System and method for performing process model calibration in a virtual semiconductor device fabrication environment

1. A non-transitory computer-readable medium holding computing device-executable instructions for process model calibration, the instructions when executed causing at least one computing device equipped with at least one processor to:

perform in a virtual fabrication environment a plurality of virtual fabrication runs for a semiconductor device based on a Design of Experiment (DOE) using 2D design data and a process sequence, the plurality of virtual fabrication runs building a plurality of 3D models;

receive a user identification of one or more targets for the plurality of 3D models;

receive, via a user interface in the virtual fabrication environment, a user selection of desired values for selected targets associated with one or more key parameters whose value affects measurement data for the one or more targets, wherein the key parameters are identified in the virtual fabrication environment by an analytics module using a regression algorithm that generates regression data;

receive a user selection of upper and lower bounds for each identified key parameter via the user interface in the virtual fabrication environment;

execute an optimization algorithm for the plurality of 3D models using the key parameters, desired values and upper and lower bounds, wherein the optimization algorithm performs indirect optimization using the regression data; and

display or export results from the optimization algorithm.

2. The medium of claim 1 wherein the key parameters are manually identified by a user and wherein the optimization algorithm performs direct optimization.

3. The medium of claim 1 , wherein the instructions when executed further cause the at least one computing device to:

receive calibration options for the optimization algorithm from a user via the user interface.

4. The medium of claim 3 , wherein the calibration options include one or more of a number of iterations, a convergence tolerance, a number of trials and a type of scoring function.

5. The medium of claim 1 , wherein the selected targets include at least one of a metrology measurement, a structure search, a Design Technology Checking (DTC} check and an electrical analysis.

6. The medium of claim 1 , wherein relative weighting is applied to each selected target.

7. A computing device-implemented method for process model calibration, comprising:

performing in a virtual fabrication environment a plurality of virtual fabrication runs for a semiconductor device based on a Design of Experiment (DOE) using 2D design data and a process sequence, the plurality of virtual fabrication runs building a plurality of 3D models;

receiving a user identification of one or more targets for the plurality of 3D models;

receiving, via a user interface in the virtual fabrication environment, a user selection of desired values for selected targets associated with one or more key parameters whose value affects measurement data for the one or more targets, wherein the key parameters are identified in the virtual fabrication environment by an analytics module using a regression algorithm that generates regression data;

receiving a user selection of upper and lower bounds for each identified key parameter via the user interface in the virtual fabrication environment;

executing an optimization algorithm for the plurality of 3D models using the key parameters, desired values and upper and lower bounds, wherein the optimization algorithm performs indirect optimization using the regression data; and

displaying or exporting results from the optimization algorithm.

8. The method of claim 7 wherein the key parameters are manually identified by a user and wherein the optimization algorithm performs direct optimization.

9. The method of claim 7 , further comprising:

receiving calibration options for the optimization algorithm from a user via the user interface provided by the virtual fabrication environment.

10. The method of claim 9 , wherein the calibration options include one or more of a number of iterations, a convergence tolerance, a number of trials and a type of scoring function.

11. The method of claim 7 , wherein the selected targets include at least one of a metrology measurement, a structure search, a Design Technology Checking (DTC} check and an electrical analysis.

12. The method of claim 7 , wherein relative weighting is applied to each selected target.

13. A virtual fabrication system, comprising:

a computing device equipped with a processor and configured to generate a virtual fabrication environment, the virtual fabrication environment:

performing a plurality of virtual fabrication runs for a semiconductor device based on a Design of Experiment (DOE) using 2D design data and a process sequence, the plurality of virtual fabrication runs building a plurality of 3D models,

receiving a user identification of one or more targets for the plurality of 3D models,

receiving, via a user interface provided by the virtual fabrication environment, a user selection of desired values for selected targets associated with one or more key parameters whose value affects measurement data for the one or more targets, wherein the key parameters are identified in the virtual fabrication environment by an analytics module using a regression algorithm that generates regression data,

receiving a user selection of upper and lower bounds for each identified key parameter via the user interface,

executing an optimization algorithm for the plurality of 3D models using the key parameters, desired values and upper and lower bounds, wherein the optimization algorithm performs indirect optimization using the regression data, and

displaying or exporting results from the optimization algorithm; and a

display surface in communication with the computing device, the display surface configured to display one or more of the plurality of 3D models in a 3D view.

14. The system of claim 13 wherein the key parameters are manually identified by a user and wherein the optimization algorithm performs direct optimization.

15. The system of claim 13 , wherein the virtual fabrication environment:

receives calibration options for the optimization algorithm from a user via the user interface,

the calibration options including one or more of a number of iterations, a convergence tolerance, a number of trials and a type of scoring function.

16. The system of claim 13 , wherein the selected targets include at least one of a metrology measurement, a structure search, a Design Technology Checking (DTC} check and an electrical analysis.

17. The system of claim 13 , wherein relative weighting is applied to each selected target.