Patent Assignment
Reel/Frame 058948/0400
Change of Name
Recorded: 2022-02-02
Pages: 101
Assignor
TOSHIBA MEMORY CORPORATION
Executed: 2019-10-01
Assignee
KIOXIA CORPORATION
1-21, SHIBAURA 3-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties
(9)
Plasma Etching Apparatus
Template, Method for Manufacturing Template, and Pattern Formation Method
Pattern Formation Material and Pattern Formation Method
Substrate Processing Method and Substrate Processing Apparatus
Application:
16/357,151 →
Publication:
US 2019/0214277
Method for Manufacturing Semiconductor Device
Pattern Formation Material and Pattern Formation Method
Application:
16/718,249 →
Publication:
US 2020/0123299
Vertical Semiconductor Memory Device Having Stacked Shifted Axis Channels
Nonvolatile Semiconductor Memory Device and Method for Manufacturing Same
Application:
17/366,537 →
Publication:
US 2021/0335816
Template, Method for Manufacturing Template, and Pattern Formation Method
Related Assignments
(5)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Aug 9, 2010
From: MOTOKAWA, TAKEHARU; AZUMANO, HIDEHITO
To: KABISHIKI KAISHA TOSHIBA; SHIBAURA MECHATRONICS CORPORATION
Reel/Frame 024810/0349 →
Assignment of Assignor's Interest
Aug 11, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043271/0535 →
Assignment of Assignor's Interest
Apr 6, 2018
From: ASAKAWA, KOJI; SUGIMURA, SHINOBU
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 045459/0203 →
Assignment of Assignor's Interest
Apr 7, 2018
From: ASAKAWA, KOJI; KIHARA, NAOKO; LEE, SEEKEI; SASAO, NORIKATSU
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 045473/0413 →
Merger and Change of Name
Jan 25, 2022
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 058839/0954 →