IP Library Granted Patent US 12,599,021
Granted Patent B2
US 12,599,021 · App. 17/484,922 · Granted Apr 7, 2026

Homogenous die stacking with increased element density

Inventors: Mahesh K. Kumashikar (Bangalore, IN); Dheeraj Subbareddy (Portland, OR); Ankireddy Nalamalpu (Portland, OR); MD Altaf Hossain (Portland, OR); Atul Maheshwari (Portland, OR)
Assignee: Altera Corporation
H01L24/16H01L23/481H01L24/81H01L25/0657H01L25/50H01L2224/16146H01L2225/06513
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Quick Facts
Patent No.
US 12,599,021
App. No.
17/484,922
Granted
Apr 7, 2026
Kind
B2
Abstract

An integrated circuit device includes multiple microbumps and a top programmable fabric die including a first programmable fabric and a first microbump interface coupled to the multiple microbumps. The integrated circuit device also includes a base programmable fabric die having a second programmable fabric and a second microbump interface coupled to the first microbump interface via a coupling to the multiple microbumps. The top programmable fabric die and the base programmable fabric die have a same design. Moreover, the top programmable fabric die and the base programmable fabric die are arranged in a three-dimensional die arrangement with the top programmable fabric die flipped above the base programmable fabric die.

Claims (29)

1 . An integrated circuit device comprising:

a plurality of microbumps;

a top programmable fabric die comprising a first programmable fabric and a first microbump interface coupled to the plurality of microbumps; and

a base programmable fabric die comprising a second programmable fabric and a second microbump interface coupled to the first microbump interface via a coupling to the plurality of microbumps, wherein the top programmable fabric die and the base programmable fabric die have a same design, and the top programmable fabric die and the base programmable fabric die are arranged in a three-dimensional die arrangement in different planes with the top programmable fabric die flipped above the base programmable fabric die, wherein the top programmable fabric die and the base programmable fabric die comprise through silicon vias that are not exposed to a surface of the top programmable fabric die.

2 . The integrated circuit device of claim 1 , wherein the top programmable fabric die comprises first input-output circuitry, and the base programmable fabric die comprises second input-output circuitry.

3 . The integrated circuit device of claim 2 , wherein the second input-output circuitry comprises a through silicon via electrically connected to the first input-output circuitry.

4 . The integrated circuit device of claim 2 , wherein the second input-output circuitry comprises a through silicon via that is not exposed to the first input-output circuitry.

5 . The integrated circuit device of claim 2 , wherein the second input-output circuitry is operable to be connected to another electronic device, and the first input-output circuitry is not operable to be connected to another electronic device.

6 . The integrated circuit device of claim 5 , wherein input-output channels of the first input-output circuitry are recovered by using the second input-output circuitry.

7 . The integrated circuit device of claim 1 , wherein the top programmable fabric die comprises a first perimeter interface located at a perimeter of the top programmable fabric die, and the base programmable fabric die comprises a second perimeter interface at a perimeter of the based programmable fabric die and is operable to interface with the first perimeter three-dimensional interface.

8 . The integrated circuit device of claim 7 , wherein the first perimeter three-dimensional interface is coupled to the second perimeter three-dimensional interface via one or more microbumps.

9 . The integrated circuit device of claim 1 , wherein the through silicon vias were first exposed to the surface and then covered.

10 . An integrated circuit device comprising:

a semiconductor device;

a plurality of microbumps;

a top programmable fabric die comprising a first programmable fabric, a first through silicon via coupled to the semiconductor device, and a first microbump interface coupled to the plurality of microbumps, wherein the semiconductor device is coupled to the top programmable fabric die; and

a base programmable fabric die comprising a second programmable fabric, a second through silicon via that is not exposed on any side of the base programmable fabric die, and a second microbump interface coupled to the first microbump interface via a coupling to the plurality of microbumps.

11 . The integrated circuit device of claim 10 , wherein the first through silicon via is coupled to the semiconductor device via a solder ball.

12 . The integrated circuit device of claim 10 , wherein the semiconductor device comprises a printed circuit board or substrate.

13 . The integrated circuit device of claim 10 , wherein the top programmable fabric die and the base programmable fabric die have a same design.

14 . The integrated circuit device of claim 10 , the top programmable fabric die and the base programmable fabric die are arranged in a flip-chip package.

15 . The integrated circuit device of claim 10 , wherein the base programmable fabric die comprises an input-output interface that is coupled to one or more other electronic devices.

16 . The integrated circuit device of claim 10 , wherein the top programmable fabric die comprises an input-output interface that is not coupled to any external devices.

17 . A method of manufacturing a programmable logic device, comprising:

forming a first programmable logic die having a first plurality of through silicon vias using a process;

forming a second programmable logic die having a second plurality of through silicon vias using the process; and

mounting the first programmable logic die and the second programmable logic die together in a flip-chip package by flipping the first programmable logic die and by using microbumps to interconnect the first programmable logic die and the second programmable logic die.

18 . The method of manufacturing of claim 17 , comprising exposing the second plurality of through silicon vias without exposing the first plurality of through silicon vias.

19 . The method of manufacturing of claim 18 , comprising coupling the second plurality of through silicon vias to a substrate or other semiconductor device via solder balls.

Assignments (2)
SECURITY INTEREST Recorded Sep 12, 2025
From: ALTERA CORPORATION
To: BARCLAYS BANK PLC, AS COLLATERAL AGENT
Reel/Frame 073431/0309 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 9, 2025
From: INTEL CORPORATION
To: ALTERA CORPORATION
Reel/Frame 072704/0307 →