Sensor configuration for process condition measuring devices
A process condition measurement apparatus is disclosed. The apparatus includes a substrate, one or more insulation portions, a first plurality of interconnect traces, a second plurality of interconnect traces, and a plurality of sensors disposed on the substrate. The second plurality of interconnect traces is disposed over the first plurality of interconnect traces and intersects at a plurality of locations to form a matrix of interconnect junctions across one or more locations of the substrate. A respective sensor is electrically coupled to a respective trace of the first and second plurality of interconnect traces. The respective sensor is individually readable by addressing the respective trace of the first and second plurality of interconnect traces.
1 . A process condition measurement apparatus comprising:
a substrate;
one or more insulation portions disposed on the substrate;
a first plurality of interconnect traces disposed on the substrate;
a second plurality of interconnect traces disposed on the substrate and over the first plurality of interconnect traces, wherein the first plurality of interconnect traces and the second plurality of interconnect traces intersect at a plurality of locations to form a matrix of interconnect junctions across one or more locations of the substrate, wherein at least one of the first plurality of interconnect traces or the second plurality of interconnect traces is anchored to the substrate at intermittent locations along its length, such that at least one of the first plurality of interconnect traces or the second plurality of interconnect traces are not continuously fixed to the substrate;
a plurality of sensors, wherein a respective sensor is electrically coupled to a respective trace of the first plurality of interconnect traces and a respective trace of the second plurality of interconnect traces, wherein the respective sensor is individually readable by addressing the respective trace of the first plurality of interconnect traces and the respective trace of the second plurality of interconnect traces; and
one or more discrete sensors located at one or more select interconnect junctions of the matrix of interconnect junctions.
2 . The apparatus of claim 1 , wherein the location of the plurality of sensors are configurable according to one or more areas of interest.
3 . The apparatus of claim 1 , wherein the location of the plurality of sensors are configurable according to a set of environment conditions.
4 . The apparatus of claim 1 , wherein the location of the plurality of sensors are configurable according to one or more heating zones associated with a process tool.
5 . The apparatus of claim 1 , wherein the one or more insulation portions comprise a plurality of insulation portions, wherein a respective insulation portion is disposed under a respective intersection point of a respective trace of the first plurality of interconnect traces and a respective trace of the second plurality of interconnect traces.
6 . The apparatus of claim 5 , wherein the one or more insulation portions of the plurality of insulation portions are disposed at the plurality of intersecting locations between the first plurality of interconnect traces and the second plurality of interconnect traces.
7 . The apparatus of claim 1 , wherein one or more of the plurality of sensors comprises one or more sensors located at one or more interconnect junctions.
8 . The apparatus of claim 7 , wherein the one or more of the plurality of sensors comprises one or more sensors printed on the substrate at the one or more interconnect junctions.
9 . The apparatus of claim 1 , wherein the substrate is formed from at least one of silicon, quartz, glass, or silicon nitride.
10 . The apparatus of claim 9 , wherein the substrate comprises a silicon wafer.
11 . The apparatus of claim 1 , wherein at least one of the first plurality of interconnects, the second plurality of interconnects, or the plurality of sensors are formed from one or more additive manufacturing processes.
12 . The apparatus of claim 11 , wherein the one or more additive manufacturing processes comprises at least one of 3-D printing, ink-jet printing, aerosol printing, screen printing, or a thin film process.
13 . The apparatus of claim 1 , wherein one or more sensors of the plurality of sensors comprise:
at least one of one or more temperature sensors configured to acquire one or more parameters indicative of temperature, one or more pressure sensors configured to acquire one or more parameters indicative of pressure, one or more chemical sensors configured to acquire one or more parameters indicative of a presence of a targeted chemical, or one or more radiation sensors configured to acquire one or more parameters indicative of a presence of radiation.
14 . The apparatus of claim 1 , further comprising an electronic assembly.
15 . The apparatus of claim 14 , wherein the electronic assembly comprises:
one or more processors, wherein the one or more processors are configured to acquire readout data from the plurality of sensors via the first plurality of interconnect traces and the second plurality of interconnect traces;
communication circuitry;
memory; and
a power source.
16 . The apparatus of claim 15 , further comprising:
a remote data system communicatively coupled to the electronic assembly, wherein the electronic assembly is configured to transmit one or more measurement parameters to the remote data system, wherein the remote data system is configured to calculate one or more values from the readout data acquired by the plurality of sensors.
17 . The apparatus of claim 16 , wherein the remote data assembly is configured to map the one or more values to the one or more locations of the substrate.