Pellicle for an EUV lithography mask and a method of manufacturing thereof
View Patent ↗A pellicle for a reflective photo mask includes a frame, a core layer having a front surface and a rear surface, and disposed over the frame, a first capping layer disposed on the front surface of the core layer, an anti-reflection layer disposed on the first capping layer, a barrier layer disposed on the anti-reflection layer, and a heat emissive layer disposed on the barrier layer.
1. A pellicle for a reflective mask, comprising:
a frame;
a core layer having a front surface and a rear surface disposed over the frame;
a first capping layer disposed on the front surface of the core layer;
an anti-reflection layer disposed on the first capping layer;
a barrier layer disposed on the anti-reflection layer; and
a heat emissive layer disposed on the barrier layer,
wherein the barrier layer is made of a different material than the anti-reflection layer and includes a Ru alloy, and
the anti-reflection layer includes Mo and at least one selected from the group consisting of C, B, Si, and P.
2. The pellicle of claim 1 , wherein the heat emissive layer includes Ru and at least one selected from the group consisting of Ir, Nb, Ti, V, Mo, Zr, B, P and Si.
3. The pellicle of claim 1 , wherein the heat emissive layer includes Ru 1-x M x , where M is at least one selected from the group consisting of Ir, Nb, Ti, V, Mo and Zr.
4. The pellicle of claim 3 , wherein x is greater than zero and equal to or less than 0.4.
5. The pellicle of claim 3 , wherein the heat emissive layer further includes at least one selected from the group consisting of B, P and Si.
6. The pellicle of claim 1 , wherein the Ru alloy is at least one selected from the group consisting of RuIr, RuNb, RuTi, RuZr and RuV.
7. The pellicle of claim 3 , wherein the barrier layer includes Ru 1-y M y , where M is at least one selected from the group consisting of Ir, Nb, Ti, V, Mo and Zr, and y>x.
8. The pellicle of claim 1 , further comprising a second capping layer disposed on the rear surface of the core layer.
9. The pellicle of claim 8 , wherein each of the first capping layer and the second capping layer includes at least one of silicon nitride or silicon carbide.
10. The pellicle of claim 1 , wherein the heat emissive layer is mixture of polycrystalline and amorphous material.
11. A pellicle for a reflective mask, comprising:
a core layer having a front surface and a rear surface;
a first capping layer disposed on the front surface of the core layer;
a second capping layer disposed on the rear surface of the core layer;
an anti-reflection layer disposed on the first capping layer; and
a heat emissive layer disposed directly on the anti-reflection layer, wherein:
the anti-reflection layer is made of a Mo alloy, and
the heat emissive layer is made of a Ru alloy.
12. The pellicle of claim 11 , wherein the heat emissive layer includes Ru 1-x M x , where M is at least one selected from the group consisting of Ir, Nb, Ti, V, Mo and Zr.
13. The pellicle of claim 12 , wherein x is greater than zero and equal to or less than 0.4.
14. The pellicle of claim 11 , wherein the anti-reflection layer includes Mo and at least one selected from the group consisting of C, B, Si, and P.
15. The pellicle of claim 11 , wherein a thickness of the heat emissive layer is in a range from 0.2 nm to 5 nm.
16. The pellicle of claim 11 , wherein a thickness of the anti-reflection layer is in a range from 0.2 nm to 5 nm.
17. A pellicle for a reflective mask, comprising:
a frame having a cavity;
a first capping layer disposed on the frame;
a core layer disposed on the first capping layer;
a second capping layer disposed on the core layer;
an anti-reflection layer disposed on the first capping layer within the cavity;
a barrier layer disposed on the anti-reflection layer within the cavity; and
a heat emissive layer disposed on the barrier layer within the cavity,
wherein the barrier layer is comprised of a different material than the heat emissive layer and is made of a first Ru alloy.
18. The pellicle of claim 17 , wherein:
the anti-reflection layer is made of Mo or a Mo alloy,
the heat emissive layer is made of Ru or a second Ru alloy, and
the first Ru alloy has a lower Ru concentration than the second Ru alloy.
19. The pellicle of claim 17 , wherein the heat emissive layer includes Ru and at least one selected from the group consisting of Ir, Nb, Ti, V, Mo, Zr, B, P and Si.
20. The pellicle of claim 17 , wherein the heat emissive layer includes Ru 1-x M x , where M is at least one selected from the group consisting of Ir, Nb, Ti, V, Mo and Zr.