IP Library › Granted Patent US 12,014,969
Granted Patent B2
US 12,014,969 · App. 17/460,836 · Granted Jun 18, 2024

Package structure and method for forming the same

Inventors: Po-Chen Lai (Hsinchu County, TW); Ming-Chih Yew (Hsinchu, TW); Li-Ling Liao (Hsinchu, TW); Chin-Hua Wang (New Taipei, TW); Po-Yao Lin (Zhudong Township, Hsinchu County, TW); Shin-Puu Jeng (Hsinchu, TW)
Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
H01L23/3178H01L21/56H01L23/49822H01L23/49833H01L23/49838H01L24/73H01L25/0655H01L2224/73204H01L2924/1434H01L2924/1811H01L2924/1815H01L2924/182
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,014,969
App. No.
17/460,836
Granted
Jun 18, 2024
Kind
B2
Abstract

A package structure is provided. The package structure includes a redistribution structure over a substrate, a semiconductor die over the redistribution structure and electrically coupled to the substrate, and an underfill material over the substrate and encapsulating the redistribution structure and the semiconductor die. The underfill material includes an extension portion overlapping a corner of the semiconductor die and extending into the substrate.

Claims (43)

1. A package structure, comprising:

a redistribution structure over a substrate;

a semiconductor die over the redistribution structure and electrically coupled to the substrate; and

an underfill material over the substrate and encapsulating the redistribution structure and the semiconductor die, wherein the underfill material includes an extension portion overlapping a corner of the semiconductor die and extending into the substrate, the substrate includes a first insulating layer and a first conductive trace embedded in the first insulating layer, a bottom surface of the extension portion is lower than a bottom surface of the first conductive trace, and in a plan view, a direction from a geometric center of the redistribution structure to the corner of the semiconductor die is defined as a first direction, and an angle of the first direction and a longitudinal direction of the extension portion is less than about 15 degrees.

2. The package structure as claimed in claim 1 , wherein in a plan view, the extension portion includes a portion outside of an area of the redistribution structure.

3. The package structure as claimed in claim 1 , wherein the extension portion is isolated from the first conductive trace by the first insulating layer.

4. The package structure as claimed in claim 1 , wherein:

in a plan view, the extension portion includes a first sidewall located within an area of the semiconductor die and a second sidewall opposite to the first sidewall and located outside of the area of the semiconductor die, and

a minimum distance between the first sidewall of the extension portion and the corner of the semiconductor die is greater than or equal to a minimum distance between the second sidewall of the extension portion and the corner of the semiconductor die.

5. The package structure as claimed in claim 1 , wherein a sidewall of the extension portion includes an arcuate surface.

6. The package structure as claimed in claim 1 , further comprising:

a plurality of bonding elements interposing between the substrate and the redistribution structure and surrounded by the underfill material, wherein none of the bonding elements is located directly over the extension portion.

7. A package structure, comprising:

a plurality of bonding elements over a substrate;

a redistribution structure over the bonding elements;

a semiconductor die over the redistribution structure; and

an underfill material comprising:

a first portion surrounding the plurality of bonding elements; and

a second portion embedded in the substrate, wherein in a plan view, a corner of the semiconductor die is confined within an area of the second portion, wherein in a plan view, a first direction from a geometric center of the redistribution structure extending to the corner of the semiconductor die is substantially parallel to a symmetry axis of the second portion.

8. The package structure as claimed in claim 7 , wherein in a plan view, the second portion is entirely confined within an area of the redistribution structure.

9. The package structure as claimed in claim 7 , wherein in a plan view, the second portion has an elliptical profile.

10. The package structure as claimed in claim 7 , wherein a bottom surface of the second portion is higher than a bottom surface of the substrate.

11. The package structure as claimed in claim 7 , wherein in a plan view, a length of the second portion along the first direction is greater than a width of the second portion along a second direction that is perpendicular to the first direction.

12. The package structure as claimed in claim 7 , wherein:

in a plan view, the second portion includes a first sidewall located within an area of the semiconductor die and a second sidewall opposite to the first sidewall and located outside of the area of the semiconductor die, and

as measured in the first direction, a first distance between the first sidewall and the corner of the semiconductor die is greater than or equal to a second distance between the second sidewall and the corner of the semiconductor die.

13. The package structure as claimed in claim 12 , wherein as measured in the first direction, a third distance between a corner of the redistribution structure and the second sidewall is less than the second distance.

14. The package structure as claimed in claim 7 , further comprising:

a package over the redistribution structure, wherein the underfill material comprises:

a third portion embedded in the substrate, wherein in a plan view, a corner of the package is confined within an area of the third portion.

15. A method for forming a package structure, comprising:

bonding a semiconductor die to a first surface of a redistribution structure;

bonding a package to the first surface of the redistribution structure;

bonding a second surface of the redistribution structure to a substrate, wherein the substrate includes a first trench overlapping a corner of the semiconductor die and a second trench overlapping a corner of the package; and

encapsulating the semiconductor die and the redistribution structure with an underfill material, wherein the first trench and the second trench of the substrate are filled with underfill material.

16. The method for forming the package structure as claimed in claim 15 , wherein the redistribution structure is bonded to the substrate through a plurality of bonding elements, and the underfill material surrounds the plurality of bonding elements.

17. The method for forming the package structure as claimed in claim 15 , wherein in a plan view, a symmetry axis of the first trench passes through the corner of the semiconductor die.

18. The package structure as claimed in claim 1 , wherein the substrate further includes a second insulating layer below the first insulating layer and a second conductive trace embedded in the second insulating layer, and the bottom surface of the extension portion is higher than an upper surface of the second conductive trace.

19. The method for forming the package structure as claimed in claim 15 , wherein the substrate further includes an insulating layer and a conductive trace embedded in the insulating layer, and a bottom surface of the first trench is lower than a bottom surface of the conductive trace.

20. The package structure as claimed in claim 1 , wherein:

in a plan view, the semiconductor die has a first sidewall and a second sidewall connected to the first sidewall at the corner, and the extension portion has a third sidewall, a fourth sidewall connected to the third sidewall, a fifth sidewall connected to the fourth sidewall, and a sixth sidewall connected to the fifth sidewall and the third sidewall,

the third sidewall of the extension portion crosses the first sidewall of the semiconductor die, and

the fifth sidewall of the extension portion crosses the second sidewall of the semiconductor die.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 30, 2021
From: LAI, PO-CHEN; YEW, MING-CHIH; LIAO, LI-LING; WANG, CHIN-HUA; LIN, PO-YAO; JENG, SHIN-PUU
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 057327/0655 →
Continuity (1)
Related Publication 20230066598A1 · Mar 2, 2023
Cited By (1)
US 12,648,478