pass at a first distance from a center of the spiral form of the flow pass, and
the first distance is shorter than a minimum distance from the second vacuum tube to the center of the spiral form of the flow pass.