Template, method for manufacturing template, and pattern formation method
According to one embodiment, a template includes a base body, and a first film. The base body has a first surface and a second surface. The first surface includes silicon oxide and spreads along a first plane. The second surface crosses the first plane. The first film includes aluminum oxide. A direction from the second surface toward the first film is aligned with a direction perpendicular to the second surface. A thickness of the first film along the direction perpendicular to the second surface is not less than 0.3 nm and not more than 10 μm. The first surface includes an unevenness.
1. A template, comprising:
a base body having a first surface and a second surface, the first surface including silicon oxide and spreading along a first plane, the second surface crossing the first plane;
a first film including aluminum oxide; and
an intermediate film including silicon as a main component, the intermediate film being positioned between the second surface and the first film,
a direction from the second surface toward the first film being aligned with a direction perpendicular to the second surface,
a thickness of the first film along the direction perpendicular to the second surface being not less than 0.3 nm and not more than 10 μm,
the first surface including an unevenness.
2. The template according to claim 1 , a thickness of the intermediate film along the direction perpendicular to the second surface being not less than 10 nm and not more than 100 nm.
3. The template according to claim 1 , further comprising a second film including at least one of a phosphonic acid or a phosphonic acid compound, the phosphonic acid including fluoroalkyl, the phosphonic acid compound including fluoroalkyl,
the first film being positioned between the second film and the second surface.
4. The template according to claim 1 , wherein at least a portion of the first film includes a crystal.